公开(公告)号：US5917186A

公开(公告)日：1999-06-29

申请号：US925976

申请日：1997-09-09

申请人： Toshiaki Fujii ,  Yasuhiko Sugiyama

发明人： Toshiaki Fujii ,  Yasuhiko Sugiyama

IPC分类号： G01Q60/00 ,  H01J37/15 ,  H01J37/256 ,  H01J37/304

CPC分类号： H01J37/15 ,  H01J37/08 ,  H01J37/1471 ,  H01J2237/0458 ,  H01J2237/1501 ,  H01J2237/31749

摘要： To provide a focused ion beam optical axis alignment method and a focused ion beam apparatus which make axis alignment work of for example when replacing an ion source of a focused ion beam apparatus easy. A method for adjusting the optical axis of a focused ion beam apparatus having an ion source part 3 made up of an ion source 1 for producing an ion beam and a pullout electrode 2, a first aperture 5 which passes a central part having a high energy density of the ion beam and measures the electric current thereof, a charged particle optical system 9 including a condenser lens 6, a second aperture 7 and an objective lens 8, a deflecting electrode 16 which scans the focused ion beam, and a secondary charged particle detector for detecting secondary charged particles arising as a result the focused ion beam being radiated onto a sample, wherein while moving the ion source 1 in a direction intersecting orthogonally with the optical axis of the ion beam the amount of secondary charged particles detected by the secondary charged particle detector is monitored and the position of the ion source 1 is adjusted so this amount of secondary charged particles becomes a maximum.

摘要翻译： 提供聚焦离子束光轴对准方法和聚焦离子束装置，其使得例如当更换聚焦离子束装置的离子源容易时进行轴对准工作。 一种用于调整聚焦离子束装置的光轴的方法，其具有由用于产生离子束的离子源1和拉出电极2构成的离子源部分3，通过具有高能量的中心部分的第一孔5 离子束的密度并测量其电流，包括聚光透镜6，第二孔7和物镜8的带电粒子光学系统9，扫描聚焦离子束的偏转电极16和二次带电粒子 检测器，用于检测聚焦离子束辐射到样品上产生的二次带电粒子，其中当离子源1沿与离子束的光轴正交交叉的方向移动时，二次检测的次级带电粒子的量 监测带电粒子检测器，调整离子源1的位置，使二次带电粒子的量成为最大值。

公开(公告)号：US08548064B2

公开(公告)日：2013-10-01

申请号：US12087040

申请日：2006-12-29

申请人： Masaki Kitahara ,  Hideaki Kimata ,  Shinya Shimizu ,  Kazuto Kamikura ,  Yoshiyuki Yashima ,  Masayuki Tanimoto ,  Toshiaki Fujii ,  Kenji Yamamoto

发明人： Masaki Kitahara ,  Hideaki Kimata ,  Shinya Shimizu ,  Kazuto Kamikura ,  Yoshiyuki Yashima ,  Masayuki Tanimoto ,  Toshiaki Fujii ,  Kenji Yamamoto

IPC分类号： H04N7/12

CPC分类号： H04N19/147 ,  H04N13/122 ,  H04N19/19 ,  H04N19/503 ,  H04N19/597

摘要： A video encoding method for encoding video images as a single video image by using parallax compensation which performs prediction by using parallax between the video images, and a corresponding decoding method. The number of parameters as parallax data used for the parallax compensation is selected and set for each reference image. Data of the set number of parameters is encoded, and parallax data in accordance with the number of parameters is encoded. During decoding, parallax-parameter number data, which is included in encoded data and designates the number of parameters as parallax data for each reference image, is decoded, and parallax data in accordance with the number of parameters is decoded, where the parallax data is included in the encoded data.

