Photovoltaic element
    22.
    发明授权
    Photovoltaic element 失效
    光伏元件

    公开(公告)号:US5401330A

    公开(公告)日:1995-03-28

    申请号:US275274

    申请日:1994-07-15

    摘要: The present invention aims to provide a photovoltaic element which can maintain high initial characteristics over long term usage even under severe environments, and can be mass-produced with high yield.A photovoltaic element in which a light reflecting layer, a light reflection multiplying layer, an n-type layer, an i-type layer, and a p-type layer composed of a non-single crystal semiconductor material comprising at least silicon, and a transparent electrode are successively formed on a conductive substrate, characterized in that said light reflecting layer comprises silver or copper atoms as the main constituent and further contains at least one of oxygen, nitrogen, and carbon.Also, in another embodiment, this photovoltaic element is characterized in that said light reflecting layer comprises silver as the main constituent, and further contains lead, lead and gold, or lead, gold, and a first transition group metal in an amount of 2 to 100 ppm.

    摘要翻译: 本发明的目的在于提供即使在恶劣的环境下长期使用也能够维持高的初始特性的光电元件,能够大批量生产。 一种光电元件,其中包括至少包含硅的非单晶半导体材料构成的光反射层,光反射倍增层,n型层,i型层和p型层,以及 透明电极依次形成在导电性基板上,其特征在于,所述光反射层包含银或铜原子作为主要成分,并且还含有氧,氮和碳中的至少一种。 此外,在另一个实施方案中,该光电元件的特征在于,所述光反射层包含银作为主要成分,并且还含有铅,铅和金,或铅,金和第一过渡族金属,其量为2至 100 ppm。

    Semiconductor device containing microcrystalline germanium & method for
producing the same
    25.
    发明授权
    Semiconductor device containing microcrystalline germanium & method for producing the same 失效
    含有微晶锗的半导体装置及其制造方法

    公开(公告)号:US5599403A

    公开(公告)日:1997-02-04

    申请号:US489372

    申请日:1995-06-12

    摘要: The present invention provides photoelectric conversion elements, wherein the long wavelength sensitivity, the fill factor, and the photoelectric conversion efficiency are improved. In order to provide photoelectric conversion elements wherein light deterioration is reduced, the field durability enhanced, and the temperature characteristic improved, a p-layer composed of amorphous silicon type semiconductor containing hydrogen, an i-layer composed of amorphous silicon-germanium type semiconductor containing hydrogen and further including microcrystalline germanium, and an n-layer composed of amorphous silicon type semiconductor containing hydrogen are laminated on a substrate, the i-layer being formed at a substrate temperature from 400.degree. to 600.degree. C. by microwave plasma CVD, the particle diameter of said microcrystalline germanium ranging from 50 to 500 angstroms. Also, the content of microcrystalline germanium varies in the layer thickness direction.

    摘要翻译: 本发明提供光电转换元件,其中提高了长波长灵敏度,填充因子和光电转换效率。 为了提供光劣化降低的光电转换元件,提高了场耐久性,提高了温度特性,由含有氢的非晶硅型半导体构成的p层,由含有氢的非晶硅锗型半导体构成的i层 氢并且还包括微晶锗,并且由含有氢的非晶硅型半导体构成的n层层叠在基板上,所述i层通过微波等离子体CVD在400〜600℃的基板温度下形成, 所述微晶锗的粒径为50-500埃。 此外,微晶锗的含量在层厚度方向上变化。

    Method for repairing an electrically short-circuited semiconductor
device, and process for producing a semiconductor device utilizing said
method
    27.
    发明授权
    Method for repairing an electrically short-circuited semiconductor device, and process for producing a semiconductor device utilizing said method 失效
    用于修复电短路的半导体器件的方法,以及利用所述方法制造半导体器件的工艺

    公开(公告)号:US5281541A

    公开(公告)日:1994-01-25

    申请号:US755439

    申请日:1991-09-05

    摘要: A method for repairing a defective semiconductor device, the defective semiconductor device including a semiconductor thin film and a conductive thin film, disposed in the named order, on a conductive surface of a substrate, such that the conductive thin film and the conductive surface of the substrate are electrically short-circuited at a pinhole occurring in the semiconductor thin film to form an electrically short-circuited portion. The method includes the steps of applying desired a voltage through an electrode positioned above a surface of the defective semiconductor device, and moving the electrode along the surface of the defective semiconductor device while maintaining a distance between the electrode and the conductive thin film sufficient to allow a discharge to occur when the electrode is above the electrically short-circuited portion, such that the discharge modifies a region of the conductive thin film which is in electrical contact with the conductive surface of the substrate, to establish an electrically noncontacted state between the conductive thin film and the conductive surface of the substrate.

    摘要翻译: 一种用于修复有缺陷的半导体器件的方法,所述有缺陷的半导体器件包括半导体薄膜和导电薄膜,其以所述的顺序设置在衬底的导电表面上,使得导电薄膜和导电薄膜的导电表面 衬底在半导体薄膜中出现的针孔处电短路以形成电短路部分。 该方法包括以下步骤:通过位于缺陷半导体器件的表面上方的电极施加所需的电压,并且沿着有缺陷的半导体器件的表面移动电极,同时保持电极和导电薄膜之间的距离足以允许 当电极在电气短路部分之上时,发生放电,使得放电改变与衬底的导电表面电接触的导电薄膜的区域,以在导电之间建立电非接触状态 薄膜和基板的导电表面。