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32 条记录 (耗时 0.044 秒)

    Photoresist compositions and methods of use in high index immersion lithography
    21.
    发明授权
    Photoresist compositions and methods of use in high index immersion lithography 失效
    光刻胶组合物和高指数浸渍光刻中使用的方法

    公开(公告)号：US08003309B2

    公开(公告)日：2011-08-23

    申请号：US12015436

    申请日：2008-01-16

    申请人： Hiroshi Ito ,  Daniel Paul Sanders ,  Linda Karin Sundberg

    发明人： Hiroshi Ito ,  Daniel Paul Sanders ,  Linda Karin Sundberg

    IPC分类号： G03F7/00

    CPC分类号： G03F7/2041 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397

    摘要： The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography.

    摘要翻译： 本发明涉及包含光致抗蚀剂聚合物和含氟聚合物的组合物。 在一个实施方案中，含氟聚合物包含具有选自脂环族双六氟异丙醇和芳基双 - 六氟异丙醇的侧基的第一单体，优选选自氟化苯乙烯和氟化乙烯基醚的第二单体。 本发明组合物具有改进的与浸渍光刻中使用的高折射率烃流体的后退接触角，从而提供浸没式光刻中的改进的性能。

    Methods of forming topographical features using segregating polymer mixtures
    22.
    发明授权
    Methods of forming topographical features using segregating polymer mixtures 有权
    使用分离聚合物混合物形成地形特征的方法

    公开(公告)号：US08734904B2

    公开(公告)日：2014-05-27

    申请号：US12957008

    申请日：2010-11-30

    申请人： Joy Cheng ,  Hayato Namai ,  Charles Thomas Rettner ,  Daniel Paul Sanders ,  Ratnam Sooriyakumaran

    发明人： Joy Cheng ,  Hayato Namai ,  Charles Thomas Rettner ,  Daniel Paul Sanders ,  Ratnam Sooriyakumaran

    IPC分类号： B81C1/00 ,  B82Y40/00 ,  H01L21/027

    CPC分类号： B81C1/00031 ,  B81C2201/0149 ,  H01L21/0337 ,  H01L21/0338

    摘要： Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain.

    摘要翻译： 公开了形成形貌特征的方法。 在一种方法中，提供预先图案化的结构，其包括i）具有表面的支撑构件和ii）用于拓扑地引导包括第一聚合物和第二聚合物的聚合物混合物的偏析的元件，所述元件包括具有 侧壁与表面相邻。 聚合物混合物设置在预图案化结构上，其中所设置的聚合物混合物与侧壁和表面接触。 第一聚合物和第二聚合物在平行于表面的平面中分离，从而形成包含第一聚合物结构域和第二聚合物结构域的分离结构。 第一聚合物结构域和/或第二聚合物结构域被光刻图案化，从而形成包括以下至少一个的拓扑特征：i）包含光刻图案化的第一聚合物结构域的第一特征和ii）包含光刻图案化的第二聚合物结构域的第二特征。

    Methods of directed self-assembly, and layered structures formed therefrom
    23.
    发明授权
    Methods of directed self-assembly, and layered structures formed therefrom 有权
    定向自组装的方法和由其形成的分层结构

    公开(公告)号：US08623458B2

    公开(公告)日：2014-01-07

    申请号：US12642018

    申请日：2009-12-18

    申请人： Joy Cheng ,  Matthew E. Colburn ,  Stefan Harrer ,  William D. Hinsberg ,  Steven J. Holmes ,  Ho-Cheol Kim ,  Daniel Paul Sanders

    发明人： Joy Cheng ,  Matthew E. Colburn ,  Stefan Harrer ,  William D. Hinsberg ,  Steven J. Holmes ,  Ho-Cheol Kim ,  Daniel Paul Sanders

    IPC分类号： B81C1/00 ,  C08J5/18 ,  C08J5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A layered structure comprising a self-assembled material is formed by a method that includes forming a photochemically, thermally and/or chemically treated patterned photoresist layer disposed on a first surface of a substrate. The treated patterned photoresist layer comprises a non-crosslinked treated photoresist. An orientation control material is cast on the treated patterned photoresist layer, forming a layer containing orientation control material bound to a second surface of the substrate. The treated photoresist and, optionally, any non-bound orientation control material are removed by a development process, resulting in a pre-pattern for self-assembly. A material capable of self-assembly is cast on the pre-pattern. The casted material is allowed to self-assemble with optional heating and/or annealing to produce the layered structure.

