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21.Production of binary shape-memory alloy films by sputtering using a hot pressed target 失效
标题翻译: 使用热压靶通过溅射制造二元形状记忆合金膜公开(公告)号:US06358380B1
公开(公告)日:2002-03-19
申请号:US09401085
申请日:1999-09-22
申请人: Gamdur Singh Mann , Carlos Augusto Valdes , Terry Jack Gold , Jinping Zhang , Fenglian Chang , Gregory Keller Rasmussen
发明人: Gamdur Singh Mann , Carlos Augusto Valdes , Terry Jack Gold , Jinping Zhang , Fenglian Chang , Gregory Keller Rasmussen
IPC分类号: C23C1434
CPC分类号: C23C14/3414 , C23C14/16
摘要: A method for producing thin film deposits of binary shape-memory alloys using an ion sputtering deposition process comprising using a hot pressed metal powder composition target.
摘要翻译: 一种使用使用热压金属粉末组合物靶的离子溅射沉积工艺制造二元形状记忆合金的薄膜沉积物的方法。