公开(公告)号：US6087076A

公开(公告)日：2000-07-11

申请号：US968589

申请日：1997-11-13

申请人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

发明人： Keita Sakai ,  Keiko Chiba ,  Hiroshi Maehara

IPC分类号： G03F7/004 ,  G03F7/30 ,  G03F7/38 ,  H01L21/027 ,  G03C5/00

CPC分类号： G03F7/0048

摘要： A method of manufacturing semiconductor devices includes a coating step for coating a substrate using a resist solution including a base resin and a low-oxygen or oxygen-free solvent in which oxygen is removed by nitrogen bubbling, a heating step for heating the substrate coated with the resist, an exposing step for exposing the substrate with radiation to transfer a pattern, and a developing step for developing the exposed substrate. The coating step, the heating step, the exposing step and the developing step are performed under an environment controlled in a low-oxygen or oxygen-free state.

摘要翻译： 一种制造半导体器件的方法包括：涂覆步骤，用于使用包含基础树脂的抗蚀剂溶液和通过氮气鼓泡除去氧的低氧或无氧溶剂的涂覆步骤，用于加热涂覆有 抗蚀剂，用于用辐射曝光衬底以转印图案的曝光步骤，以及用于显影曝光的衬底的显影步骤。 涂布步骤，加热步骤，曝光步骤和显影步骤在控制在低氧或无氧状态的环境下进行。

公开(公告)号：US5422921A

公开(公告)日：1995-06-06

申请号：US975521

申请日：1992-11-12

申请人： Keiko Chiba

发明人： Keiko Chiba

IPC分类号： G03F1/22 ,  G21K5/00 ,  G11B11/00 ,  H01L39/00

CPC分类号： G03F1/22

摘要： An X-ray mask structure includes an X-ray absorber having a masking pattern, an X-ray permeable film for supporting the X-ray absorber on a surface of the X-ray permeable film, and a supporting frame for supporting the X-ray permeable film. The X-ray mask structure has a metal oxide film formed on a portion of the surface of the X-ray permeable film having no X-ray absorber thereon. Also disclosed is a method for manufacturing such an X-ray mask structure.

摘要翻译： X射线掩模结构包括具有掩模图案的X射线吸收体，用于在X射线透过膜的表面上支撑X射线吸收体的X射线透过膜，以及用于支撑X射线透过膜的支撑框架， 透射膜。 X射线掩模结构在其上没有X射线吸收体的X射线透过膜的表面的一部分上形成有金属氧化物膜。 还公开了一种用于制造这种X射线掩模结构的方法。

公开(公告)号：US07916273B2

公开(公告)日：2011-03-29

申请号：US11559084

申请日：2006-11-13

申请人： Masaru Nyui ,  Keiko Chiba ,  Keiji Yamashita

发明人： Masaru Nyui ,  Keiko Chiba ,  Keiji Yamashita

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70916 ,  G03F7/70341

摘要： An exposure apparatus includes an illumination optical system for illuminating a reticle using a light from a light source, and a projection optical system for projecting a pattern of the reticle onto a substrate, the exposure apparatus exposing the substrate through a liquid that is supplied to a space between the substrate and a lens of the projection optical system closest to the substrate, a surface of the lens on which the light does not pass having a polished surface.

摘要翻译： 曝光装置包括：照明光学系统，用于使用来自光源的光照射光罩;以及投影光学系统，用于将掩模版的图案投射到基板上，所述曝光装置通过供给到 基板和最靠近基板的投影光学系统的透镜之间的空间，光线不通过的透镜的表面具有抛光表面。

公开(公告)号：US06829091B2

公开(公告)日：2004-12-07

申请号：US09362698

申请日：1999-07-29

申请人： Takashi Kato ,  Kenji Saitoh ,  Hiroshi Maehara ,  Makoto Ogusu ,  Keiko Chiba

发明人： Takashi Kato ,  Kenji Saitoh ,  Hiroshi Maehara ,  Makoto Ogusu ,  Keiko Chiba

IPC分类号： G02B518

CPC分类号： G02B5/1814 ,  G02B5/1838 ,  G02B5/1857 ,  G02B5/1895 ,  G02B7/00 ,  G02B27/4222 ,  G03F7/70316 ,  G03F7/70825

摘要： An optical system for forming an image of an object. The optical system includes an optical element, which is deformed by the weight thereof, and at least one optical member for preventing a change in optical performance of the optical system due to deformation of the optical element, when the optical element is provided in the optical system.

