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公开(公告)号：US07295357B2
公开(公告)日：2007-11-13
申请号：US10537413
申请日：2004-04-19
申请人： Hiroshi Maehara
发明人： Hiroshi Maehara
IPC分类号： G02B5/32
CPC分类号： G03H1/0005 , G03H1/0244 , G03H1/2205 , G03H2001/0077 , G03H2001/0478 , G03H2001/085 , G03H2001/221 , G03H2210/55
摘要： An apparatus for handling a minute object such as a cell by using a holographic optical tweezers that comprises a laser light source 1, holographic plate 3 having a specified pattern to form a hologram with light emitted from the light source, and a transparent plate that holds a liquid including a minute object, wherein the holographic plate 3 is irradiated with laser light emitted from the laser light source 1, and the laser light passed through the holographic plate 3 is focused in a sample solution 7 held on the transparent plate 6 to form a hologram having a pattern according to the pattern of the holographic plate 3 in the sample solution 7.
摘要翻译： 一种用于通过使用全息光学镊子来处理诸如单元的微小物体的装置，其包括激光光源1，具有指定图案的全息板3，以从光源发射的光形成全息图;以及透明板，其保持 包含微小物体的液体，其中，从激光光源1发射的激光照射全息板3，并且穿过全息板3的激光聚焦在保持在透明板6上的样品溶液7中，以形成 具有根据样品溶液7中的全息板3的图案的图案的全息图。
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22.发明授权Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device 失效光敏树脂组合物，抗蚀剂组合物，图案化基板的制造方法和装置公开(公告)号：US07122297B2
公开(公告)日：2006-10-17
申请号：US10942890
申请日：2004-09-17
申请人： Hiroshi Maehara
发明人： Hiroshi Maehara
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/143 , Y10S430/167 , Y10S430/168
摘要： There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.
摘要翻译： 提供了至少含有具有糖结构的聚合物化合物的感光性树脂组合物，其具有在酸存在下可分离的官能团中的至少两种，通过电磁波的放射产生酸的光酸反应器，或 带电粒子束，另外还有抗蚀剂组合物，制造用于制造半导体器件的图案化衬底的方法等，以及诸如高度集成的半导体等的器件。
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23.发明授权Photosensitive resin, resist based on the photosensitive resin, exposure apparatus and exposure method using the resist, and semiconductor device obtained by the exposure method 失效感光树脂，基于光敏树脂的抗蚀剂，曝光装置和使用抗蚀剂的曝光方法，以及通过曝光方法获得的半导体器件公开(公告)号：US06225019B1
公开(公告)日：2001-05-01
申请号：US09244162
申请日：1999-02-04
申请人： Minoru Matsuda , Hiroshi Maehara , Keita Sakai
发明人： Minoru Matsuda , Hiroshi Maehara , Keita Sakai
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/039
摘要： Provided is a photosensitive resin with high sensitivity to exposure light. The photosensitive resin comprises a vinyl monomer moiety having an alicyclic group in a side chain thereof, and a sulfonyl moiety. B is an alicyclic group,
摘要翻译： 提供对曝光光具有高灵敏度的感光性树脂。 感光性树脂包含在侧链具有脂环基的乙烯基单体部分和磺酰基部分.B是脂环族基团，
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24.发明授权X-ray mask structure and a production method thereof, an exposure method using the X-ray mask structure, and a device fabricated by using the X-ray mask structure 失效X射线掩模结构及其制造方法，利用X射线掩模结构的曝光方法以及使用X射线掩模结构
公开(公告)号：US5375157A
公开(公告)日：1994-12-20
申请号：US91383
申请日：1993-07-15
申请人： Hiroshi Maehara
发明人： Hiroshi Maehara
IPC分类号： G03F1/22 , G03F7/20 , H01L21/027 , G03F1/00
CPC分类号： G03F1/22 , G03F7/70433
摘要： The present invention provides an X-ray mask structure a production method thereof, and an exposure method therefor, whereby patterns can be formed faithfully to designed device line widths regardless of the thickness distribution of an X-ray transmissive membrane. The present invention also provides a device exhibiting stable and high performance fabricated by means the X-ray mask structure. In accordance with the present invention, the X-ray mask structure comprises X-ray absorbers, an X-ray transmissive membrane for supporting the X-ray absorbers, and a supporting frame for supporting the X-ray transmissive membrane, wherein the line widths of the X-ray absorbers are compensated corresponding to the thickness distribution of the X-ray transmissive membrane so that the deviation of the line widths of transferred patterns from the desired line widths of the patterns may be cancelled. A method for producing the X-ray mask structure, an exposure method using the X-ray mask structure, and a device fabricated by use of the X-ray mask structure are also disclosed.
