公开(公告)号：US07595496B2

公开(公告)日：2009-09-29

申请号：US11812801

申请日：2007-06-21

申请人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

发明人： Joost Jeroen Ottens ,  Harmen Klaas Van Der Schoot ,  Jeroen Pieter Starreveld ,  Wouterus Johannes Petrus Maria Maas ,  Willem Jurrianus Venema ,  Boris Menchtchikov

IPC分类号： G21K5/00

CPC分类号： G03F7/70616 ,  G03F7/70783 ,  G03F7/70875

摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.

摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

公开(公告)号：USRE40043E1

公开(公告)日：2008-02-05

申请号：US10347491

申请日：1998-02-27

申请人： Yim-Bun Patrick Kwan ,  Gerrit Maarten Bonnema ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Gerjan Peter Veldhuis

发明人： Yim-Bun Patrick Kwan ,  Gerrit Maarten Bonnema ,  Erik Roelof Loopstra ,  Harmen Klaas Van Der Schoot ,  Gerjan Peter Veldhuis

IPC分类号： G03B27/42 ,  G03B11/00

CPC分类号： G03F7/70733 ,  B23Q1/621 ,  B23Q1/623 ,  B23Q11/0032 ,  G03F7/70716 ,  G03F7/70741 ,  G03F7/7075 ,  G03F7/709 ,  H01L21/682

摘要： A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions. The second displacement unit is suitable for carrying out a second series of positioning steps of the second object holder in the second position, simultaneously with and independently of the first displacement unit, and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position. The positioning device is suitable for use in a lithographic device to carry out an exposure process with a first semiconductor substrate in an exposure position and, simultaneously therewith and independently thereof, a characterization process with a second semiconductor substrate in a characterization position.

摘要翻译： 定位装置具有第一和第二物体保持器，所述第一和第二物体保持器被引导到平行于X方向并且平行于与X方向垂直的Y方向延伸的引导表面，并且可以在引导表面上从第一位置移动到 通过位移系统的第二位置。 位移系统包括第一位移单元和第二位移单元，物体保持器可以交替地联接到该位移单元。 第一位移单元适于在第一位置执行第一物体保持器的第一系列定位步骤，并且用于将第一物体保持器从第一位置移动到第一位置和第二位置之间的中间位置。 第二位移单元适于在与第一位移单元同时且独立于第二位置执行第二对象保持器的第二系列定位步骤，并且用于将第二物体保持器从第二位置移动到中间位置 。 在中间位置，更换物体保持器，之后可以通过第一位移单元执行第一系列定位步骤，使第二物体保持器处于第一位置，并且第二系列定位步骤可以由 第二位移单元，其中第一对象保持器处于第二位置。 该定位装置适用于光刻设备，以在曝光位置中与第一半导体衬底进行曝光处理，并且同时进行曝光处理，并且独立于此，具有表征位置的第二半导体衬底的表征过程。

公开(公告)号：US07088428B2

公开(公告)日：2006-08-08

申请号：US10797618

申请日：2004-03-11

申请人： Sven Antoin Johan Hol ,  Edwin Johan Buis ,  Harmen Klaas Van Der Schoot ,  Patricia Vreugdewater

发明人： Sven Antoin Johan Hol ,  Edwin Johan Buis ,  Harmen Klaas Van Der Schoot ,  Patricia Vreugdewater

IPC分类号： G03B27/42 ,  G03B27/62 ,  G03B27/58

CPC分类号： G03F7/70858 ,  G03F7/70758 ,  H02K9/22 ,  H02K41/0356

摘要： Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.

