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101 条记录 (耗时 0.031 秒)

    Medium transporting device and recording apparatus incorporating the same
    21.
    发明申请
    Medium transporting device and recording apparatus incorporating the same 有权
    中等输送装置和包含该输送装置的记录装置

    公开(公告)号：US20050083390A1

    公开(公告)日：2005-04-21

    申请号：US10882689

    申请日：2004-07-02

    申请人： Takayuki Ishii

    发明人： Takayuki Ishii

    IPC分类号： B65H5/06 ,  B41J15/04 ,  B65H29/12 ,  B41J13/02

    CPC分类号： B65H29/12 ,  B41J15/04 ,  B65H2402/20 ,  B65H2402/52 ,  B65H2404/1431 ,  B65H2701/11312

    摘要： A follower roller is brought into press contact with a driving roller by a load having a predetermined value, thereby being rotated in accordance with a rotation of the driving roller to transport the medium clamped therebetween in a first direction. The follower roller includes a shaft portion and a roller body provided so as to surround the shaft portion. The follower roller is configured such that a value of a ratio f/F is not greater than 0.03. Here, F is a force transporting the medium in the first direction which is generated by the load, and f is a resistance force generated in a second direction opposite to the first direction by a friction loss of the shaft portion of the follower roller which is generated by the load.

    摘要翻译： 从动辊通过具有预定值的负载与驱动辊压力接触，从而根据驱动辊的旋转而旋转，以沿第一方向传送夹在其间的介质。 从动辊包括轴部和设置成围绕轴部的辊体。 从动辊被配置为使得f / F的值不大于0.03。 这里，F是在由负载产生的第一方向上传送介质的力，f是通过从动辊的轴部的摩擦损失而在与第一方向相反的第二方向上产生的阻力， 由负载产生。

    Method for preparing a sample for a transmission electron microscope
    23.
    发明授权
    Method for preparing a sample for a transmission electron microscope 失效
    制备透射电子显微镜样品的方法

    公开(公告)号：US06403958B1

    公开(公告)日：2002-06-11

    申请号：US09584562

    申请日：2000-05-31

    申请人： Shoji Sudayama ,  Takayuki Ishii

    发明人： Shoji Sudayama ,  Takayuki Ishii

    IPC分类号： H01J3730

    CPC分类号： G01N1/28 ,  H01J2237/3174

    摘要： A sample preparation method is provided where chipping of and damage to a film at an observed location does not occur when cutting with a machining blade is carried out in advance in order to prepare a sample for use with a transmission electronic microscope. The surroundings of an observed location are grooved using a focussed ion beam prior to performing cutting with a machining blade so that the observed location can be isolated from the film composing the sample in a floating island shape. A thin-film for embedding may then be deposited with respect to the grooving, using a focussed ion beam. If necessary, a protective film can also be prepared at the surface of the observed location using a focussed ion beam.

    摘要翻译： 提供了一种样品制备方法，其中，为了制备用于透射电子显微镜的样品，预先进行用加工刀片进行切割时不发生在观察位置处的膜的碎裂和损坏。 在使用加工刀片进行切割之前，观察位置的周围使用聚焦离子束开槽，使得观察到的位置可以从构成浮岛状的样品的膜隔离。 然后可以使用聚焦离子束相对于切槽沉积用于嵌入的薄膜。 如果需要，还可以使用聚焦离子束在观察位置的表面处制备保护膜。

    STEROID COMPOUND
    27.
    发明申请
    STEROID COMPOUND 有权
    甾体化合物

    公开(公告)号：US20120059158A1

    公开(公告)日：2012-03-08

    申请号：US13255820

    申请日：2010-03-08

    申请人： Takayuki Ishii

    发明人： Takayuki Ishii

    IPC分类号： C07J71/00

    CPC分类号： C07H15/24 ,  C07J71/0031

    摘要： A steroid compound of the Formula (1): [wherein R1 represents a group selected from the group consisting of H, CH3, C2H5, C3H7 and CH (CH3)2, R2 represents a group selected from NH2, NHAc and OCOR1, R3 represents a group selected from the group consisting of CH3, COOCH3 and CH2OCOR1.]

