公开(公告)号：US06337484B1

公开(公告)日：2002-01-08

申请号：US09353664

申请日：1999-07-15

申请人： Erik Roelof Loopstra ,  Adrianus Gerardus Bouwer ,  Henricus W. A. Janssen ,  Harmen Klaas Van Der Schoot

发明人： Erik Roelof Loopstra ,  Adrianus Gerardus Bouwer ,  Henricus W. A. Janssen ,  Harmen Klaas Van Der Schoot

IPC分类号： G03B2758

CPC分类号： G03F7/70716

摘要： A positioning device comprising a first part and a second part which is displaceable relative to the first part by means of a system of Lorentz-force motors, whereby, relative to the first part, the second part is supported in a Z-direction by means of at least one gas cylinder, said gas cylinder comprising a housing having a pressure chamber, which housing is coupled to the first part; and a piston which is coupled to the second part and which can be displaced in the pressure chamber in the Z-direction, said piston being journaled relative to said housing substantially at right angles to the Z-direction.

摘要翻译： 一种定位装置，包括第一部分和第二部分，所述第一部分和第二部分可通过洛伦兹力马达系统相对于所述第一部分移动，由此相对于所述第一部分，所述第二部分通过装置以Z方向被支撑 至少一个气瓶，所述气瓶包括具有压力室的壳体，该壳体联接到第一部分; 以及联接到所述第二部分并且可以在所述压力室中沿Z方向移位的活塞，所述活塞相对于所述壳体基本上与Z方向成直角地轴颈。

公开(公告)号：US20140160452A1

公开(公告)日：2014-06-12

申请号：US14233361

申请日：2012-07-20

申请人： Pieter Willem Herman De Jager ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johnannes Stevens ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Sander Frederik Wuister

发明人： Pieter Willem Herman De Jager ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johnannes Stevens ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Sander Frederik Wuister

IPC分类号： B41C1/10

CPC分类号： B41C1/1091 ,  C23C14/28 ,  G03F7/70375 ,  G03F7/70383

摘要： A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate.

摘要翻译： 公开了一种光刻设备，其包括根据期望的图案调制多个光束的调制器和被调制的光束照射到的施主结构。 供体结构被配置为使得入射的调制光束使施主材料从施主结构转移到衬底。

公开(公告)号：US20110208459A1

公开(公告)日：2011-08-25

申请号：US13018226

申请日：2011-01-31

申请人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

发明人： Hans Butler ,  Emiel Jozef Melanie Eussen ,  Willem Herman Gertruda Anna Koenen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot ,  Marc Wilhelmus Maria Van Der Wijst ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Cornelius Adrianus Lambertus De Hoon

IPC分类号： G06F19/00

CPC分类号： G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

摘要翻译： 光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

公开(公告)号：US20100085553A1

公开(公告)日：2010-04-08

申请号：US12639457

申请日：2009-12-16

申请人： Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

发明人： Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

IPC分类号： G03B27/58 ,  G03B27/32

CPC分类号： G03F7/7075 ,  G03F7/70691 ,  G03F7/70733 ,  G03F7/70791

摘要： A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.

摘要翻译： 提供衬底处理器。 衬底处理器包括被配置为承载衬底的支撑表面和被配置为预处理衬底的预调节单元。 衬底处理器被配置为相对于衬底台移动衬底。

公开(公告)号：US07656506B2

公开(公告)日：2010-02-02

申请号：US11320494

申请日：2005-12-29

申请人： Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

发明人： Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/7075 ,  G03F7/70691 ,  G03F7/70733 ,  G03F7/70791

摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.

摘要翻译： 一种用于相对于光刻设备的衬底台移动衬底的衬底处理器。 衬底处理器包括至少一个支撑表面或平台，其适于同时承载多个独立衬底。 衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。

公开(公告)号：US07576835B2

公开(公告)日：2009-08-18

申请号：US11175037

申请日：2005-07-06

申请人： Harmen Klaas Van Der Schoot ,  Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Petrus Matthijs Henricus Vosters ,  Johannes Martinus Andreas Hazenberg ,  Aart Adrianus Van Beuzekom

发明人： Harmen Klaas Van Der Schoot ,  Hernes Jacobs ,  Bernardus Antonius Johannes Luttikhuis ,  Petrus Matthijs Henricus Vosters ,  Johannes Martinus Andreas Hazenberg ,  Aart Adrianus Van Beuzekom

IPC分类号： G03B27/58 ,  G03B27/52

CPC分类号： G03F7/70875 ,  G03F7/7075

摘要： Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.

摘要翻译： 本发明的实施例涉及一种用于处理基板的基板处理器，包括用于调节基板的调节装置。 在一个实施例中，衬底处理器包括移位装置，其配置成在基本上平行于支撑表面的方向上移动衬底，其中，移位装置构造成在调节过程期间将衬底从一个调节位置移位到一个或多个其他调节 职位 根据本发明的另一实施例，衬底处理器包括用于在衬底处理器的支撑表面上方提供空气床的浮动装置，衬底处理器被配置为在衬底调节期间将衬底支撑在空气床上。

公开(公告)号：US07256867B2

公开(公告)日：2007-08-14

申请号：US11018928

申请日：2004-12-22

申请人： Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

发明人： Bernardus Antonius Johannes Luttikhuis ,  Harmen Klaas Van Der Schoot ,  Petrus Matthijs Henricus Vosters

IPC分类号： G03B27/42

CPC分类号： G03F7/70991 ,  G03F7/70616 ,  G03F7/70733

摘要： A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.

