METHOD FOR FORMING HEAT INSULATING FILM, AND STRUCTURE OF HEAT INSULATING FILM
    11.
    发明申请
    METHOD FOR FORMING HEAT INSULATING FILM, AND STRUCTURE OF HEAT INSULATING FILM 审中-公开
    形成热绝缘膜的方法和绝热膜的结构

    公开(公告)号:US20150354083A1

    公开(公告)日:2015-12-10

    申请号:US14732924

    申请日:2015-06-08

    CPC classification number: C25D11/045 C25D11/246

    Abstract: A method for forming a heat insulating film includes: a step of subjecting an aluminum alloy constituting a surface of a base material to an anodic oxidation treatment to form an anodic oxidation coating film having pores formed in the surface thereat a step of coating on the surface of the anodic oxidation coating film a sealing material that includes a silicon-based polymer solution and particles of a heat insulating material that are dispersed in the silicon-based polymer solution and are particles having an average particle diameter that is larger than an average pore diameter of the pores; and a step of drying and baking the sealing material to form a sealing coating film.

    Abstract translation: 形成绝热膜的方法包括:对构成基材表面的铝合金进行阳极氧化处理以形成在表面上形成有孔的阳极氧化涂膜的步骤, 阳极氧化涂膜的密封材料包括硅基聚合物溶液和分散在硅基聚合物溶液中的隔热材料颗粒,并且是平均粒径大于平均孔径的颗粒 的毛孔; 以及干燥和烘烤密封材料以形成密封涂膜的步骤。

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