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公开(公告)号：US10656533B2
公开(公告)日：2020-05-19
申请号：US16106322
申请日：2018-08-21
Applicant: ASML Netherlands B.V.
Abstract: An apparatus and method for estimating a parameter of a lithographic process and an apparatus and method for determining a relationship between a measure of quality of an estimate of a parameter of a lithographic process are provided. In the apparatus for estimating the parameter a processor is configured to determine a quality of the estimate of the parameter relating to the tested substrate based on a measure of feature asymmetry in the at least first features of the tested substrate and further based on a relationship determined for a plurality of corresponding at least first features of at least one further substrate representative of the tested substrate, the relationship being between a measure of quality of an estimate of the parameter relating to the at least one further substrate and a measure of feature asymmetry in the corresponding first features.
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22.发明申请
公开(公告)号：US20200050114A1
公开(公告)日：2020-02-13
申请号：US16655434
申请日：2019-10-17
Applicant: ASML Netherlands B.V.
Inventor： Murat Bozkurt , Maurits Van Der Schaar , Patrick Warnaar , Martin Jacobus Johan Jak , Mohammadreza Hajiahmadi , Grzegorz Grzela , Lukasz Jerzy Macht
IPC: G03F7/20 , G01N21/95 , G01N21/956 , G01N21/47
Abstract: An overlay metrology target (600, 900, 1000) contains a plurality of overlay gratings (932-935) formed by lithography. First diffraction signals (740(1)) are obtained from the target, and first asymmetry values (As) for the target structures are derived. Second diffraction signals (740(2)) are obtained from the target, and second asymmetry values (As′) are derived. The first and second diffraction signals are obtained using different capture conditions and/or different designs of target structures and/or bias values. The first asymmetry signals and the second asymmetry signals are used to solve equations and obtain a measurement of overlay error. The calculation of overlay error makes no assumption whether asymmetry in a given target structure results from overlay in the first direction, in a second direction or in both directions. With a suitable bias scheme the method allows overlay and other asymmetry-related properties to be measured accurately, even in the presence of two-dimensional overlay structure.
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公开(公告)号：US10551308B2
公开(公告)日：2020-02-04
申请号：US15378962
申请日：2016-12-14
Applicant: ASML Netherlands B.V.
Inventor： Martin Jacobus Johan Jak , Armand Eugene Albert Koolen , Gerbrand Van Der Zouw , Dirk Karel Margaretha Broddin
IPC: G01N21/00 , G01N21/956 , G01N21/47 , G01N21/95 , G03F7/20
Abstract: An inspection apparatus includes an optical system, which has a radiation beam delivery system for delivering radiation to a target, and a radiation beam collection system for collecting radiation after scattering from the target. Both the delivery system and the collection system comprise optical components that control the characteristics of the radiation and the collected radiation. By controlling the characteristics of one or both of the radiation and collected radiation, the depth of focus of the optical system may be increased.
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公开(公告)号：US10338401B2
公开(公告)日：2019-07-02
申请号：US15694398
申请日：2017-09-01
Applicant: ASML Netherlands B.V.
Inventor： Gerbrand Van Der Zouw , Martin Jacobus Johan Jak , Martin Ebert
Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.
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25.发明授权
公开(公告)号：US10289008B2
公开(公告)日：2019-05-14
申请号：US15834763
申请日：2017-12-07
Applicant: ASML Netherlands B.V.
Inventor： Martin Jacobus Johan Jak
IPC: G03F7/20 , G01N21/95 , G01N21/956 , G03F9/00
Abstract: An overlay measurement (OV) is based on asymmetry in a diffraction spectrum of target structures formed by a lithographic process. Stack difference between target structures can be perceived as grating imbalance (GI), and the accuracy of the overlay measurement may be degraded. A method of predicting GI sensitivity is performed using first and second images (45+, 45−) of the target structure using opposite diffraction orders. Regions (ROI) of the same images are used to measure overlay. Multiple local measurements of symmetry (S) and asymmetry (A) of intensity between the opposite diffraction orders are made, each local measurement of symmetry and asymmetry corresponding to a particular location on the target structure. Based on a statistical analysis of the local measurements of symmetry and asymmetry values, a prediction of sensitivity to grating imbalance is obtained. This can be used to select better measurement recipes, and/or to correct errors caused by grating imbalance.
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公开(公告)号：US10133188B2
公开(公告)日：2018-11-20
申请号：US15387431
申请日：2016-12-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Martin Jacobus Johan Jak , Arie Jeffrey Den Boef , Martin Ebert
Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.
