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32 条记录 (耗时 0.028 秒)

    EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
    21.
    发明申请
    EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD 审中-公开
    曝光装置和装置制造方法

    公开(公告)号：US20090225290A1

    公开(公告)日：2009-09-10

    申请号：US12395947

    申请日：2009-03-02

    申请人： Shinichi Shima ,  Tomohiko Yoshida ,  Ichiro Tanaka ,  Keiko Chiba

    发明人： Shinichi Shima ,  Tomohiko Yoshida ,  Ichiro Tanaka ,  Keiko Chiba

    IPC分类号： G03B27/52

    CPC分类号： G03B27/52 ,  G03F7/70341 ,  G03F7/70916

    摘要： The present invention provides an exposure apparatus which exposes a substrate via a liquid, the apparatus including a projection optical system configured to project a pattern of a reticle onto the substrate, a liquid supply unit configured to supply the liquid between the projection optical system and the substrate, a blowing nozzle which is arranged around the projection optical system on a side of the substrate and configured to blow a gas around the liquid supplied between the projection optical system and the substrate, and an exhaust unit configured to exhaust the gas in a space between the blowing nozzle and the liquid supplied between the projection optical system and the substrate, the exhaust unit including a removal member configured to remove a volatile component which volatilizes from the liquid and is contained in the gas in the space.

    摘要翻译： 本发明提供了一种通过液体曝光基板的曝光装置，该装置包括投影光学系统，该投影光学系统被配置为将掩模版的图案投影到基板上;液体供应单元，被配置为在投影光学系统和 基板，喷射喷嘴，其布置在所述基板的所述投影光学系统的周围，并且被配置为围绕所述投影光学系统和所述基板之间供应的液体吹送气体;以及排气单元，其构造成将空气排出空间 在喷射喷嘴和投影光学系统与基板之间供应的液体之间，排气单元包括移除部件，该去除部件被构造成去除从液体挥发并包含在空间中的气体中的挥发性成分。

    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
    22.
    发明申请
    EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    曝光装置和装置制造方法

    公开(公告)号：US20070177119A1

    公开(公告)日：2007-08-02

    申请号：US11670279

    申请日：2007-02-01

    申请人： Keiko Chiba

    发明人： Keiko Chiba

    IPC分类号： G03B27/42

    CPC分类号： G03D3/00 ,  G03F7/70341 ,  G03F7/707

    摘要： An exposure apparatus exposes a substrate via liquid, and includes a liquid holding plate configured to hold the liquid, and arranged around the substrate, and a chuck configured to hold the substrate, at least one of at least part of a surface of the liquid holding plate and at least part of a surface of the chuck being made of polyparaxylene resin or including a modified layer of polyparaxylene resin.

    摘要翻译： 曝光装置通过液体使基板曝光，并且包括被配置为保持液体并且布置在基板周围的液体保持板和构造成保持基板的卡盘，液体保持的表面的至少一部分中的至少一个 并且卡盘的表面的至少一部分由聚对二甲苯树脂制成或者包括聚对二甲苯树脂的改性层。

    Device manufacturing method
    24.
    发明授权
    Device manufacturing method 失效
    器件制造方法

    公开(公告)号：US06645707B2

    公开(公告)日：2003-11-11

    申请号：US09534334

    申请日：2000-03-24

    申请人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba ,  Yutaka Watanabe

    发明人： Mitsuaki Amemiya ,  Shunichi Uzawa ,  Keiko Chiba ,  Yutaka Watanabe

    IPC分类号： G03C556

    CPC分类号： G03F7/70466 ,  G03F7/2022

    摘要： A device manufacturing method includes a first exposure step for executing a multiple exposure of a first layer of a substrate by use of plural first masks, a development step for developing the first layer of the substrate and a second exposure step, executed after the development step, for executing a multiple exposure of a second layer of the substrate by use of plural second masks. A portion of at least one of the first masks has a pattern the same as a pattern formed in a portion of at least one of the second masks.