摘要翻译： 一种用于形成物体的图像的光学系统。 该光学系统包括光学元件，该光学元件由于其重量而变形，并且至少一个光学构件用于防止当光学元件设置在光学元件中时由于光学元件的变形而导致的光学系统的光学性能的变化 系统。

公开(公告)号：US06455203B1

公开(公告)日：2002-09-24

申请号：US09545464

申请日：2000-04-07

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba

IPC分类号： G03F900

CPC分类号： G03F9/00 ,  G03F1/22 ,  G03F7/2022

摘要： A mask manufacturing method includes performing a multiple exposure process to a substrate so that a number of latent images are formed on the substrate, and processing the exposed substrate to produce actual mask patterns, wherein the multiple exposure process includes a first exposure step for forming a latent image of relatively-fine periodic patterns on the substrate by use of a first master mask having absorptive periodic patterns, and a second exposure step for forming a latent image of relatively-rough patterns on the substrate by use of a second master mask having absorptive patterns.

摘要翻译： 掩模制造方法包括对基板进行多次曝光处理，使得在基板上形成多个潜像，并处理曝光的基板以产生实际的掩模图案，其中多次曝光处理包括第一曝光步骤，用于形成 通过使用具有吸收性周期性图案的第一主掩模在基板上的相对精细的周期性图案的潜像，以及第二曝光步骤，用于通过使用具有吸收性的第二主掩模在基板上形成相对粗糙的图案的潜像 模式。

公开(公告)号：US06337161B2

公开(公告)日：2002-01-08

申请号：US09161372

申请日：1998-09-28

申请人： Keiko Chiba ,  Hideo Kato ,  Hiroshi Maehara

发明人： Keiko Chiba ,  Hideo Kato ,  Hiroshi Maehara

IPC分类号： G03F900

CPC分类号： G03F1/22 ,  G03F1/62

摘要： A mask structure to be used for X-ray exposure or the like in manufacturing semiconductor devices prevents contaminants from adhering and accumulating on the surface of a mask, thereby extending the life of the mask. In this mask structure, titanium oxide films are formed on front and back pellicles that protect a mask, composed of a support film and an X-ray absorber, from dust or the like. Titanium oxide decomposes contaminants by functioning as a photocatalyst, and prevents the adhesion and accumulation of contaminants by an antistatic function based on photoconductivity. When a titanium oxide film is formed on the surface of the mask itself, it is preferable that the film be formed outside the exposure area or the like.

摘要翻译： 在制造半导体器件中用于X射线曝光等的掩模结构防止污染物粘附并积聚在掩模的表面上，从而延长掩模的使用寿命。 在该掩模结构中，在保护由支撑膜和X射线吸收体构成的掩模的灰尘等上的前面和后面防护薄膜上形成氧化钛膜。 氧化钛通过作为光催化剂起作用来分解污染物，并且通过基于光电导性的抗静电功能来防止污染物的粘附和积累。 当在掩模本身的表面上形成氧化钛膜时，优选将膜形成在曝光区域等之外。

公开(公告)号：US6101237A

公开(公告)日：2000-08-08

申请号：US917854

申请日：1997-08-27

申请人： Takeshi Miyachi ,  Keiko Chiba ,  Hiroshi Osawa ,  Koichi Sentoku ,  Hiroshi Maehara

发明人： Takeshi Miyachi ,  Keiko Chiba ,  Hiroshi Osawa ,  Koichi Sentoku ,  Hiroshi Maehara

IPC分类号： G03F1/22 ,  G03F1/62 ,  G03F7/20 ,  G21K1/10 ,  G21K5/00

CPC分类号： G03F1/22 ,  G03F1/62 ,  G03F7/70691 ,  G21K1/10

摘要： An X-ray mask includes a holding frame, a membrane held by the holding frame, a pattern formed on a surface of the membrane by an X-ray absorptive material, the surface being disposed opposed to a workpiece to which the pattern is to be transferred when the mask is mounted in an exposure apparatus, a member for reinforcing the holding frame and having a portion placed closer to the workpiece than to the membrane and a pellicle provided at a side where the pattern is formed, the pellicle being attached to the portion of the member so that the pellicle is placed at the workpiece side of the membrane.