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公开(公告)号：US09633427B2
公开(公告)日：2017-04-25
申请号：US14839325
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
CPC classification number: G06T7/0004 , G03F7/705 , G03F7/70591 , G03F7/70633 , G06T7/11 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
Abstract: A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining (1204) a plurality of candidate regions of interest, each candidate region of interest comprising a plurality of pixels in the image; (c) defining (1208, 1216) an optimization metric value for the candidate regions of interest based at least partly on signal values of pixels within the region of interest; (d) defining (1208, 1216) a target signal function which defines a contribution of each pixel in the image to a target signal value. The contribution of each pixel depends on (i) which candidate regions of interest contain that pixel and (ii) optimization metric values of those candidate regions of interest.
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28.发明申请Illumination System, Inspection Apparatus Including Such an Illumination System, Inspection Method and Manufacturing Method 有权照明系统，包括这种照明系统的检查装置，检验方法和制造方法
公开(公告)号：US20160025992A1
公开(公告)日：2016-01-28
申请号：US14805402
申请日：2015-07-21
Applicant: ASML Netherlands B.V.
Inventor： Gerbrand VAN DER ZOUW , Martin Jacobus Johan Jak , Martin Ebert
CPC classification number: G02B27/283 , G01J1/08 , G01N21/8806 , G01N21/9501 , G01N2021/8848 , G01N2201/0675 , G02F1/01 , G03F7/70633
Abstract: In an illumination system (12, 13) for a scatterometer, first and second spatial light modulators lie in a common plane and are formed by different portions of a single liquid crystal cell (260). Pre-polarizers (250) apply polarization to first and second radiation prior to the spatial light modulators. A first spatial light modulator (236-S) varies a polarization state of the first radiation in accordance with a first programmable pattern. Second spatial light modulator (236-P) varies a polarization state of the second radiation accordance with a second programmable pattern. A polarizing beam splitter (234) selectively transmits each of the spatially modulated first and second radiation to a common output path, depending on the polarization state of the radiation. In an embodiment, functions of pre-polarizers are performed by the polarizing beam splitter.
Abstract translation: 在用于散射仪的照明系统（12,13）中，第一和第二空间光调制器位于公共平面中，并且由单个液晶单元（260）的不同部分形成。 预偏光器（250）在空间光调制器之前将偏振应用于第一和第二辐射。 第一空间光调制器（236-S）根据第一可编程模式改变第一辐射的偏振状态。 第二空间光调制器（236-P）根据第二可编程图案改变第二辐射的偏振状态。 偏振分束器（234）根据辐射的偏振状态选择性地将空间调制的第一和第二辐射中的每一个传输到公共输出路径。 在一个实施例中，预偏振器的功能由偏振分束器执行。
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29.发明授权
公开(公告)号：US09163935B2
公开(公告)日：2015-10-20
申请号：US13687569
申请日：2012-11-28
Applicant: ASML Netherlands B.V.
CPC classification number: G01B11/24 , G01B11/14 , G03F7/70633 , G03F9/7003 , G03F9/7049 , G03F9/7088 , G03F9/7092
Abstract: Disclosed is a device manufacturing method, and accompanying inspection and lithographic apparatuses. The method comprises measuring on the substrate a property such as asymmetry of a first overlay marker and measuring on the substrate a property such as asymmetry of an alignment marker. In both cases the asymmetry is determined. The position of the alignment marker on the substrate is then determined using an alignment system and the asymmetry information of the alignment marker and the substrate aligned using this measured position. A second overlay marker is then printed on the substrate; and a lateral overlay measured on the substrate of the second overlay marker with respect to the first overlay marker using the determined asymmetry information of the first overlay marker.
Abstract translation: 公开了一种器件制造方法，以及伴随的检查和光刻设备。 该方法包括在衬底上测量诸如第一覆盖标记的不对称性和在衬底上测量诸如对准标记的不对称性的特性。 在这两种情况下，确定不对称性。 然后使用对准系统确定对准标记在衬底上的位置，并使用该测量位置对准对准标记和衬底的不对称信息。 然后将第二覆盖标记印刷在基底上; 以及使用所确定的所述第一覆盖标记的不对称信息相对于所述第一覆盖标记在所述第二覆盖标记的基板上测量的横向覆盖。
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公开(公告)号：US20230016664A1
公开(公告)日：2023-01-19
申请号：US17873406
申请日：2022-07-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Kaustuve BHATTACHARYYA , Henricus Wilhelmus Maria Van Buel , Christophe David Fouquet , Hendrik Jan Hidde Smilde , Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Xing Lan Liu , Johannes Marcus Maria Beltman , Andreas Fuchs , Omer Abubaker Omer Adam , Michael Kubis , Martin Jacobus Johan Jak
Abstract: A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer.
