Polymers, resist compositions and patterning process
    11.
    发明授权
    Polymers, resist compositions and patterning process 有权
    聚合物,抗蚀剂组合物和图案化工艺

    公开(公告)号:US06436606B1

    公开(公告)日:2002-08-20

    申请号:US09650408

    申请日:2000-08-29

    IPC分类号: C08F22202

    摘要: Polymers comprising recurring units of formula (1) and recurring units having acid labile groups are novel. At least one of R1 and R2 is fluorine or a trifluoromethyl group, and the remainder is hydrogen or a C1-20 alkyl, R3 and R4 each are hydrogen or an unsubstituted or fluorine-substituted C1-20 alkyl, or R3 and R4 may form a ring. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.

    摘要翻译: 包含式(1)的重复单元的聚合物和具有酸不稳定基团的重复单元是新的.R 1和R 2中的至少一个是氟或三氟甲基,其余是氢或C 1-20烷基,R 3和R 4各自是 氢或未取代或氟取代的C 1-20烷基,或者R 3和R 4可以形成环。 使用这种聚合物,获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。

    Resist compositions and patterning process
    14.
    发明授权
    Resist compositions and patterning process 有权
    抗蚀剂组合物和图案化工艺

    公开(公告)号:US06541179B2

    公开(公告)日:2003-04-01

    申请号:US09811695

    申请日:2001-03-20

    IPC分类号: G03F7004

    摘要: A resist composition contains a base resin, a photoacid generator, and a solvent. The photoacid generator is a sulfonium salt of formula (1). R1 is a monovalent cyclic or bridgedring C3-20, hydrocarbon group, R2 is hydroxyl, nitro, halogen, or a straight, branched or cyclic monovalent C1-15 hydrocarbon group which may contain O, N, S or halogen atom, K− is a non-nucleophilic counter ion, x is equal to 1 or 2, and y is an integer of 0-3. The resist composition is sensitive to ArF excimer laser light, has good sensitivity and resolution, and forms a thick film which is advantageous in etching.

    摘要翻译: 抗蚀剂组合物含有基础树脂,光致酸产生剂和溶剂。 光致酸产生剂是式(1)的锍盐,R1是一价环状或桥连的C3-20,烃基,R2是羟基,硝基,卤素或直链,支链或环状的一价C1-15烃基,其可以 含有O,N,S或卤原子,K-是非亲核反离子,x等于1或2,y是0-3的整数。 抗蚀剂组合物对ArF准分子激光敏感,具有良好的灵敏度和分辨率,并形成有利于蚀刻的厚膜。

    Polymers, chemical amplification resist compositions and patterning process
    16.
    发明授权
    Polymers, chemical amplification resist compositions and patterning process 有权
    聚合物,化学放大抗蚀剂组合物和图案化工艺

    公开(公告)号:US06461791B1

    公开(公告)日:2002-10-08

    申请号:US09686955

    申请日:2000-10-12

    IPC分类号: G03F7039

    摘要: Polymers of a fluorinated backbone having recurring units of formula (1) are novel: R1 is H, F, C1-20 alkyl or fluorinated C1-20 alkyl, R2 is F, C1-20 alkyl or fluorinated C1-20 alkyl, and R3 is C6-20 aryl which may have attached thereto a hydroxyl group and/or a hydroxyl group substituted with an OR4 group wherein R4 is an acid labile group. Using such polymers, resist compositions featuring transparency to excimer laser light and alkali solubility are obtained.

    摘要翻译: 具有式(1)重复单元的氟化主链的聚合物是新颖的:R1是H,F,C1-20烷基或氟化C1-20烷基,R2是F,C1-20烷基或氟化C1-20烷基,R3 是可以与其连接羟基和/或被OR4基团取代的羟基的C6-20芳基,其中R4是酸不稳定基团。 使用这种聚合物,获得具有对准分子激光的透明度和碱溶性的抗蚀剂组合物。

    Polymers, chemical amplification resist compositions and patterning process
    19.
    发明授权
    Polymers, chemical amplification resist compositions and patterning process 有权
    聚合物,化学放大抗蚀剂组合物和图案化工艺

    公开(公告)号:US06730451B2

    公开(公告)日:2004-05-04

    申请号:US09735521

    申请日:2000-12-14

    IPC分类号: G03F7038

    摘要: Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is an acid labile group. Using such polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.

    摘要翻译: 包含由式(1)表示的氟化主链的丙烯酸衍生物的重复单元的聚合物是新颖的.R 1,R 2和R 3独立地是H,F,C 1-20烷基或氟化C 1-20烷基 ,R 1,R 2和R 3中的至少一个含有氟,R 4是酸不稳定基团。 使用这种聚合物,获得具有F2准分子激光的低吸收性的抗蚀剂组合物。