摘要翻译： 一种视频编码方法，用于通过使用通过使用视频图像之间的视差执行预测的视差补偿来将视频图像编码为单个视频图像，以及相应的解码方法。 为每个参考图像选择并设置用于视差补偿的视差信息的参数的数量。 对设定参数数量的数据进行编码，并且对根据参数数量的视差数据进行编码。 在解码期间，解码编码数据中包含的视差参数号码数据，并指定作为每个参照图像的视差数据的参数个数，根据参数数量对视差数据进行解码， 包含在编码数据中。

公开(公告)号：US08451894B2

公开(公告)日：2013-05-28

申请号：US12086709

申请日：2007-01-04

申请人： Masayuki Tanimoto ,  Toshiaki Fujii ,  Kenji Yamamoto ,  Masaki Kitahara ,  Hideaki Kimata ,  Shinya Shimizu ,  Kazuto Kamikura ,  Yoshiyuki Yashima

发明人： Masayuki Tanimoto ,  Toshiaki Fujii ,  Kenji Yamamoto ,  Masaki Kitahara ,  Hideaki Kimata ,  Shinya Shimizu ,  Kazuto Kamikura ,  Yoshiyuki Yashima

IPC分类号： H04N7/12 ,  H04N7/50

CPC分类号： H04N19/64 ,  H04N19/105 ,  H04N19/147 ,  H04N19/176 ,  H04N19/597 ,  H04N19/61

摘要： By using parallax compensation which performs prediction by using parallax between video images, the video images are encoded as a single video image. Reference parallax for a target image to be encoded is set, wherein the reference parallax is estimated using a reference image; area division in an image frame is set; parallax displacement for each divided area is set, wherein the parallax displacement is the difference between the reference parallax and parallax for the parallax compensation; data of the area division is encoded; and data for indicating the parallax displacement is encoded. During decoding, reference parallax for a target image to be decoded is set, wherein it is estimated using a reference image; data for indicating area division, which is included in encoded data, is decoded; and data of parallax displacement, which is included in the encoded data, is decoded for each area indicated by the area division data.

摘要翻译： 通过使用通过使用视频图像之间的视差执行预测的视差补偿，将视频图像编码为单个视频图像。 设置要编码的目标图像的参考视差，其中使用参考图像来估计参考视差; 设置图像帧中的区域划分; 设定每个分割区域的视差位移，其中视差位移是视差补偿的参考视差和视差之差; 区域划分的数据被编码; 并且用于指示视差位移的数据被编码。 在解码期间，设置要解码的目标图像的参考视差，其中使用参考图像来估计; 包含在编码数据中的用于指示区域划分的数据被解码; 并且包括在编码数据中的视差位移的数据对于由区域划分数据指示的每个区域被解码。

公开(公告)号：US08306264B2

公开(公告)日：2012-11-06

申请号：US12380432

申请日：2009-02-27

申请人： Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

发明人： Toshiaki Fujii ,  Junichi Tashiro ,  Mike Hassel-Shearer

IPC分类号： G06K9/00

CPC分类号： H01J37/28 ,  H01J37/3056 ,  H01J37/31 ,  H01J2237/28 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/67282 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54426 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： A section processing apparatus has a mark forming control portion that transmits control information for forming marks on a surface of a sample. Each of the marks has at least two portions intersecting at a converging portion located at a previously determined position of an observation target section of the sample or in the vicinity of the previously determined position. A first focused ion beam apparatus emits a first focused beam for forming each of the marks on the surface of the sample based on the control information transmitted by the mark forming control portion and for processing a section of the sample. The section of the sample is processed by scanning the first focused beam in parallel with the at least two portions of the marks in the direction of the converging portion, while the section of the sample and positions of the marks are observed by a second focused ion beam apparatus, and to finish processing of the section of the sample when the first focused beam reaches the converging portion or a vicinity thereof.

摘要翻译： 区段处理设备具有标记形成控制部分，其在样品的表面上传送用于形成标记的控制信息。 每个标记具有在位于样品的观察目标部分的预先确定的位置处的收敛部分或者在先前确定的位置附近的至少两个部分。 第一聚焦离子束装置基于由标记形成控制部分发送的控制信息和用于处理样品的一部分，发射用于形成样品表面上的每个标记的第一聚焦光束。 通过在收敛部分的方向上与标记的至少两个部分平行地扫描第一聚焦光束，同时样品的部分和标记的位置被第二聚焦离子 并且当第一聚焦光束到达会聚部分或其附近时，完成样品部分的处理。

公开(公告)号：US08274063B2

公开(公告)日：2012-09-25

申请号：US12733091

申请日：2008-08-06

申请人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Yoshitomo Nakagawa ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J49/00

CPC分类号： H01J37/08 ,  G01N1/04 ,  G01N1/06 ,  H01J37/3005 ,  H01J37/3056 ,  H01J2237/0807 ,  H01J2237/0817 ,  H01J2237/31745

摘要： A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.

