公开(公告)号：US09962931B2

公开(公告)日：2018-05-08

申请号：US15544062

申请日：2015-02-18

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： Jordi Sender Beleta ,  Montserrat Sorano Pallarol ,  Marcos Casaldaliga Albisu ,  M. Isabel Borrell Bayona

IPC: B41J29/393 ,  B41J2/045 ,  B41J2/21

CPC classification number: B41J2/04556 ,  B41J2/04558 ,  B41J2/2146 ,  B41J25/308

Abstract: Examples include estimation of pen to paper spacing (PPS). Examples include an alignment pattern printed on a medium at a target speed, an optical scan procedure performed on the printed alignment pattern to determine values of cross-media misalignment for first and second portions of the alignment pattern, determination of a dynamic swath height error (DSHE) effect value based on the values of cross-media misalignment, and estimation of an amount of PPS based on the determined DSHE effect value and the target print speed.

公开(公告)号：US09770926B2

公开(公告)日：2017-09-26

申请号：US15310171

申请日：2014-05-21

Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.

Inventor： M. Isabel Borrell Bayona ,  Xavier Farina Vargas ,  Leticia Rubio ,  Utpal Kumar Sarkar

IPC: B41J2/21 ,  B41J2/155 ,  G06K15/10 ,  B41J25/308 ,  B41J2/045 ,  B41J29/393

CPC classification number: B41J25/308 ,  B41J2/04505 ,  B41J2/04508 ,  B41J2/155 ,  B41J2/2132 ,  B41J2/2139 ,  B41J2/2146 ,  B41J29/393 ,  B41J2202/21 ,  G06K15/102 ,  G06K15/105 ,  G06K15/107

Abstract: Example implementations relate to swath height error compensation. Some examples may determine a density of an image to be printed in an overlap area of a printing material. The overlap area may include target pixels capable of being printed by a first set of drop ejection elements and a second set of drop ejection elements that are redundant to the first set of drop ejection elements. Some implementations may also determine a mask to apply to the first and second set of drop ejection elements based on the determined density, and the mask may designate at least one additional drop to apply to at least one target pixel in the overlap area by at least one of the first and second set of drop ejection elements. Some implementations may also apply the mask to the first set of drop ejection elements and the second set of drop ejection elements.