公开(公告)号：US20130010277A1

公开(公告)日：2013-01-10

申请号：US13618204

申请日：2012-09-14

申请人： Santiago del Puerto ,  Erik R. Loopstra ,  Andrew Massar ,  Duane P. Kish ,  Abdullah Alikhan ,  Woodrow J. Olsen ,  Jonathan H. Feroce

发明人： Santiago del Puerto ,  Erik R. Loopstra ,  Andrew Massar ,  Duane P. Kish ,  Abdullah Alikhan ,  Woodrow J. Olsen ,  Jonathan H. Feroce

IPC分类号： G03B27/58

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983 ,  G03F9/7011 ,  H01L21/67353 ,  H01L21/67359 ,  Y10S414/135

摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

摘要翻译： 描述了保护面罩免受空气传播颗粒污染的系统和方法。 这些系统和方法包括提供固定在两部分覆盖物中的掩模版。 两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。 盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。 在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。

公开(公告)号：US20120200835A1

公开(公告)日：2012-08-09

申请号：US13446436

申请日：2012-04-13

申请人： Motoko SUZUKI ,  Yukiharu Okubo

发明人： Motoko SUZUKI ,  Yukiharu Okubo

IPC分类号： G03B27/52

CPC分类号： H01L21/027 ,  G03F1/66 ,  G03F7/70741 ,  G03F9/7084 ,  H01L21/67353 ,  H01L21/67359

摘要： A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.

摘要翻译： 位置测量装置测量形成在掩模版的下表面上的位置测量标记的位置，从而测量掩模版的位置。 位置测量装置测量形成在下盖的下表面上的位置测量标记的位置，从而测量下盖的位置。 当掩模版的位置和下盖的位置是已知的时，标线片和下盖的相对位移是已知的。 因此，当将装载有掩模版的下盖带有承载装置并设置在曝光装置中时，通过考虑该位移来确定下盖的停止位置。 结果，可以将掩模版正确地设置在曝光装置中。

公开(公告)号：US20120132561A1

公开(公告)日：2012-05-31

申请号：US13367365

申请日：2012-02-06

申请人： James D. PYLANT ,  Alan L. WABER

发明人： James D. PYLANT ,  Alan L. WABER

IPC分类号： H01L21/67 ,  B65D85/30 ,  B28B7/20

CPC分类号： H01L21/67386 ,  H01L21/67353 ,  H01L21/67366 ,  H01L21/67369 ,  H01L21/67373 ,  H01L21/67379

摘要： Improvements in a semiconductor wafer container including improvements in side protection to the wafers, improved cover design to minimize rotation, a simplified top cover orientation mechanism and an improved bottom holding mechanism for automation. The side protection to the wafers is with multiple staggered inner and outer walls. The improved cover design improves alignment of the top and bottom housings and minimizes rotation of the housings in transit or motion. The housings have a recessed tab ramp feature with bi-directional locking that also increases the rigidity of the containment device when the two housings are assembled. The improved bottom holding mechanism for automation is an integrated feature that is molded into the bottom housing and not assembled in a secondary operation. The molded integration reduces tolerance errors that are present in assembling multiple pieces and joining multiple pieces.

公开(公告)号：US08083063B2

公开(公告)日：2011-12-27

申请号：US12726170

申请日：2010-03-17

申请人： Pao-Yi Lu ,  Sheng-Hung Wang

发明人： Pao-Yi Lu ,  Sheng-Hung Wang

IPC分类号： B65D85/48

CPC分类号： H01L21/67353 ,  G03F1/66 ,  H01L21/67359 ,  H01L21/67373

摘要： A reticle POD, comprising a top cover, a bottom cover, and a plurality of supporting components deployed in the four corners of the bottom cover, the supporting component comprising: a base body perpendicularly assembled, on two sides of which being disposed with mounting blocks; a pair of elastic elements respectively placed on the base body; a pair of leading elements connecting respectively to the horizontal extension of the elastic elements and then extending lengthwise to form a tip, a first bevel and a second bevel being formed on the side of the tip located on the inner side of the base body; a supporting base plate, the first and the second ends of which being connected to the second bevel of the leading element and a supporting pillar being disposed on the third end of the supporting base plate.