摘要翻译： 本发明提供了一种X射线掩模结构及其制造方法及其曝光方法，其中可以忠实地形成图案以设计设备线宽，而与X射线透射膜的厚度分布无关。 本发明还提供了一种显示出通过X射线掩模结构制造的稳定和高性能的器件。 根据本发明，X射线掩模结构包括X射线吸收体，用于支撑X射线吸收体的X射线透过膜，以及用于支撑X射线透过膜的支撑框架，其中线宽 对应于X射线透射膜的厚度分布来补偿X射线吸收体，从而可以消除转印图案的线宽与图案的所需线宽的偏差。 还公开了一种用于制造X射线掩模结构的方法，使用该X射线掩模结构的曝光方法和使用该X射线掩模结构制造的器件。
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公开(公告)号：US4602065A
公开(公告)日：1986-07-22
申请号：US651689
申请日：1984-09-18
CPC分类号： C08F8/42
摘要： A silicon-containing step ladder polymer comprising a unit represented by the following general formula (I): ##STR1## a unit represented by the following general formula (II): ##STR2## and a unit represented by the following general formula (III): ##STR3## where R.sup.1 represents a hydrocarbon or fluorine-substituted hydrocarbon group, R.sup.2 represents hydrogen or a trialkyl siloxy group, and R.sup.3 and R.sup.4 which may be identical or different with each other represent individually hydrocarbon or fluorine-substituted hydrocarbon groups, the molar ratio of the unit (I) to the unit (II) is between 5:1-100:1 and the molar ratio of the unit (III) to the total amount of the unit (I)+unit (II) is between 1:5-1:100, as well as a process for producing such polymer.
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公开(公告)号：US07019043B2
公开(公告)日：2006-03-28
申请号：US10611949
申请日：2003-07-03
申请人： Hiroshi Maehara
发明人： Hiroshi Maehara
CPC分类号： C08J11/12 , C08G63/672 , C08G63/916 , C08J2367/04 , C08K5/0033 , Y02W30/703 , C08L67/00
摘要： The invention provides a decomposable resin composition, which is stable at the time of use and which quickly decomposes when discarded. According to the present invention, there is provided a resin composition comprising an agent generating an acid or a base upon response to light or heat together with a hydrolyzable and biodegradable resin. The decomposable resin composition can promote decomposition of the polymer by generating an acid or a base in the resin by carrying out light irradiation and/or a heat treatment at a desired time and can control the decomposition speed of the polymer by controlling the generation amount of an acid or a base.
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公开(公告)号：US20060030675A1
公开(公告)日：2006-02-09
申请号：US11246110
申请日：2005-10-11
IPC分类号： C08C19/22 , C08F110/00
CPC分类号： C08J11/10 , C08F8/14 , C08F8/32 , C08F2810/40 , C08G81/021 , Y02W30/702 , C08F112/08
摘要： A novel resin is provided which is renewable with less energy. A process for renewing the resin is also provided. The present invention includes a polymer having the repeating unit represented by Structural Formula (1) below, and a process for producing the polymer: [—P1—R—]n (1). In the formula, P1 indicates an addition polymer moiety having a continuous hydrocarbon chain as the skeleton containing no condensation system, and is a polymer or oligomer prepared by addition polymerization of one or more monomers having a double bond; R indicates a linking group constituted of a condensation system for linking the polymer moieties P; and n is a number of repeating units and is an integer of 2 or more.