    摘要翻译： 式（1）的类固醇化合物：[其中R 1表示选自H，CH 3，C 2 H 5，C 3 H 7和CH（CH 3）2的基团，R 2表示选自NH 2，NHAc和OCOR 1的基团，R 3表示 选自CH3，COOCH3和CH2OCOR1的基团]

    Method of processing a substrate and apparatus processing the same
    28.
    发明授权
    Method of processing a substrate and apparatus processing the same 有权
    处理基板的方法及其处理方法

    公开(公告)号：US07976896B2

    公开(公告)日：2011-07-12

    申请号：US11540629

    申请日：2006-10-02

    申请人： Yoshiteru Fukuda ,  Nobuhiro Ogata ,  Takayuki Ishii ,  Keiji Tanouchi

    发明人： Yoshiteru Fukuda ,  Nobuhiro Ogata ,  Takayuki Ishii ,  Keiji Tanouchi

    IPC分类号： B05D3/12

    CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/168 ,  H01L21/67051

    摘要： A spin chuck rotatably holds a semiconductor wafer, while resist is dropped on a surface of the semiconductor wafer through a resist application nozzle and thus applied thereon, and before the resist applied on the wafer dries, a cleaning liquid is supplied through a bevel cleaning nozzle to a portion of the wafer located at a peripheral portion thereof in a vicinity of a beveled portion to remove the resist adhering to the beveled portion. Thereafter, a film of the resist that is formed on the surface of the wafer is dried.

    摘要翻译： 旋转卡盘可旋转地保持半导体晶片，同时抗蚀剂通过抗蚀剂施加喷嘴落在半导体晶片的表面上并因此施加在其上，并且在施加在晶片上的抗蚀剂干燥之前，通过斜面清洁喷嘴 到位于其周边部分的晶片的位于斜面部分附近的部分以去除附着在斜面部分上的抗蚀剂。 此后，将形成在晶片表面上的抗蚀剂膜干燥。

    COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS
    29.
    发明申请
    COATING TREATMENT METHOD AND COATING TREATMENT APPARATUS 有权
    涂层处理方法和涂层处理装置

    公开(公告)号：US20110033626A1

    公开(公告)日：2011-02-10

    申请号：US12907585

    申请日：2010-10-19

    申请人： Yoshiteru FUKUDA ,  Tomohiro Iseki ,  Takayuki Ishii

    发明人： Yoshiteru FUKUDA ,  Tomohiro Iseki ,  Takayuki Ishii

    IPC分类号： B05D5/00 ,  B05D3/02 ,  B05D3/00

    CPC分类号： H01L21/67184 ,  G03F7/162 ,  G03F7/2028 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67178

    摘要： Resist coating treatments for application of a resist solution to removal of a resist film on a wafer edge portion. A laser irradiation unit applies a laser light in a resist coating unit. At the time of resist coating treatment, the resist solution is discharged onto a central portion of the rotated wafer from a resist solution supply nozzle to form a resist film on the wafer. Thereafter, the laser irradiation unit moves to an outer peripheral portion of the wafer and applies the laser light onto the resist film on the outer peripheral portion to dry the resist film on the outer peripheral portion. The application of laser light is continued, and the solvent supply nozzle moves to a position above the edge portion and supplies solvent to the resist film on the edge portion. The solvent dissolves and removes the resist film on the edge portion.

    摘要翻译： 抗蚀剂涂覆处理用于在晶片边缘部分上施加抗蚀剂溶液以除去抗蚀剂膜。 激光照射单元在抗蚀剂涂布单元中施加激光。 在抗蚀剂涂布处理时，抗蚀剂溶液从抗蚀剂溶液供给喷嘴排出到旋转的晶片的中心部分，以在晶片上形成抗蚀剂膜。 此后，激光照射单元移动到晶片的外周部，并将激光施加到外周部分的抗蚀剂膜上，以干燥外周部分上的抗蚀剂膜。 继续施加激光，溶剂供给喷嘴移动到边缘部分上方的位置，并在边缘部分上的抗蚀剂膜上提供溶剂。 溶剂溶解并除去边缘部分上的抗蚀剂膜。

    Medium transporting device for recording apparatus with suction chambers
    30.
    发明授权
    Medium transporting device for recording apparatus with suction chambers 有权
    具有吸气室的记录装置的介质传送装置

    公开(公告)号：US07530687B2

    公开(公告)日：2009-05-12

    申请号：US10793698

    申请日：2004-03-05

    申请人： Takayuki Ishii ,  Yoshitaka Shimada

    发明人： Takayuki Ishii ,  Yoshitaka Shimada

    IPC分类号： B65H29/32

    CPC分类号： B41J11/0085

    摘要： Of suction holes formed on a medium transporting surface, the areas of the suction holes formed in positions corresponding to ends of a medium which is being transported are set larger than the areas of other suction holes. Hereby, since large air flow is obtained under the both side ends or the leading end of the medium, the medium is transported in a state where the both side ends or the leading end are attracted into the suction holes, and a stain due to contact with a recording head can be prevented.

    摘要翻译： 在介质输送面形成的吸孔中，形成在与被输送的介质的端部对应的位置的吸引孔的面积比其他吸入孔的面积大。 因此，由于在介质的两个侧端或前端处获得大的空气流动，所以介质在两侧端部或前端被吸引到吸入孔的状态下被输送，并且由于接触引起的污点 可以防止记录头。