摘要翻译： 光刻方法和装置包括提供辐射束的照明系统，对光束进行图案化的图案形成装置，以及将图案化光束投影到基板的目标部分上的投影系统。 在投影系统附近提供了一种计量系统，用于将基板与投影系统对准。 两个或更多个可移动卡盘分别布置成支撑基板并在加载装置和投影系统之间移动。 卡盘可独立移动，使得一个基板可以通过计量系统和图案化梁，同时其它基板在装载系统和投影系统之间移动。

公开(公告)号：US20050269525A1

公开(公告)日：2005-12-08

申请号：US10860654

申请日：2004-06-04

申请人： Martinus Arnoldus Henricus Terken ,  Hernes Jacobs ,  Harmen Klaas Van Der Schoot ,  Petrus M. H. Vosters ,  Koen J. J. M. Zaal

发明人： Martinus Arnoldus Henricus Terken ,  Hernes Jacobs ,  Harmen Klaas Van Der Schoot ,  Petrus M. H. Vosters ,  Koen J. J. M. Zaal

IPC分类号： H01L21/027 ,  G03F7/20 ,  H01J37/20

CPC分类号： G03F7/70716

摘要： A lithographic apparatus is provided. The apparatus includes an illumination system that conditions a beam of radiation, an article support member that supports an article to be placed in a beam path of the beam of radiation on the article support, and a movable carriage for moving the article support member. The carriage includes a compartmented composite structure provided with a non-composite mounting interface and/or cooling interface With such an arrangement, conventional interfacing using, for example metal or ceramic materials, can be applied in combination with the advantages of composite structures, such as a low specific weight, a high Young's modulus at places and directions where required, high strength, high stability, and high electrical resistivity.

摘要翻译： 提供光刻设备。 该装置包括照射辐射束的照明系统，支撑待放置在物品支撑件上的辐射束的光束路径中的物品的物品支撑构件以及用于移动物品支撑构件的可移动托架。 托架包括设置有非复合安装界面和/或冷却界面的分隔复合结构。通过这种布置，使用例如金属或陶瓷材料的常规接口可以与复合结构的优点结合使用，诸如 低比重，高的杨氏模量和需要的方向，高强度，高稳定性和高电阻率。

公开(公告)号：US07440081B2

公开(公告)日：2008-10-21

申请号：US10981729

申请日：2004-11-05

申请人： Cheng-Qun Gui ,  Harmen Klaas Van Der Schoot

发明人： Cheng-Qun Gui ,  Harmen Klaas Van Der Schoot

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70783

摘要： A lithographic apparatus includes an illumination system to supply a beam of radiation, a patterning system serving to impart the beam of radiation with a pattern in its cross-section, a substrate table to support a substrate, and a projection system to project the patterned beam onto a target portion of the substrate. The substrate table includes a support member having an upper support surface for supporting at least part of the target portion of the substrate on a fluid cushion. The apparatus further includes a fluid supply system arranged to supply fluid to the upper support surface so as to provide the cushion, and an actuator system arranged to act on the support member. The actuator system is controllable to provide adjustment of a topography of the upper support surface relative to a reference plane. Compensation can thus be made for substrate thickness irregularities, to achieve correct focusing of the beam onto the target surface.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于使辐射束在其横截面上具有图案的图案化系统，用于支撑衬底的衬底台，以及用于将图案化的射束投影的投影系统 到基板的目标部分上。 衬底台包括具有用于将衬底的目标部分的至少一部分支撑在流体衬垫上的上支撑表面的支撑构件。 该装置还包括流体供应系统，该流体供应系统布置成将流体供应到上部支撑表面以便提供缓冲垫，以及布置成作用在支撑构件上的致动器系统。 致动器系统是可控制的，以提供相对于参考平面调整上支撑表面的形貌。 因此可以对衬底厚度不规则进行补偿，以实现光束到目标表面的正确聚焦。

公开(公告)号：US07408617B2

公开(公告)日：2008-08-05

申请号：US11165575

申请日：2005-06-24

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Harmen Klaas Van Der Schoot

IPC分类号： G03B27/42

CPC分类号： G03F7/70291 ,  G03F7/70625

摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The substrate table supports a substrate. The projection system projects the modulated radiation beam onto a target portion of the substrate, thereby applying a pattern to the target portion of the substrate. The pattern comprises a first line and a second line. The first line is offset from the second line. The position encoder determines a position of the substrate table. The position encoder comprises a position sensor and a scale. The scale comprises a plurality of lines intended to be straight and parallel to one another. The imaging device obtains an image of the first line and the second line. The image processing unit measures the separation between the first line and the second line in a plurality of locations, and determines the non-uniformity of at least a part of the scale from the plurality of separations.

摘要翻译： 光刻设备包括照明系统，独立可控元件的阵列，衬底台，投影系统，位置编码器，成像设备和图像处理单元。 照明系统调节辐射束。 独立可控元件的阵列调制辐射束的横截面。 衬底台支撑衬底。 投影系统将调制的辐射束投影到基板的目标部分上，从而将图案施加到基板的目标部分。 该图案包括第一行和第二行。 第一行偏离第二行。 位置编码器确定衬底台的位置。 位置编码器包括位置传感器和秤。 该刻度尺包括多条相互直线并平行的线。 成像装置获得第一行和第二行的图像。 图像处理单元测量多个位置中第一线和第二线之间的间隔，并且从多个分离中确定刻度的至少一部分的不均匀性。