    摘要翻译： 一种器件制造方法包括：第一曝光步骤，用于通过使用多个第一掩模来执行衬底的第一层的多次曝光;显影步骤，用于显影衬底的第一层;以及第二曝光步骤，在显影步骤之后执行 ，用于通过使用多个第二掩模来执行所述基板的第二层的多次曝光。 第一掩模中的至少一个的一部分具有与形成在至少一个第二掩模的部分中的图案相同的图案。

    Exposure apparatus, and device manufacturing method
    25.
    发明授权
    Exposure apparatus, and device manufacturing method 失效
    曝光装置和装置制造方法

    公开(公告)号：US06449332B1

    公开(公告)日：2002-09-10

    申请号：US09538302

    申请日：2000-03-30

    申请人： Keiko Chiba

    发明人： Keiko Chiba

    IPC分类号： G21K500

    CPC分类号： G03F1/22 ,  G03F1/82 ,  G03F7/70741 ,  G03F7/70866 ,  G03F7/70925

    摘要： An exposure apparatus including an exposure system for executing an exposure operation by use of an exposure beam to transfer a pattern of a mask onto a substrate, the mask having a photocatalyst portion, an auxiliary space for irradiating, therewithin, the mask with an auxiliary radiation different from the exposure beam to accelerate photocatalytic reaction of the photocatalyst portion, and a humidity control system for controlling humidity inside the auxiliary space.

    摘要翻译： 一种曝光装置，包括用于通过使用曝光光束进行曝光操作以将掩模图案转印到基板上的曝光系统，所述掩模具有光催化部分，用于照射的辅助空间，所述掩模具有辅助辐射 与曝光光束不同，以加速光催化剂部分的光催化反应，以及用于控制辅助空间内的湿度的湿度控制系统。

    X-ray mask structure, and X-ray exposure method and apparatus using the same
    26.
    发明授权
    X-ray mask structure, and X-ray exposure method and apparatus using the same 失效
    X射线掩模结构和X射线曝光方法及使用其的装置

    公开(公告)号：US06418187B1

    公开(公告)日：2002-07-09

    申请号：US09349490

    申请日：1999-07-09

    申请人： Keiko Chiba ,  Shigeru Terashima

    发明人： Keiko Chiba ,  Shigeru Terashima

    IPC分类号： G21K500

    CPC分类号： G03F1/64 ,  G03F1/22 ,  G03F7/70866 ,  G03F7/70933 ,  G03F7/70983

    摘要： An X-ray mask structure and X-ray exposure method using the same are disclosed, wherein the mask has an X-ray absorptive material pattern, a supporting film for supporting the pattern, and a holding frame for holding the supporting film, wherein a suction port is arranged to be communicated with an external gas drawing system, and wherein a supply port is provided so that a gas can be supplied therethrough, for prevention of dust adhesion to the mask.

    摘要翻译： 公开了使用其的X射线掩模结构和X射线曝光方法，其中掩模具有X射线吸收材料图案，用于支撑图案的支撑膜和用于保持支撑膜的保持框架，其中 吸入口被设置成与外部气体抽吸系统连通，并且其中设置供应口以便可以通过其供应气体，以防止与面罩的灰尘附着。

    Mask structure and exposure method and apparatus using the same
    30.
    发明授权
    Mask structure and exposure method and apparatus using the same 失效
    掩模结构及使用其的曝光方法及装置

    公开(公告)号：US5846676A

    公开(公告)日：1998-12-08

    申请号：US710979

    申请日：1996-09-25

    申请人： Keiko Chiba ,  Takayuki Yagi

    发明人： Keiko Chiba ,  Takayuki Yagi

    IPC分类号： G21K1/02 ,  B81B1/00 ,  B81C1/00 ,  H01L21/027 ,  H01L21/306 ,  G03F9/00

    CPC分类号： G03F1/22

    摘要： An X-ray mask structure is produced by a procedure including the steps of preparing a substrate having a surface provided thereon with an X-ray transmitting film, forming, on the substrate, one of a metal film and a multilayered film, having alkali resistivity, removing a predetermined limited portion of the metal film, bonding the substrate and a reinforcing member through the remaining metal film, by an anodic bonding process wherein the remaining metal film functions as an electrically conductive material in the anodic bonding process, etching the substrate with the remaining metal film functioning as an etching mask, to define an X-ray transmitting portion of the X-ray transmitting film and forming a mask pattern by use of an X-ray absorptive material.

    摘要翻译： 通过以下步骤制造X射线掩模结构，该方法包括以下步骤制备其表面上设置有X射线透射膜的基板，在基板上形成具有碱电阻率的金属膜和多层膜之一 通过阳极接合工艺去除金属膜的预定限定部分，通过剩余的金属膜将衬底和加强构件接合，其中剩余的金属膜在阳极接合工艺中用作导电材料，用 用作蚀刻掩模的剩余金属膜，以限定X射线透射膜的X射线透射部分并且通过使用X射线吸收材料形成掩模图案。