公开(公告)号：US11182031B2

公开(公告)日：2021-11-23

申请号：US17089476

申请日：2020-11-04

Applicant: LG Display Co., Ltd.

Inventor： Jeonghoon Lee ,  JaeWon Lee ,  Sungjin Kim ,  Jaehyung Jang ,  Hyangmyoung Gwon

IPC: G06F3/044 ,  H01L51/52 ,  H01L27/32 ,  G06F3/041

Abstract: Disclosed is a display device which facilitates to prevent a remaining film for a process of forming a metal pattern, wherein the display device may include a substrate including a display area having pixels, and a non-display area having pads to surround the display area, a dam between the display area and the pads, an encapsulation film for covering the dam and the pixels in the display area, a first metal pattern disposed in the non-display area and patterned on the encapsulation film, an insulating layer provided on the first metal pattern, and a second metal pattern disposed in the non-display area and patterned on the insulating layer, wherein the first metal pattern is not provided in a dam area with the dam, and the second metal pattern is provided on the dam area while being in contact with the first metal pattern via a contact hole penetrating through the insulating layer.

公开(公告)号：US20190036063A1

公开(公告)日：2019-01-31

申请号：US16038055

申请日：2018-07-17

Applicant: LG Display Co., Ltd.

Inventor： Jeonghoon Lee ,  JaeWon Lee ,  Sungjin Kim ,  Jaehyung Jang ,  Hyangmyoung Gwon

IPC: H01L51/52 ,  G06F3/044 ,  G06F3/041 ,  H01L27/32

Abstract: Disclosed is a display device which facilitates to prevent a remaining film for a process of forming a metal pattern, wherein the display device may include a substrate including a display area having pixels, and a non-display area having pads to surround the display area, a dam between the display area and the pads, an encapsulation film for covering the dam and the pixels in the display area, a first metal pattern disposed in the non-display area and patterned on the encapsulation film, an insulating layer provided on the first metal pattern, and a second metal pattern disposed in the non-display area and patterned on the insulating layer, wherein the first metal pattern is not provided in a dam area with the dam, and the second metal pattern is provided on the dam area while being in contact with the first metal pattern via a contact hole penetrating through the insulating layer.