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公开(公告)号:US07433016B2
公开(公告)日:2008-10-07
申请号:US11120176
申请日:2005-05-03
申请人: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
发明人: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
CPC分类号: G03F7/70341
摘要: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
摘要翻译: 浸没式光刻设备具有通过防止气泡从间隙中流入光束路径和/或提取可能在间隙中形成的气泡的方法来适应防止或减少衬底台中的一个或多个间隙中的气泡形成。
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公开(公告)号:US07602470B2
公开(公告)日:2009-10-13
申请号:US11212921
申请日:2005-08-29
申请人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下,从而获得单相液体流。 或者,多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号:US20110273675A1
公开(公告)日:2011-11-10
申请号:US13186123
申请日:2011-07-19
申请人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号: G03B27/52
CPC分类号: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下,从而获得单相液体流。 或者,多孔构件可以用于减少两相流中的不均匀性。
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公开(公告)号:US20120127441A1
公开(公告)日:2012-05-24
申请号:US13361443
申请日:2012-01-30
申请人: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
发明人: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Michel Riepen
IPC分类号: G03B27/52
CPC分类号: G03F7/70341
摘要: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
摘要翻译: 浸没式光刻设备具有通过防止气泡从间隙中流入光束路径和/或提取可能在间隙中形成的气泡的方法来适应防止或减少衬底台中的一个或多个间隙中的气泡形成。
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公开(公告)号:US20080259295A1
公开(公告)日:2008-10-23
申请号:US12213427
申请日:2008-06-19
申请人: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Meatens , Michel Riepen
发明人: Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Meatens , Michel Riepen
IPC分类号: G03B27/52
CPC分类号: G03F7/70341
摘要: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
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公开(公告)号:US08427629B2
公开(公告)日:2013-04-23
申请号:US12871631
申请日:2010-08-30
申请人: Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人: Carlo Cornelis Maria Luijten , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
CPC分类号: G03F7/70341
摘要: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
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公开(公告)号:US20090153823A1
公开(公告)日:2009-06-18
申请号:US12340362
申请日:2008-12-19
申请人: Carlo Cornelis Maria LUIJTEN , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
发明人: Carlo Cornelis Maria LUIJTEN , Sjoerd Nicolaas Lambertus Donders , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Bob Streefkerk , Marcel Beckers , Herman Boom , Richard Moerman
CPC分类号: G03F7/70341
摘要: An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.
摘要翻译: 浸没式光刻投影装置具有液体限制结构,其被配置为至少部分地将液体限制在投影系统和基板之间的空间上,所述约束结构在使用时具有缓冲表面,该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台,以限定具有流动阻力的通道。 在缓冲表面设置凹部,当使用时凹部通常充满浸没液体,以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的,并且可以设置多个凹部。
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公开(公告)号:US07474379B2
公开(公告)日:2009-01-06
申请号:US11167564
申请日:2005-06-28
CPC分类号: G03F7/70341
摘要: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
摘要翻译: 公开了一种浸没式光刻设备,其中液体被供应到投影系统和基板之间的空间,并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔,其中具有通孔以减小板的存在的阻尼效果,并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送,杂散光,温度梯度和/或气泡对成像质量的影响。
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公开(公告)号:US08848165B2
公开(公告)日:2014-09-30
申请号:US13369982
申请日:2012-02-09
IPC分类号: G03F7/20
CPC分类号: G03F7/70341
摘要: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
摘要翻译: 公开了一种浸没式光刻设备,其中液体被供应到投影系统和基板之间的空间,并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔,其中具有通孔以减小板的存在的阻尼效果,并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送,杂散光,温度梯度和/或气泡对成像质量的影响。
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公开(公告)号:US20120140192A1
公开(公告)日:2012-06-07
申请号:US13369982
申请日:2012-02-09
IPC分类号: G03B27/32
CPC分类号: G03F7/70341
摘要: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
摘要翻译: 公开了一种浸没式光刻设备,其中液体被供应到投影系统和基板之间的空间,并且提供板结构以将空间分成两部分。 板结构具有允许透射投影光束的孔,其中具有通孔以减小板的存在的阻尼效果,并且可选地具有一个或多个入口和出口以提供围绕板的孔的各种流动。 本发明的实施例可以减少污染物的输送,杂散光,温度梯度和/或气泡对成像质量的影响。
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