公开(公告)号：US06767402B2

公开(公告)日：2004-07-27

申请号：US10225196

申请日：2002-08-22

申请人： Yukichi Takamatsu ,  Takeo Yoneyama ,  Mitsuhiro Iwata ,  Koji Kiriyama ,  Kiichirou Araya

发明人： Yukichi Takamatsu ,  Takeo Yoneyama ,  Mitsuhiro Iwata ,  Koji Kiriyama ,  Kiichirou Araya

IPC分类号： C30B2502

CPC分类号： C23C16/4481

摘要： A vaporizing and supplying method for controlling a liquid CVD material in flow rate with liquid flow rate controllers, supplying a vaporizer with the material, vaporizing the same, and supplying a semiconductor manufacturing apparatus with the vaporized material, which includes installing in parallel, a plurality of liquid flow rate controllers, preferably each having a different controllable range of flow rate, and supplying the vaporizer with the material at a variable flow rate thereof by altering the single use of any of the controllers to the simultaneous use of a plurality thereof or vice versa, and/or switching any of the controllers one after another.

摘要翻译： 一种用液体流量控制器控制流速的液体CVD材料的蒸发和供应方法，向蒸发器供应材料，使其汽化，并向半导体制造设备提供蒸发的材料，其包括并联安装多个 的液体流量控制器，优选地每个具有不同的可控流量范围，并且通过改变任何控制器的单次使用来将蒸发器以可变流量提供给材料，以同时使用多个控制器或副 和/或相互切换任何控制器。