摘要翻译： 复合聚焦离子束装置具有照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束用于处理或观察样品的第二离子束照射系统。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的等离子体型气体离子源，每个第一离子具有第一质量。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 每个第二离子具有比第一质量小的第二质量。

公开(公告)号：US20100176296A1

公开(公告)日：2010-07-15

申请号：US12733089

申请日：2008-08-06

申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

IPC分类号： H01J37/30 ,  H01J27/02 ,  H01J37/08 ,  H01J37/26

CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.

摘要翻译： 复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源， 从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

公开(公告)号：US07700367B2

公开(公告)日：2010-04-20

申请号：US10563515

申请日：2004-07-05

申请人： Toshiaki Fujii

发明人： Toshiaki Fujii

IPC分类号： G01N1/00

CPC分类号： H01J37/3005 ,  G01N1/32 ,  H01J37/304 ,  H01J37/3053 ,  H01J37/3056 ,  H01J2237/31745 ,  Y10T436/25

摘要： In a method of making a lamina specimen, first and second ion beams are simultaneously used to sputter etch first and second side walls of a lamina region at the same time under first and second ion beam conditions. A scanning ion microscope observation of the lamina region is made using the second ion beam while sputter etching of the first and second side walls is continued using the first ion beam until the thickness of the lamina has a predetermined value.

摘要翻译： 在制备薄片样品的方法中，第一和第二离子束同时用于在第一和第二离子束条件下同时溅射蚀刻层板区域的第一和第二侧壁。 使用第二离子束进行层状区域的扫描离子显微镜观察，同时使用第一离子束继续溅射蚀刻第一和第二侧壁，直到层的厚度具有预定值。

公开(公告)号：US07518125B2

公开(公告)日：2009-04-14

申请号：US11501629

申请日：2006-08-09

申请人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

发明人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

IPC分类号： G01N23/00

CPC分类号： G01N1/32

摘要： A processing apparatus uses a focused charged particle beam to process a micro sample that is supported on a micro mount part. The micro mount part is supported on a micro sample stage and locally cooled by a cooling unit. The micro mount part is thermally independent of the micro sample stage and, due to its small size, can be cooled rapidly by the cooling unit.

摘要翻译： 处理装置使用聚焦带电粒子束来处理支撑在微安装部件上的微样品。 微型安装部分支撑在微量样品台上，并由冷却单元局部冷却。 微型安装部件与微型样品台热独立，并且由于其小尺寸，可以通过冷却单元快速冷却。

公开(公告)号：US20070040128A1

公开(公告)日：2007-02-22

申请号：US11501629

申请日：2006-08-09

申请人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

发明人： Yo Yamamoto ,  Haruo Takahashi ,  Toshiaki Fujii

IPC分类号： H01J37/20

CPC分类号： G01N1/32

摘要： A sample to be observed or processed with a focused charged particle beam is formed small, and only the micro sample is locally cooled. Alternatively, a sample mount part is used which has the structure that can relax a thermal drift.

摘要翻译： 用聚焦带电粒子束观察或加工的样品形成较小，并且只有微样品局部冷却。 或者，使用具有可以放松热漂移的结构的样品安装部件。

公开(公告)号：US20060188946A1

公开(公告)日：2006-08-24

申请号：US11353603

申请日：2006-02-14

申请人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

发明人： Masanao Munekane ,  Hiroyuki Wada ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Takahiro Ochiya ,  Yusuke Yamamoto ,  Takumi Teratani

IPC分类号： G01N33/567 ,  G01N33/53

CPC分类号： G01N33/5088 ,  Y10T436/11

摘要： objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.

摘要翻译： 本发明要实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织成高水平，并且提供使用模拟解剖结构的纳米装置的方法。 本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。 在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。