Method for preparing oxydiphthalic anhydrides using bicarbonate as catalyst
    14.
    发明授权
    Method for preparing oxydiphthalic anhydrides using bicarbonate as catalyst 有权
    使用碳酸氢盐作为催化剂制备氧联二邻苯二甲酸酐的方法

    公开(公告)号:US06727370B1

    公开(公告)日:2004-04-27

    申请号:US10373523

    申请日:2003-02-24

    IPC分类号: C07D30789

    CPC分类号: C07D307/89

    摘要: Oxydiphthalic anhydrides such as 4-oxydiphthalic anhydride are prepared by the reaction of a halophthalic anhydride with an alkali metal carbonate such as potassium carbonate in the presence of a catalyst system comprising an alkali metal bicarbonate such as potassium bicarbonate and a phase transfer catalyst, preferably a tetraarylphosphonium halide.

    摘要翻译: 氧化二邻苯二甲酸酐如4-氧代二邻苯二甲酸酐通过卤代邻苯二甲酸酐与碱金属碳酸盐如碳酸钾的反应,在包含碱金属碳酸氢盐如碳酸氢钾的催化剂体系和相转移催化剂存在下制备,优选为 四芳基鏻卤化物。

    Polyethersulfone compositions with high heat and good impact resistance
    19.
    发明授权
    Polyethersulfone compositions with high heat and good impact resistance 有权
    具有高耐热性和耐冲击性的聚醚砜组合物

    公开(公告)号:US08623971B2

    公开(公告)日:2014-01-07

    申请号:US13361684

    申请日:2012-01-30

    CPC分类号: C08G75/23 C08L81/06

    摘要: Polyethersulfones having Tg greater than about 225° C. and a notched Izod value greater than about 1 ft-lb/in, as measured by ASTM D256, comprise from about 5 mol % to less than about 40 mol % structural units of formula 1; and from greater than about 60 mol % to about 95 mol % structural units of formula 2 wherein R1, R2, and R3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12aliphatic radical, C3-C12cycloaliphatic radical, or a C3-C12aromatic radical; n, m, q are independently at each occurrence integers from 0 to 4; and Q is a C3-C20cycloaliphatic radical, or a C3-C20aromatic radical.

    摘要翻译: Tg大于约225℃的聚醚砜和通过ASTM D256测量的大于约1ft-lb / in的缺口伊佐德值包含约5mol%至小于约40mol%的式1结构单元; 和大于约60mol%至约95mol%的式2的结构单元,其中R 1,R 2和R 3在每次出现时独立地为卤素原子,硝基,氰基,C 1 -C 12脂族基,C 3 -C 12脂族基, C 12环脂族基或C 3 -C 12芳族基; n,m,q各自独立地为0至4的整数; Q为C 3 -C 20环脂族基或C 3 -C 20芳族基。

    POLYETHERSULFONE COMPOSITIONS WITH HIGH HEAT AND GOOD IMPACT RESISTANCE
    20.
    发明申请
    POLYETHERSULFONE COMPOSITIONS WITH HIGH HEAT AND GOOD IMPACT RESISTANCE 有权
    具有高耐热和耐冲击性的聚醚类组合物

    公开(公告)号:US20120130043A1

    公开(公告)日:2012-05-24

    申请号:US13361684

    申请日:2012-01-30

    IPC分类号: C08G75/23

    CPC分类号: C08G75/23 C08L81/06

    摘要: Polyethersulfones having Tg greater than about 225° C. and a notched Izod value greater than about 1 ft-lb/in, as measured by ASTM D256, comprise from about 5 mol % to less than about 40 mol % structural units of formula 1; and from greater than about 60 mol % to about 95 mol % structural units of formula 2 wherein R1, R2, and R3 are independently at each occurrence a halogen atom, a nitro group, a cyano group, a C1-C12aliphatic radical, C3-C12cycloaliphatic radical, or a C3-C12aromatic radical; n, m, q are independently at each occurrence integers from 0 to 4; and Q is a C3-C20cycloaliphatic radical, or a C3-C20aromatic radical.

    摘要翻译: Tg大于约225℃的聚醚砜和通过ASTM D256测量的大于约1ft-lb / in的缺口伊佐德值包含约5mol%至小于约40mol%的式1结构单元; 和大于约60mol%至约95mol%的式2的结构单元,其中R 1,R 2和R 3在每次出现时独立地为卤素原子,硝基,氰基,C 1 -C 12脂族基,C 3 -C 12脂族基, C 12环脂族基或C 3 -C 12芳族基; n,m,q各自独立地为0至4的整数; Q为C 3 -C 20环脂族基或C 3 -C 20芳族基。