SUBSTRATE MOUNTING MECHANISM AND SUBSTRATE PROCESSING APPARATUS USING SAME
    21.
    发明申请
    SUBSTRATE MOUNTING MECHANISM AND SUBSTRATE PROCESSING APPARATUS USING SAME 失效
    基板安装机构和基板处理装置

    公开(公告)号:US20110024963A1

    公开(公告)日:2011-02-03

    申请号:US12848424

    申请日:2010-08-02

    申请人: Takeshi ITO

    发明人: Takeshi ITO

    IPC分类号: B23Q3/00

    CPC分类号: H01L21/67109 H01L21/68742

    摘要: A substrate mounting mechanism includes a substrate mounting table for mounting a substrate thereon; a heat source for supplying a heat or a cold heat to the substrate via the substrate mounting table; a substrate elevating member movable, having a substrate-supporting portion for supporting an end portion of the substrate, the substrate elevating member being upwardly and downwardly between a first position at which the substrate is mounted on the substrate mounting table and a second position that is located above the first position; and an elevating unit for upwardly and downwardly moving the substrate elevating member. The substrate elevating member serves as a part of the substrate mounting table at the first position.

    摘要翻译: 基板安装机构包括用于在其上安装基板的基板安装台; 用于经由所述基板安装台向所述基板供给热或冷热的热源; 可移动的基板升降构件,具有用于支撑基板的端部的基板支撑部分,基板升降构件在基板安装在基板安装台上的第一位置和第二位置之间向上和向下是第二位置, 位于第一位置之上; 以及用于使基板升降构件上下移动的升降单元。 基板升降构件在第一位置用作基板安装台的一部分。