Etching method for refractory materials
    21.
    发明授权
    Etching method for refractory materials 失效
    耐火材料蚀刻方法

    公开(公告)号:US5705443A

    公开(公告)日:1998-01-06

    申请号:US453339

    申请日:1995-05-30

    摘要: A plasma-assisted dry etching process for etching of a metal containing material layer on a substrate to remove the metal containing material from the substrate, comprising (i) plasma etching the metal containing material and, (ii) contemporaneously with said plasma etching, contacting the metal containing material with an etch enhancing reactant in a sufficient amount and at a sufficient rate to enhance the etching removal of the metal containing material, in relation to a corresponding plasma etching of the metal containing material layer on the substrate in the absence of the etch enhancing reactant metal material being contacted with the etch enhancing reactant.

    摘要翻译: 一种用于在衬底上蚀刻含金属材料层以从衬底去除含金属材料的等离子体辅助干蚀刻工艺,包括(i)等离子体蚀刻含金属材料,和(ii)与所述等离子体蚀刻同时接触 含有金属的材料具有足够的量和足够的速率的蚀刻增强反应物,以增强含金属材料的蚀刻去除,相对于在不存在金属的情况下在衬底上的含金属材料层的相应等离子体蚀刻 蚀刻增强反应物金属材料与蚀刻增强反应物接触。

    Showerhead-type discharge assembly for delivery of source reagent vapor
to a substrate, and CVD process utilizing same
    22.
    发明授权
    Showerhead-type discharge assembly for delivery of source reagent vapor to a substrate, and CVD process utilizing same 失效
    用于将源反应物蒸气输送到基板的喷头型排出组件,以及利用它们的CVD工艺

    公开(公告)号:US5653806A

    公开(公告)日:1997-08-05

    申请号:US402142

    申请日:1995-03-10

    CPC分类号: C23C16/4557 C23C16/45565

    摘要: An apparatus for dispersingly delivering a vapor-phase source reagent material containing a deposition species, to a substrate for deposition of such species thereon. The apparatus includes a disperser housing having a front wall with an array of discharge openings therein for discharging vapor-phase source reagent material from the housing interior volume onto a wafer or other substrate article mounted in vapor-receiving relationship to the disperser housing front wall. The front wall includes interior heat transfer passages arranged in a manifolded conformation for highly efficient temperature stabilization of the vapor discharged from the housing discharge openings, to produce highly uniform thickness deposited films on the substrate.

    摘要翻译: 一种用于将含有沉积物质的气相源试剂材料分散地输送到用于在其上沉积这样的物质的基底的装置。 该装置包括分散器壳体,该分散器壳体具有其中具有排出开口阵列的前壁,用于将气相源试剂材料从壳体内部体积排放到以与蒸汽接收关系的分散器壳体前壁安装的晶片或其它基底制品上。 前壁包括以歧管构型布置的内部传热通道,用于从壳体排出口排出的蒸汽的高效温度稳定性,以在衬底上产生高度均匀的厚度的沉积膜。

    Photocatalytic devices and systems
    24.
    发明授权
    Photocatalytic devices and systems 有权
    光催化装置和系统

    公开(公告)号:US09480766B2

    公开(公告)日:2016-11-01

    申请号:US14520321

    申请日:2014-10-21

    摘要: Novel photocatalytic devices are disclosed, that utilize ultrathin titania based photocatalytic materials formed on optical elements with high transmissivity, high reflectivity or scattering characteristics, or on high surface area or high porosity open cell materials. The disclosure includes methods to fabricate such devices, including MOCVD and ALD. The disclosure also includes photocatalytic systems that are either standalone or combined with general illumination (lighting) utility, and which may incorporate passive fluid exchange, user configurable photocatalytic optical elements, photocatalytic illumination achieved either by the general illumination light source, dedicated blue or UV light sources, or combinations thereof, and operating methodologies for combined photocatalytic and lighting systems. The disclosure also includes photocatalytic materials incorporated on the surface of packaged LEDs, LED lamps and LED luminaires, with photocatalytic materials incorporated on optically useful luminaire surfaces or on the surface of the remote phosphor. The disclosure also includes ultrathin photocatalytic materials incorporated on surfaces to affect antibacterial and antiviral properties.

    摘要翻译: 公开了新型光催化装置,其利用形成在具有高透射率,高反射率或散射特性的光学元件上形成的超薄二氧化钛基光催化材料,或在高表面积或高孔隙率开孔材料上。 本公开包括制造这样的装置的方法,包括MOCVD和ALD。 本公开还包括独立的或与一般照明(照明)实用程序组合的光催化体系,其可以包括无源流体交换,用户可配置的光催化光学元件,通过一般照明光源,专用蓝光或UV光实现的光催化照明 来源或其组合,以及组合的光催化和照明系统的操作方法。 本公开还包括结合在封装的LED,LED灯和LED灯具的表面上的光催化材料,其中光催化材料结合在光学上有用的照明器表面上或在远程荧光体的表面上。 本公开还包括掺入表面的超薄光催化材料以影响抗菌和抗病毒性质。

    PHOTOCATALYTIC THIN FILM DEVICES
    25.
    发明申请
    PHOTOCATALYTIC THIN FILM DEVICES 审中-公开
    光电薄膜装置

    公开(公告)号:US20150111725A1

    公开(公告)日:2015-04-23

    申请号:US14520328

    申请日:2014-10-21

    IPC分类号: B01J21/06

    摘要: Novel photocatalytic devices are disclosed, that utilize ultrathin titania based photocatalytic materials formed on optical elements with high transmissivity, high reflectivity or scattering characteristics, or on high surface area or high porosity open cell materials. The disclosure includes methods to fabricate such devices, including MOCVD and ALD. The disclosure also includes photocatalytic systems that are either standalone or combined with general illumination (lighting) utility, and which may incorporate passive fluid exchange, user configurable photocatalytic optical elements, photocatalytic illumination achieved either by the general illumination light source, dedicated blue or UV light sources, or combinations thereof, and operating methodologies for combined photocatalytic and lighting systems. The disclosure also includes photocatalytic materials incorporated on the surface of packaged LEDs, LED lamps and LED luminaires, with photocatalytic materials incorporated on optically useful luminaire surfaces or on the surface of the remote phosphor. The disclosure also includes ultrathin photocatalytic materials incorporated on surfaces to affect antibacterial and antiviral properties.

    摘要翻译: 公开了新型光催化装置,其利用形成在具有高透射率,高反射率或散射特性的光学元件上形成的超薄二氧化钛基光催化材料,或在高表面积或高孔隙率开孔材料上。 本公开包括制造这样的装置的方法,包括MOCVD和ALD。 本公开还包括独立的或与一般照明(照明)实用程序组合的光催化体系,其可以包括无源流体交换,用户可配置的光催化光学元件,通过一般照明光源,专用蓝光或UV光实现的光催化照明 来源或其组合,以及组合的光催化和照明系统的操作方法。 本公开还包括结合在封装的LED,LED灯和LED灯具的表面上的光催化材料,其中光催化材料结合在光学上有用的照明器表面上或在远程荧光体的表面上。 本公开还包括掺入表面的超薄光催化材料以影响抗菌和抗病毒性质。