    摘要翻译： 包括自组装材料的层状结构通过包括形成设置在衬底的第一表面上的光化学，热和/或化学处理的图案化光致抗蚀剂层的方法形成。 经处理的图案化光刻胶层包括非交联处理的光致抗蚀剂。 将取向控制材料浇铸在经处理的图案化的光致抗蚀剂层上，形成包含与基材的第二表面结合的取向控制材料的层。 经处理的光致抗蚀剂和任选的任何未结合的取向控制材料通过显影过程被去除，从而形成用于自组装的预图案。 能够自组装的材料在预制图案上铸造。 允许铸造材料通过任选的加热和/或退火自组装以产生分层结构。

    Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates
    24.
    发明授权
    Method of preparing cyclic carbonates, cyclic carbamates, cyclic ureas, cyclic thiocarbonates, cyclic thiocarbamates, and cyclic dithiocarbonates 有权
    环状碳酸酯，环状氨基甲酸酯，环状脲，环状硫代碳酸酯，环状硫代氨基甲酸酯和环状二硫代碳酸酯的制备方法

    公开(公告)号：US08476428B2

    公开(公告)日：2013-07-02

    申请号：US13451225

    申请日：2012-04-19

    申请人： James Lupton Hedrick ,  Alshakim Nelson ,  Daniel Paul Sanders

    发明人： James Lupton Hedrick ,  Alshakim Nelson ,  Daniel Paul Sanders

    IPC分类号： C07D319/06 ,  C07D265/06

    CPC分类号： C07D319/06 ,  C07D239/10 ,  C07D265/10 ,  C07D327/06 ,  C07D339/08 ,  Y02P20/582

    摘要： A method of preparing a cyclic monomer, comprising: forming a first mixture comprising a precursor compound, bis(pentafluorophenyl)carbonate, and a catalyst; wherein the precursor compound has a structure comprising a) two or more carbons, and b) two functional groups selected from the group consisting of primary amine, secondary amine, thiol group, hydroxyl group, and combinations thereof; and agitating the first mixture at a temperature effective to form a second mixture comprising the cyclic monomer, the cyclic monomer selected from the group consisting of a cyclic carbonate, a cyclic carbamate, a cyclic urea, a cyclic thiocarbonate, a cyclic thiocarbamate, and a cyclic dithiocarbonate.

    摘要翻译： 一种制备环状单体的方法，包括：形成包含前体化合物，双（五氟苯基）碳酸酯和催化剂的第一混合物; 其中所述前体化合物具有包含a）两个或更多个碳的结构，和b）选自伯胺，仲胺，硫醇基，羟基及其组合的两个官能团; 并在有效形成包含环状单体的第二混合物的温度下搅拌第一混合物，所述环状单体选自环状碳酸酯，环状氨基甲酸酯，环状脲，环状硫代碳酸酯，环状硫代氨基甲酸酯和 环状二硫代碳酸酯。

    METHOD FOR DESIGNING OPTICAL LITHOGRAPHY MASKS FOR DIRECTED SELF-ASSEMBLY
    27.
    发明申请
    METHOD FOR DESIGNING OPTICAL LITHOGRAPHY MASKS FOR DIRECTED SELF-ASSEMBLY 有权
    用于指导自组装的光学绘图掩模的方法

    公开(公告)号：US20120331428A1

    公开(公告)日：2012-12-27

    申请号：US13606055

    申请日：2012-09-07

    申请人： Joy Cheng ,  Kafai Lai ,  Wai-Kin Li ,  Young-Hye Na ,  Jed Walter Pitera ,  Charles Thomas Rettner ,  Daniel Paul Sanders ,  Da Yang

    发明人： Joy Cheng ,  Kafai Lai ,  Wai-Kin Li ,  Young-Hye Na ,  Jed Walter Pitera ,  Charles Thomas Rettner ,  Daniel Paul Sanders ,  Da Yang

    IPC分类号： G06F17/50

    CPC分类号： G03F1/38 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/00 ,  G03F7/0002

    摘要： A method and a computer system for designing an optical photomask for forming a prepattern opening in a photoresist layer on a substrate wherein the photoresist layer and the prepattern opening are coated with a self-assembly material that undergoes directed self-assembly to form a directed self-assembly pattern. The methods includes: generating a mask design shape from a target design shape; generating a sub-resolution assist feature design shape based on the mask design shape; using a computer to generate a prepattern shape based on the sub-resolution assist feature design shape; and using a computer to evaluate if a directed self-assembly pattern of the self-assembly material based on the prepattern shape is within specified ranges of dimensional and positional targets of the target design shape on the substrate.

    摘要翻译： 一种用于设计光学掩模的方法和计算机系统，用于在基底上的光致抗蚀剂层中形成预模式开口，其中光致抗蚀剂层和预图案开口用自组装材料涂覆，所述自组装材料经过定向自组装以形成定向自身 装配模式 所述方法包括：从目标设计形状生成掩模设计形状; 基于掩模设计形状产生子分辨率辅助特征设计形状; 使用计算机基于子分辨率辅助特征设计形状生成预绘图形状; 并且使用计算机来评估基于预图案形状的自组装材料的定向自组装图案是否在基板上的目标设计形状的尺寸和位置目标的指定范围内。