摘要翻译： 洛仑兹致动器由于场线圈中的电耗而产生热量。 当通过线圈的场变化时，在冷却元件中引起涡流，导致不期望的阻尼力和加热。 本发明提供了一种改进的设计，其通过在冷却元件中引入狭缝来减少涡流。 狭缝优选垂直于感应电场并且彼此平行，并且通过迫使它们采取更高电阻的路径来减小涡流的大小。

公开(公告)号：US06337484B1

公开(公告)日：2002-01-08

申请号：US09353664

申请日：1999-07-15

申请人： Erik Roelof Loopstra ,  Adrianus Gerardus Bouwer ,  Henricus W. A. Janssen ,  Harmen Klaas Van Der Schoot

发明人： Erik Roelof Loopstra ,  Adrianus Gerardus Bouwer ,  Henricus W. A. Janssen ,  Harmen Klaas Van Der Schoot

IPC分类号： G03B2758

CPC分类号： G03F7/70716

摘要： A positioning device comprising a first part and a second part which is displaceable relative to the first part by means of a system of Lorentz-force motors, whereby, relative to the first part, the second part is supported in a Z-direction by means of at least one gas cylinder, said gas cylinder comprising a housing having a pressure chamber, which housing is coupled to the first part; and a piston which is coupled to the second part and which can be displaced in the pressure chamber in the Z-direction, said piston being journaled relative to said housing substantially at right angles to the Z-direction.

摘要翻译： 一种定位装置，包括第一部分和第二部分，所述第一部分和第二部分可通过洛伦兹力马达系统相对于所述第一部分移动，由此相对于所述第一部分，所述第二部分通过装置以Z方向被支撑 至少一个气瓶，所述气瓶包括具有压力室的壳体，该壳体联接到第一部分; 以及联接到所述第二部分并且可以在所述压力室中沿Z方向移位的活塞，所述活塞相对于所述壳体基本上与Z方向成直角地轴颈。

公开(公告)号：US20140160452A1

公开(公告)日：2014-06-12

申请号：US14233361

申请日：2012-07-20

申请人： Pieter Willem Herman De Jager ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johnannes Stevens ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Sander Frederik Wuister

发明人： Pieter Willem Herman De Jager ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johnannes Stevens ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Sander Frederik Wuister

IPC分类号： B41C1/10

CPC分类号： B41C1/1091 ,  C23C14/28 ,  G03F7/70375 ,  G03F7/70383

摘要： A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate.

摘要翻译： 公开了一种光刻设备，其包括根据期望的图案调制多个光束的调制器和被调制的光束照射到的施主结构。 供体结构被配置为使得入射的调制光束使施主材料从施主结构转移到衬底。

公开(公告)号：US20110208459A1

公开(公告)日：2011-08-25

申请号：US13018226

申请日：2011-01-31

申请人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G06F19/00

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

公开(公告)号：US07256866B2

公开(公告)日：2007-08-14

申请号：US10961391

申请日：2004-10-12

申请人： Henrikus Herman Marie Cox ,  Hans Butler ,  Ronald Casper Kunst ,  Harmen Klaas Van Der Schoot ,  Youssef Karel Maria De Vos

发明人： Henrikus Herman Marie Cox ,  Hans Butler ,  Ronald Casper Kunst ,  Harmen Klaas Van Der Schoot ,  Youssef Karel Maria De Vos

IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70725

摘要： To enable high acceleration and high moving speed of a pattern support or a substrate table of a lithographic apparatus, one of the pattern support and the substrate table is supported by an actuator for relatively large displacements, whereas an actuator for accurately positioning is omitted. The other one of the pattern support and the substrate table is supported by an actuator assembly including an actuator for accurate positioning and an actuator for relatively large displacements. An alignment accuracy of a patterning device and a substrate is achieved by providing a control system that is adapted to position the other one of the pattern support and the substrate table such that a positioning error of the one of the pattern support and the substrate table is compensated by the positioning of the other one.

