Focused ion beam apparatus and focused ion beam irradiation method
    21.
    发明申请
    Focused ion beam apparatus and focused ion beam irradiation method 有权
    聚焦离子束装置和聚焦离子束照射法

    公开(公告)号:US20060022150A1

    公开(公告)日:2006-02-02

    申请号:US11189901

    申请日:2005-07-27

    IPC分类号: H01J1/50

    摘要: A focused ion beam apparatus and a focused ion beam irradiation method are disclosed. Even in the case where a magnetic field exists on the optical axis of an ion beam and the particular magnetic field undergoes a change, the ion beam is focused without separating the isotopes on the sample at the same ion beam spot position as if the magnetic field is not existent. A canceling magnetic field is generated on the optical axis of the ion beam from a canceling magnetic field generator thereby to offset the deflection of the ion beam due to the external magnetic field.

    摘要翻译: 公开了一种聚焦离子束装置和聚焦离子束照射方法。 即使在离子束的光轴上存在磁场并且特定的磁场发生变化的情况下,也可以将离子束聚焦,而不会在相同的离子束点位置分离样品上的同位素,就像磁场 不存在 在来自消除磁场发生器的离子束的光轴上产生消除磁场,从而抵消由于外部磁场引起的离子束的偏转。