摘要翻译： X射线掩模包括保持框架，由保持框架保持的膜，通过X射线吸收材料形成在膜的表面上的图案，该表面设置成与图案所在的工件相对 当掩模安装在曝光装置中时转印，用于加强保持框架并且具有比膜更靠近工件的部分的膜和设置在图案形成侧的防护薄膜组件，防护薄膜组件附接到 部件，使防护薄膜组件放置在膜的工件侧。

公开(公告)号：US5770335A

公开(公告)日：1998-06-23

申请号：US687782

申请日：1996-07-31

申请人： Akira Miyake ,  Keiko Chiba

发明人： Akira Miyake ,  Keiko Chiba

IPC分类号： G03F1/22 ,  G03F1/68 ,  G21K1/10 ,  H01L21/027 ,  G03F9/00 ,  G21K5/00

CPC分类号： G21K1/10 ,  G03F1/22 ,  G03F1/29

摘要： A mask for use with radiation including one of X-rays and vacuum ultraviolet rays. The mask includes a transmissive member for supporting a pattern of a radiation absorptive material, and a phase shifter material provided on the transmissive member. The phase shifter material has a radiation absorptivity less than that of the radiation absorptive material. The thickness of the transmissive member at a portion where the phase shifter material is provided is less than that of another portion thereof.

摘要翻译： 用于辐射的掩模，包括X射线和真空紫外线之一。 掩模包括用于支撑辐射吸收材料的图案的透射构件和设置在透射构件上的移相器材料。 移相器材料的辐射吸收率小于辐射吸收材料的辐射吸收率。 在设置移相器材料的部分处的透射构件的厚度小于其另一部分的厚度。

公开(公告)号：US5589304A

公开(公告)日：1996-12-31

申请号：US404959

申请日：1995-03-16

申请人： Keiko Chiba ,  Takeshi Miyachi

发明人： Keiko Chiba ,  Takeshi Miyachi

IPC分类号： G03F1/22 ,  H01L21/027 ,  G03F9/00

CPC分类号： G03F1/22

摘要： Disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member comprises ceramics and wherein the reinforcing member and the holding frame are bonded to each other through a film oxide of the ceramics. Also disclosed is a mask structure which includes a membrane on which a pattern is formed or to be formed, a holding frame for holding the membrane, and a reinforcing member for reinforcing the holding frame, wherein the reinforcing member has a major constituent the same as that of the membrane.

摘要翻译： 公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件包括陶瓷，并且其中加强构件和 保持框通过陶瓷的氧化膜彼此接合。 还公开了一种掩模结构，其包括其上形成有图案或要形成图案的膜，用于保持膜的保持框架和用于加强保持框架的加强构件，其中，加强构件具有与 膜的那个。

公开(公告)号：US5553110A

公开(公告)日：1996-09-03

申请号：US345395

申请日：1994-11-18

申请人： Koichi Sentoku ,  Kenji Saito ,  Keiko Chiba ,  Hiroshi Maehara

发明人： Koichi Sentoku ,  Kenji Saito ,  Keiko Chiba ,  Hiroshi Maehara

IPC分类号： G03F7/20 ,  C30B33/00 ,  G03F1/22 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065 ,  H01L39/00

CPC分类号： G03F1/22 ,  Y10S430/167 ,  Y10S430/168

摘要： An X-ray mask structure for X-ray lithography comprises a pattern, an X-ray transmissive film for holding the pattern, and a frame for supporting the X-ray transmissive film, wherein a light-scattering prevention film is formed on at least a part of the surface of the X-ray transmissive film and/or of the pattern, and the light scattering prevention film may be a flat coating film formed on at least one of the top face and the back face of the X-ray transmissive film and having a refractive index substantially equal to the refractive index of the X-ray transmissive film. A process for producing the X-ray mask structure comprises steps of forming a flat coating film having a refractive index substantially the same as that of the X-ray transmissive film on at least one of the top face and the back face of the X-ray transmissive film, and forming a pattern at least on the top face of the X-ray transmissive film. An X-ray exposure apparatus comprises an X-ray source, and the X-ray mask structure, and conducts transcription of the pattern formed on the x-ray mask structure onto a transcription-receiving member by projecting X-rays through the X-ray mask structure to the transcription receiving member.

摘要翻译： 用于X射线光刻的X射线掩模结构包括图案，用于保持图案的X射线透射膜和用于支撑X射线透射膜的框架，其中至少形成光散射防止膜 X射线透过膜表面的一部分和/或图案的一部分，光散射防止膜可以是形成在X射线透射性的上表面和背面的至少一面上的平坦的涂膜 并且具有基本上等于X射线透射膜的折射率的折射率。 一种X射线掩模结构体的制造方法，其特征在于，在上述X射线掩模结构的上表面和背面的至少一面上，形成与X射线透过膜的折射率基本相同的折射率的平面涂膜， 并且至少在X射线透射膜的顶面上形成图案。 X射线曝光装置包括X射线源和X射线掩模结构，并且通过X射线X射线透过X射线掩模结构将X射线掩模结构上形成的图案转印到转录接收部件上， 射线掩模结构。