Abstract:
A thermal treatment method for a display apparatus includes providing an acceptor substrate on a substrate stage, providing on the acceptor substrate a pattern mask including a transfer layer, irradiating a flash light beam onto the pattern mask from a plurality of flash lamps, and transferring the transfer layer to the acceptor substrate. The plurality of flash lamps are symmetrically provided with respect to the acceptor substrate and are configured to irradiate flash light beams.
Abstract:
A donor substrate includes: a support layer; a first light absorption layer disposed on the support layer; a buffer layer disposed on the first absorption layer; a second light absorption layer disposed on the buffer layer; and a transfer layer disposed on the second absorption layer, wherein the buffer layer includes a transparent oxide film.
Abstract:
A donor substrate includes: a support layer; a first light absorption layer disposed on the support layer; a buffer layer disposed on the first absorption layer; a second light absorption layer disposed on the buffer layer; and a transfer layer disposed on the second absorption layer, wherein the buffer layer includes a transparent oxide film.