公开(公告)号：US20230102372A1

公开(公告)日：2023-03-30

申请号：US17801188

申请日：2021-01-21

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Miyuki Nakai ,  Yuko Ogawa ,  Toshiro Kume

IPC: H01M4/04 ,  B03C5/02

Abstract: An impurity processing device includes: a pipe through which a treated liquid containing metal impurities flows; a first electrode and a second electrode disposed in the pipe; and a power supply causing a current to flow between the first electrode and the second electrode.

公开(公告)号：US20230101754A1

公开(公告)日：2023-03-30

申请号：US17801182

申请日：2021-01-21

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： Miyuki Nakai ,  Yuko Ogawa ,  Toshiro Kume

IPC: H01M4/04

Abstract: An impurity processing device is a device for processing metal impurities contained in a solid-liquid mixture for forming an electrode of an electric storage device, and includes a first electrode and a second electrode that apply an electric field to the solid-liquid mixture, and a power supply that causes a current of 0.1 mA or more to flow between the first electrode and the second electrode.