摘要:
A light-sensitive diazonium group-containing polycondensation product of a diazonium salt corresponding to the general formula ##STR1## wherein R.sup.1, R.sup.2, and R.sup.3 denote hydrogen atoms, halogen atoms, alkyl groups having 1 to 3 carbon atoms or alkoxy groups having 1 to 6 carbon atoms, andX denotes the anion of the diazonium salt,and an aldehyde selected from the group consisting of dialdehydes, acetals of dialdehyde hydrates, and esters of dialdehyde hydrates, a process for producing such a light-sensitive polycondensation product and a light-sensitive recording material comprising a layer support and a light-sensitive layer containing such a light-sensitive polycondensation product.
摘要:
This invention relates to a photo-crosslinkable polymer comprising units with side chains having 2-pyrone groups therein. The invention also relates to processes for the preparation of the novel photo-crosslinkable polymers and to a photo-curable copying composition including the photo-crosslinkable polymer.
摘要:
Compounds of the general formula I ##STR1## are described in which R.sup.1 is a group of the formula ##STR2## and R.sup.2 is a hydrogen atom or a methyl group, orR.sup.1 and R.sup.2 jointly form an optionally substituted 5- or 6-membered ring,R.sup.3 is a hydrogen atom, a methyl group or an optionally substituted phenyl group,R.sup.4 is a hydrogen or halogen atom, a methyl group, an optionally substituted benzoyl group or a group of the formula ##STR3## n is zero or 1, X is a hydrogen or chlorine atom, an alkyl group containing 1 to 4 carbon atoms or one of the groups OA, CH.sub.2 OA, CH.sub.2 NHA or C.sub.2 H.sub.4 OA, andA is an acryloyl or methacryloyl group,the compounds containing in each case at least one group A. The compounds are suitable for the production of photoresists and printing plates as diffusion-resistant photoinitiators in photopolymerizable mixtures.
摘要翻译:描述了通式I的化合物(I),其中R 1是下式的基团,其中R 2是氢原子或甲基,或者R 1和R 2共同形成任选被取代的5-或6 R 3是氢原子,甲基或任意取代的苯基,R 4是氢或卤素原子,甲基,任意取代的苯甲酰基或下式的基团n是0或 1,X是氢或氯原子,含有1至4个碳原子的烷基或基团OA,CH2OA,CH2NHA或C2H4OA之一,A是丙烯酰基或甲基丙烯酰基,每种情况下含有至少一个 该组合物适用于在可光聚合混合物中制备光致抗蚀剂和印版作为扩散阻力的光引发剂。
摘要:
Disclosed is a compound of the general formula ##STR1## wherein L=H or CO--(R.sup.1).sub.n (CX.sub.3).sub.m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R.sup.1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.
摘要:
A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains:(a) a polymeric binder,(b) a compound of the formula: ##STR1## `in which A is O, NH or N-alkyl,Q is --CO--C.sub.p H.sub.2p -Z-- or --C.sub.k H.sub.2k O--,Z is O or NH,R.sup.1 is H or alkyl,R.sup.2 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or SO.sub.2 R.sup.3,R.sup.3 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or aryloxy,k is a number from 3 to 20,l is a number from 0 to 20,m is a number from 2 to 20,n is a number from 1 to 20 andp is a number from 2 to 10, and(c) a compound or a combination of compounds, which is capable of initiating the polymerization of the compound (b) under the action of actinic radiation.The mixture is especially suitable for the preparation of dry photoresist materials and is distinguished by good flexibility and adhesion to copper and by easy strippability in the light-cured state.