摘要翻译： 一种掩模版POD，包括顶盖，底盖和布置在底盖的四个角部中的多个支撑部件，支撑部件包括：垂直组装的基体，其两侧设置有安装块 ; 分别放置在基体上的一对弹性元件; 一对引导元件分别连接到弹性元件的水平延伸部分，然后纵向延伸以形成尖端，第一斜面和第二斜面形成在位于基体内侧的尖端上; 支撑基板，其第一端和第二端连接到引导元件的第二斜面，支撑柱设置在支撑基板的第三端上。

公开(公告)号：US20110049006A1

公开(公告)日：2011-03-03

申请号：US12606921

申请日：2009-10-27

申请人： JAMES D. PYLANT ,  ALAN L. WABER

发明人： JAMES D. PYLANT ,  ALAN L. WABER

IPC分类号： H01L21/673 ,  B65D85/90

CPC分类号： H01L21/67353 ,  H01L21/67373 ,  H01L21/67379 ,  H01L21/67386

摘要： Improvements in a semiconductor wafer container including improvements in side protection to the wafers, improved cover design to minimize rotation, a simplified top cover orientation mechanism and an improved bottom holding mechanism for automation. The side protection to the wafers is with multiple staggered inner and outer walls. The improved cover design improves alignment of the top and bottom housings and minimizes rotation of the housings in transit or motion. The housings have a recessed tab ramp feature with bi-directional locking that also increases the rigidity of the containment device when the two housings are assembled. The latching mechanism is located in a protective latch well that minimizes accidental opening of the latch(s). The improved bottom holding mechanism for automation is an integrated feature that is molded into the bottom housing and not assembled in a secondary operation.

摘要翻译： 半导体晶片容器的改进，包括对晶片的侧面保护的改进，改进的盖设计以使旋转最小化，简化的顶盖定向机构和用于自动化的改进的底部保持机构。 对晶片的侧面保护是具有多个交错的内壁和外壁。 改进的盖设计改善了顶部和底部壳体的对准，并最大限度地减少了运输或运动中壳体的旋转。 这些外壳具有带双向锁定的凹陷突出部斜面特征，当两个壳体组装时，这也增加了容纳装置的刚度。 闩锁机构位于保护闩锁孔中，以最小化闩锁的意外打开。 用于自动化的改进的底部保持机构是模制到底部壳体中并且未组装在二次操作中的集成特征。

公开(公告)号：US07850009B2

公开(公告)日：2010-12-14

申请号：US12005401

申请日：2007-12-27

申请人： Tzong-Ming Wu

发明人： Tzong-Ming Wu

IPC分类号： B65D85/90

CPC分类号： H01L21/67353 ,  G03F1/66 ,  H01L21/67359 ,  H01L21/67386 ,  H01L21/67396 ,  Y10T428/13

摘要： A clean container having an elastic positioning structure includes a support element and a back positioning element on a base. A cover is disposed for covering the base, and a positioning part is disposed between the cover and the base, which has two elastic arms extended laterally, and each elastic arm extends with a pushing surface respectively. When a plate of brittle material is placed on the base, and the cover is closed, the pushing surfaces are elastically pressed against and push the plate respectively, so that the plate moves backwards and presses against the back positioning element. Therefore, the plate is prevented from being damaged. Additionally, the base, the cover, and the positioning part are made of a conductive material, so that the electrostatic charges for the plate is conducted out of the clean container, and has a protective function of an electrostatic discharge.

摘要翻译： 具有弹性定位结构的干净的容器包括在基座上的支撑元件和后定位元件。 盖子被设置为覆盖基座，并且定位部分设置在盖子和基座之间，该定位部分具有横向延伸的两个弹性臂，并且每个弹性臂分别与推动表面一起延伸。 当将脆性材料板放置在基座上并且盖子关闭时，推动表面被弹性地按压并推动板，使得板向后移动并压靠在后定位元件上。 因此，防止板损坏。 此外，基座，盖和定位部分由导电材料制成，使得板的静电电荷被导出清洁容器，并且具有静电放电的保护功能。

公开(公告)号：US07581639B2

公开(公告)日：2009-09-01

申请号：US11518201

申请日：2006-09-11

申请人： Ming-Chien Chiu

发明人： Ming-Chien Chiu

IPC分类号： B65D85/48

CPC分类号： G03F7/70741 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67369

摘要： A photo mask retainer, mounted inside a photo mask delivery box for holding a photo mask, in which the photo mask retainer includes a base, a U-turn extending from the top of the rear side of the base and curving toward the top side of the base, a bearing portion formed on the free end of the U-turn for pressing on the vertical peripheral sidewall of the photo mask, a retaining end portion formed on the free end of the U-turn for pressing on the top surface of the photo mask, and a clamp extending from the front side of the base for fastening to a respective locating block on the wall surface of the photo mask delivery box

摘要翻译： 安装在用于保持光掩模的光掩模传送箱内的光掩模保持器，其中光掩模保持器包括基座，从基座的后侧的顶部延伸的U形转弯朝向 所述基座，形成在所述U形转弯的自由端上用于按压在所述光罩的垂直外周侧壁上的支承部，形成在所述U形转弯的自由端上的保持端部， 光掩模和从基座的前侧延伸的夹具，用于紧固到光掩模输送箱的壁表面上的相应定位块