摘要翻译： 提供了一种新型树脂，可以以更少的能量再生。 还提供了更新树脂的方法。 本发明包括具有下述结构式（1）表示的重复单元的聚合物和聚合物的制备方法：[-P R - ] n < （1）。 在该式中，P 1'表示具有连续烃链作为不含缩合体系的骨架的加成聚合物部分，是通过一种或多种具有双键的单体的加成聚合制备的聚合物或低聚物 ; R表示由用于连接聚合物部分P的缩合体系构成的连接基团; n为重复单元数，为2以上的整数。
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28.发明授权Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus 失效掩模制造方法和使用由该方法或装置制造的掩模的装置和装置制造方法
公开(公告)号：US5593800A
公开(公告)日：1997-01-14
申请号：US367856
申请日：1995-01-03
CPC分类号： G03F7/70475 , G03F1/22 , G03F7/70358
摘要： A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
摘要翻译： 掩模制造方法包括：通过第一阶段保持具有图案的主掩模版，通过第二阶段保持掩模基板，将曝光光束投射到由第一平台保持的主光栅的图案上，并将图案投影到掩模上 基板以预定的缩小倍率保持第二阶段，并以定时关系和预定的速度比扫描第一和第二阶段，从而将主标线的图案转印到掩模基板。
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公开(公告)号：US08807761B2
公开(公告)日：2014-08-19
申请号：US13091670
申请日：2011-04-21
申请人： Hiroshi Maehara , Hiroyuki Inoue , Hideharu Saito , Takashi Omori
发明人： Hiroshi Maehara , Hiroyuki Inoue , Hideharu Saito , Takashi Omori
IPC分类号： G03B21/18
摘要： Cooling air conveyed through a cooling duct 3 is supplied to a discharge lamp 10 via a cooling air exit 21 having a plurality of flow paths 23a to 23c partitioned by a partition plate 22. An air flow direction changeover section 24 changes a flow path through which the discharge lamp is supplied with the cooling air from the cooling air exit. An air flow blocking ball 25 in the air flow direction changeover section moves by its own weight through a guide portion 26 to thereby block the flow path of the cooling air exit. This allows the cooling air to be directed specifically toward an upper side 11a in a direction of gravity of a lamp bulb of the discharge lamp to eliminate a temperature difference, even if a mounting style of the discharge lamp is varied among desk mounting, ceiling mounting, and vertical mounting.
摘要翻译： 通过冷却管道3输送的冷却空气经由具有由隔板22分隔的多个流路23a〜23c的冷却风出口21供给到放电灯10.空气流动方向切换部24改变流路， 放电灯从冷却空气出口被供给冷却空气。 空气流动方向切换部分中的气流阻塞球25通过引导部分26自身移动，从而阻挡冷却空气出口的流动路径。 由此，即使在台式安装，天花板安装之间，放电灯的安装方式不同，也可以将冷却空气朝着放电灯的灯泡的重力方向的上侧11a朝向上侧11a排除温度差 ，垂直安装。
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公开(公告)号：US07291679B2
公开(公告)日：2007-11-06
申请号：US11246110
申请日：2005-10-11
CPC分类号： C08J11/10 , C08F8/14 , C08F8/32 , C08F2810/40 , C08G81/021 , Y02W30/702 , C08F112/08
摘要： A novel resin is provided which is renewable with less energy. A process for renewing the resin is also provided. The present invention includes a polymer having the repeating unit represented by Structural Formula (1) below, and a process for producing the polymer: [—P1—R—]n (1). In the formula, P1 indicates an addition polymer moiety having a continuous hydrocarbon chain as the skeleton containing no condensation system, and is a polymer or oligomer prepared by addition polymerization of one or more monomers having a double bond; R indicates a linking group constituted of a condensation system for linking the polymer moieties P; and n is a number of repeating units and is an integer of 2 or more.
摘要翻译： 提供了一种新型树脂，可以以更少的能量再生。 还提供了更新树脂的方法。 本发明包括具有下述结构式（1）表示的重复单元的聚合物和聚合物的制备方法：[-P R - ] n < （1）。 在该式中，P 1'表示具有连续烃链作为不含缩合体系的骨架的加成聚合物部分，是通过一种或多种具有双键的单体的加成聚合制备的聚合物或低聚物 ; R表示由用于连接聚合物部分P的缩合体系构成的连接基团; n为重复单元数，为2以上的整数。
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