摘要翻译： 为了实现光刻设备的图形支撑件或基板台的高加速度和高移动速度，图案支撑件和基板台之一由用于较大位移的致动器支撑，而省略了用于精确定位的致动器。 图案支撑件和衬底台中的另一个由包括用于精确定位的致动器和用于相对较大位移的致动器的致动器组件支撑。 图案形成装置和基板的对准精度通过提供一种控制系统来实现，该控制系统适于将图案支撑件和基板台中的另一个定位成使得图案支撑件和基板台之一的定位误差为 通过另一个的定位来补偿。

公开(公告)号：US07440081B2

公开(公告)日：2008-10-21

申请号：US10981729

申请日：2004-11-05

申请人： Cheng-Qun Gui ,  Harmen Klaas Van Der Schoot

发明人： Cheng-Qun Gui ,  Harmen Klaas Van Der Schoot

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70783

摘要： A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of the substrate. The substrate table includes a support member having an upper support surface for supporting at least part of the target portion of the substrate on a fluid cushion. The apparatus further includes a fluid supply system arranged to supply fluid to the upper support surface so as to provide the cushion, and an actuator system arranged to act on the support member. The actuator system is controllable to provide adjustment of a topography of the upper support surface relative to a reference plane. Compensation can thus be made for substrate thickness irregularities, to achieve correct focusing of the beam onto the target surface.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于使辐射束在其横截面上具有图案的图案化系统，用于支撑衬底的衬底台，以及用于将图案化的射束投影的投影系统 到基板的目标部分上。 衬底台包括具有用于将衬底的目标部分的至少一部分支撑在流体衬垫上的上支撑表面的支撑构件。 该装置还包括流体供应系统，该流体供应系统布置成将流体供应到上部支撑表面以便提供缓冲垫，以及布置成作用在支撑构件上的致动器系统。 致动器系统是可控制的，以提供相对于参考平面调整上支撑表面的形貌。 因此可以对衬底厚度不规则进行补偿，以实现光束到目标表面的正确聚焦。

公开(公告)号：US07408617B2

公开(公告)日：2008-08-05

申请号：US11165575

申请日：2005-06-24

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot

IPC分类号： G03B27/42

CPC分类号： G03F7/70291 ,  G03F7/70625

摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The substrate table supports a substrate. The projection system projects the modulated radiation beam onto a target portion of the substrate, thereby applying a pattern to the target portion of the substrate. The pattern comprises a first line and a second line. The first line is offset from the second line. The position encoder determines a position of the substrate table. The position encoder comprises a position sensor and a scale. The scale comprises a plurality of lines intended to be straight and parallel to one another. The imaging device obtains an image of the first line and the second line. The image processing unit measures the separation between the first line and the second line in a plurality of locations, and determines the non-uniformity of at least a part of the scale from the plurality of separations.

摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，衬底台，投影系统，位置编码器，成像设备和图像处理单元。 照明系统调节辐射束。 独立可控元件的阵列调制辐射束的横截面。 衬底台支撑衬底。 投影系统将调制的辐射束投影到基板的目标部分上，从而将图案施加到基板的目标部分。 该图案包括第一行和第二行。 第一行偏离第二行。 位置编码器确定衬底台的位置。 位置编码器包括位置传感器和秤。 该刻度尺包括多条相互直线并平行的线。 成像装置获得第一行和第二行的图像。 图像处理单元测量多个位置中第一线和第二线之间的间隔，并且从多个分离中确定刻度的至少一部分的不均匀性。

公开(公告)号：US20080174750A1

公开(公告)日：2008-07-24

申请号：US12068071

申请日：2008-02-01

申请人： Michel Pieter Dansberg ,  Sebastiaan Maria Johannes Cornelissen ,  Henrikus Herman Marie Cox ,  Robert Johannes Petrus Van Diesen ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Klaas Van Der Schoot ,  Rob Jansen

发明人： Michel Pieter Dansberg ,  Sebastiaan Maria Johannes Cornelissen ,  Henrikus Herman Marie Cox ,  Robert Johannes Petrus Van Diesen ,  Nicolaas Rudolf Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Klaas Van Der Schoot ,  Rob Jansen

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7095

摘要： An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.

摘要翻译： 一种装置构造成定位工件。 该装置包括平面基座和被配置为支撑工件的可移动台。 该台被配置成在平面底座上移动。 该装置还包括构造成移动台的致动器，被配置为测量台的位置的非接触位置测量器以及被配置为在测量器和台之间的体积中产生经调节的气流的第一泵。 底座包括设置在基座中的多个气体通道，其提供调节气体流经基座的路径。