公开(公告)号：US20090127159A1

公开(公告)日：2009-05-21

申请号：US12234651

申请日：2008-09-20

申请人： Sheng-Hung WANG

发明人： Sheng-Hung WANG

IPC分类号： B65D85/00

CPC分类号： H01L21/67353 ,  H01L21/67359 ,  H01L21/67393

摘要： The present invention provides a storage apparatus for storing a semiconductor element or a reticle and having a filter therein. The storage apparatus includes a first cover and a second cover, which are assembled together to form an inner space therebetween for accommodating a reticle or a semiconductor element. The second cover of the storage apparatus is composed of a body and a plate. Further, the second cover includes at least one aperture for communicating the inner space and an outer of the storage apparatus. The plate has a corresponding portion positionally corresponding to the aperture of the body. The filter is sandwiched between the body and the plate and covered the aperture so that when the air passes through the aperture of the body, the filter can filter and rid the air of impurities.

摘要翻译： 本发明提供一种用于存储半导体元件或掩模版并在其中具有滤光器的存储装置。 存储装置包括第一盖和第二盖，它们组装在一起以在其间形成用于容纳标线片或半导体元件的内部空间。 存储装置的第二盖由主体和板组成。 此外，第二盖包括用于连通内部空间的至少一个孔和存储装置的外部。 该板具有与主体的孔相对应的对应部分。 过滤器被夹在主体和板之间并覆盖孔，使得当空气通过主体的孔时，过滤器可以过滤和除去杂质的空气。

公开(公告)号：US20090116937A1

公开(公告)日：2009-05-07

申请号：US12180570

申请日：2008-07-28

申请人： Sheng-Hung WANG

发明人： Sheng-Hung WANG

IPC分类号： H01L21/677

CPC分类号： H01L21/67353 ,  H01L21/67359 ,  H01L21/67383

摘要： The present invention provides a storage apparatus, ex. reticle pod, FOUP, FOSB or any kind of wafer pod, for storing a semiconductor element, ex. wafer, or a reticle and having a filter module therein. The storage apparatus is composed of a first cover and a second cover, which are assembled together to form an inner space therebetween for accommodating a reticle or a semiconductor element. The second cover of the storage apparatus comprises at least one aperture for communicating the inner space and an exterior of the storage apparatus and a filter module for covering the aperture.

摘要翻译： 本发明提供一种存储装置，例如 掩模版盒，FOUP，FOSB或用于存储半导体元件的任何种类的晶片盒，例如。 晶片或掩模版，并且其中具有过滤器模块。 存储装置由第一盖和第二盖组成，它们组装在一起以在其间形成用于容纳标线片或半导体元件的内部空间。 存储装置的第二盖包括用于连通存储装置的内部空间和外部的至少一个孔和用于覆盖孔的过滤器模块。

公开(公告)号：US07453549B2

公开(公告)日：2008-11-18

申请号：US11235198

申请日：2005-09-27

申请人： Motoko Suzuki ,  Yukiharu Okubo

发明人： Motoko Suzuki ,  Yukiharu Okubo

IPC分类号： H01L21/027

CPC分类号： H01L21/027 ,  G03F1/66 ,  G03F7/70741 ,  G03F9/7084 ,  H01L21/67353 ,  H01L21/67359

摘要： A position measurement device 29 measures the position of a position measurement mark 26 formed on the lower surface of a reticle 1, thereby measuring the position of the reticle 1. A position measurement device 30 measures the position of the position measurement mark 27 formed on the lower surface of a lower lid 2b, thereby measuring the position of the lower lid 2b. The relative displacement of the reticle 1 and lower lid 2b is known when the position of the reticle 1 and the position of the lower lid 2b are known. Therefore, when the lower lid 2b having the reticle 1 loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid 2b is determined by taking this displacement into account. As a result, the reticle 1 can be correctly set in the exposure device.

摘要翻译： 位置测量装置29测量形成在标线片1的下表面上的位置测量标记26的位置，从而测量标线1的位置。 位置测量装置30测量形成在下盖2b的下表面上的位置测量标记27的位置，从而测量下盖2b的位置。 当标线片1的位置和下盖2b的位置已知时，标线片1和下盖2b的相对位移是已知的。 因此，当装载有掩模版1的下盖2b被携带携带装置并设置在曝光装置中时，通过考虑该位移来确定下盖2b的停止位置。 结果，可以将掩模版1正确地设置在曝光装置中。