公开(公告)号：US20130228846A1

公开(公告)日：2013-09-05

申请号：US13786213

申请日：2013-03-05

Applicant: STMICROELECTRONICS (ROUSSET) SAS

Inventor： Francesco LA ROSA ,  Yoann GOASDUFF ,  Stephan NIEL ,  Arnaud REGNIER

IPC: H01L29/788 ,  H01L29/66

CPC classification number: H01L29/7889 ,  G11C16/0425 ,  G11C16/0483 ,  G11C16/14 ,  H01L27/11524 ,  H01L29/66825

Abstract: The disclosure relates to an integrated circuit comprising at least two memory cells formed in a semiconductor substrate, and a buried gate common to the selection transistors of the memory cells. The buried gate has a first section of a first depth extending in front of vertical channel regions of the selection transistors, and at least a second section of a second depth greater than the first depth penetrating into a buried source line. The lower side of the buried gate is bordered by a doped region forming a source region of the selection transistors and reaching the buried source line at the level where the second section of the buried gate penetrates into the buried source line, whereby the source region is coupled to the buried source line.

Abstract translation: 本公开涉及一种集成电路，其包括形成在半导体衬底中的至少两个存储单元和与存储单元的选择晶体管共同的掩埋栅极。 掩埋栅极具有在选择晶体管的垂直沟道区域的前面延伸的第一深度的第一部分，以及大于深入埋入源极线的第一深度的至少第二深度的第二部分。 掩埋栅极的下侧由形成选择晶体管的源极区域的掺杂区域界定，并且在埋入栅极的第二部分穿入埋入源极线的水平面到达掩埋源极线，由此源极区域 耦合到埋地源线。