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21.发明申请EXPOSURE APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS MAINTENANCE METHOD, EXPOSURE APPARATUS ADJUSTMENT METHOD AND DEVICE MANUFACTURING METHOD 审中-公开曝光装置，曝光方法，曝光装置维护方法，曝光装置调整方法和装置制造方法公开(公告)号：US20120314193A1
公开(公告)日：2012-12-13
申请号：US13508630
申请日：2010-11-09
Applicant: Natsuko Sagawa , Katsushi Nakano , Kenichi Shiraishi
Inventor： Natsuko Sagawa , Katsushi Nakano , Kenichi Shiraishi
IPC: G03B27/58
CPC classification number: G03F7/70975 , G03F7/70541
Abstract: An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.
Abstract translation: 曝光装置通过液体使用曝光光来曝光基板。 曝光装置包括可释放地保持且能够移动基板的基板保持部，管理基板保持部能够保持的虚设基板的使用状态的管理装置。
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22.发明申请Substrate processing method, exposure apparatus, and method for producing device by immersing substrate in second liquid before immersion exposure through first liquid 审中-公开基板处理方法，曝光装置以及通过第一液体在浸渍曝光之前将基板浸渍在第二液体中来制造装置的方法
公开(公告)号：US20120008112A1
公开(公告)日：2012-01-12
申请号：US13137789
申请日：2011-09-13
Applicant: Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
Inventor： Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
IPC: G03B27/52
CPC classification number: G03F7/2041 , G03F7/38 , G03F7/70341 , G03F7/70925
Abstract: An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.
Abstract translation: 浸没型光刻设备包括至少一个浸没空间和浸没系统，其被配置为至少部分地用液体填充浸没空间。 该装置被配置为在装置用于将图案化的辐射束投射到基板之前用冲洗液冲洗至少部分浸没空间。
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公开(公告)号：US20110199594A1
公开(公告)日：2011-08-18
申请号：US13064867
申请日：2011-04-21
Applicant: Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
Inventor： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC: G03B27/52
CPC classification number: G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a flow passage in which exposure liquid flows, the flow passage being in fluidic communication with the space. The apparatus also includes a cleaning system which cleans the member.
Abstract translation: 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有流动通道的构件，曝气液体在该流动通道中，流动通道与该空间流体连通。 该装置还包括清洁构件的清洁系统。
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公开(公告)号：US20100283979A1
公开(公告)日：2010-11-11
申请号：US12588875
申请日：2009-10-30
Applicant: Katsushi Nakano , Munetaka Sugimoto , Shigeru Aoki , Shin Hirokawa
Inventor： Katsushi Nakano , Munetaka Sugimoto , Shigeru Aoki , Shin Hirokawa
IPC: G03B27/52
CPC classification number: G03F7/70925 , G03F7/70341 , G03F7/70733
Abstract: An exposure apparatus successively exposes each substrate of a plurality of substrates included in a lot with exposure light through a liquid. The exposure apparatus comprises: a movable substrate holding member that holds the substrate at a position whereto the exposure light can be radiated; and a liquid immersion member that is capable of forming an immersion space such that the liquid is held between the liquid immersion member and the substrate held by the substrate holding member and an optical path of the exposure light is filled with the liquid; wherein, before the start of exposure of a first substrate in the lot, the immersion space is formed between the liquid immersion member and a movable member, which is different from the first substrate, and at least one of the liquid immersion member and the movable member is cleaned.
Abstract translation: 曝光装置通过液体连续地曝光包含在批次中的多个基板的每个基板的曝光光。 曝光装置包括：可动基板保持部件，其将基板保持在能够照射曝光光的位置; 以及液浸部件，其能够形成浸渍空间，使得液体保持在浸液部件和由基板保持部件保持的基板之间，并且曝光光线的光路被液体填充; 其特征在于，在所述批次中的第一基板开始曝光之前，在所述浸液部件和与所述第一基板不同的可动部件之间形成所述浸没空间，以及所述浸液部件和所述可动部件 会员清理
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25.发明申请Substrate processing method, exposure apparatus, and method for producing device 审中-公开基板加工方法，曝光装置及其制造方法
公开(公告)号：US20080246931A1
公开(公告)日：2008-10-09
申请号：US12155714
申请日：2008-06-09
Applicant: Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
Inventor： Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
IPC: G03B27/52
CPC classification number: G03F7/2041 , G03F7/38 , G03F7/70341 , G03F7/70925
Abstract: An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.
Abstract translation: 浸没式光刻设备包括至少一个浸没空间和浸没系统，该沉浸系统构造成至少部分地用液体填充浸没空间。 该装置被配置为在装置用于将图案化的辐射束投射到基板之前用冲洗液冲洗至少部分浸没空间。
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公开(公告)号：US20080225249A1
公开(公告)日：2008-09-18
申请号：US12153354
申请日：2008-05-16
Applicant: Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
Inventor： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC: G03B27/52
CPC classification number: G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
Abstract: An exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate through exposure liquid filled in a space between the optical element and the substrate. The apparatus also includes a member having a surface and movable to a position at which the surface of the member faces the optical element. The apparatus also includes a cleaning system which cleans the surface of the member.
Abstract translation: 曝光装置包括光学元件，通过该光学元件，图案化的光束通过填充在光学元件和基板之间的空间中的曝光液体投影到基板上。 该装置还包括具有表面并可移动到构件的表面面向光学元件的位置的构件。 该装置还包括清洁构件表面的清洁系统。
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公开(公告)号：US20080218714A1
公开(公告)日：2008-09-11
申请号：US11919669
申请日：2006-05-23
Applicant: Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
Inventor： Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
CPC classification number: G03F7/70341 , G03F7/70258 , G03F7/705 , G03F7/70558
Abstract: An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.
Abstract translation: 曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化 基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。 根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。
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28.发明申请Substrate Processing Method, Exposure Apparatus, and Method For Producing Device 有权基板加工方法，曝光装置及其制造方法
公开(公告)号：US20080143980A1
公开(公告)日：2008-06-19
申请号：US11666165
申请日：2005-10-25
Applicant: Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
Inventor： Katsushi Nakano , Masahiko Okumura , Tarou Sugihara , Takeyuki Mizutani , Tomoharu Fujiwara
CPC classification number: G03F7/2041 , G03F7/38 , G03F7/70341 , G03F7/70925
Abstract: Disclosed is a substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.
Abstract translation: 公开了一种基板处理方法，其包括曝光步骤，其中在基板上形成第一液体的浸没面积，并且通过经由第一液体照射曝光光而使基板曝光，以及浸没步骤，其中浸没基板 在曝光步骤之前的第二液体。 通过这种方法，可以减少始终涉及浸渍曝光的附着标记引起的问题的发生。
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公开(公告)号：US20080030696A1
公开(公告)日：2008-02-07
申请号：US11808231
申请日：2007-06-07
Applicant: Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
Inventor： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC: G03B27/52
CPC classification number: G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
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公开(公告)号：US20080030695A1
公开(公告)日：2008-02-07
申请号：US11808230
申请日：2007-06-07
Applicant: Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
Inventor： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC: G03B27/52
CPC classification number: G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
Abstract: There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
