公开(公告)号：US06501078B1

公开(公告)日：2002-12-31

申请号：US09527031

申请日：2000-03-16

申请人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

发明人： Geoffrey Ryding ,  Theodore H. Smick ,  Marvin Farley ,  Takao Sakase

IPC分类号： H01J3715

CPC分类号： H01J37/15 ,  H01J37/08 ,  H01J49/28 ,  H01J2237/31701

摘要： An ion electrode extraction assembly comprising an ion source 20 and at least one electrode 50 having a gap through which a beam of extracted ions passes in use. An electrode manipulator assembly 55 is provided to move the electrode so as to vary the width of the gap transversely to the ion beam, move the electrode transversely to the ion beam, and move the electrode in the direction of the ion beam. The three degrees of movement being carried out independently of one another.

摘要翻译： 一种离子电极提取组件，其包括离子源20和至少一个具有间隙的电极50，所提取的离子束在使用中通过该间隙通过。 提供电极操纵器组件55以移动电极，以便横向于离子束改变间隙的宽度，将电极横向于离子束移动，并且沿着离子束的方向移动电极。 三个运动方式彼此独立地进行。

公开(公告)号：US06271530B1

公开(公告)日：2001-08-07

申请号：US09293954

申请日：1999-04-19

申请人： Theodore H. Smick ,  Marvin Farley ,  Takao Sakase ,  Geoffrey Ryding

发明人： Theodore H. Smick ,  Marvin Farley ,  Takao Sakase ,  Geoffrey Ryding

IPC分类号： H01J3720

CPC分类号： F16C32/0603 ,  F16C32/0662 ,  F16C32/067 ,  F16C33/748 ,  F16C2300/62 ,  Y10S277/913

摘要： A fluid bearing and seal for an ion implanter is disclosed. The fluid bearing has a stator attached to a base and a moving member provided over the stator so that a fluid bearing can be formed between the opposing surfaces of the stator and the moving member. Either the base or the stator has a locating member extending normal to the bearing surface and the other one of either the base or the stator has a recess shaped to receive the locating member. A fluid seal enables the member to slide in the recess in the normal direction to seal off an enclosed volume between the member and the other one of either the stator or the base. A plurality of fixtures are distributed at points in a plane parallel to the bearing surface to fix the locating member and the other one of either the stator or the base together at these points to form the enclosed volume. The number of the fixtures is the minimum necessary so that the bearing surface of the stator remains undistorted. A fluid controller controls the supply of a fluid to the enclosed volume to maintain the planar bearing surface undistorted under the loading of the moving member.

摘要翻译： 公开了用于离子注入机的流体轴承和密封件。 流体轴承具有附接到基座的定子和设置在定子上方的移动构件，使得可以在定子和移动构件的相对表面之间形成流体轴承。 基座或定子都具有垂直于支承表面延伸的定位构件，底座或定子中的另一个具有成形为容纳定位构件的凹部。 流体密封使得构件能够在凹部中在正常方向上滑动以密封构件和定子或基座中的另一个之间的封闭容积。 多个夹具分布在平行于支承表面的平面上的点处，以将定位构件和定子或底座中的另一个固定在这些点上以形成封闭的容积。 固定装置的数量是必需的最小值，使定子的支承面保持不变。 流体控制器控制向封闭容积供应流体，以在移动构件的载荷下使平面支承表面保持不变。

公开(公告)号：US06248642B1

公开(公告)日：2001-06-19

申请号：US09339633

申请日：1999-06-24

申请人： Robert Dolan ,  Bernhard Cordts ,  Marvin Farley ,  Geoffrey Ryding

发明人： Robert Dolan ,  Bernhard Cordts ,  Marvin Farley ,  Geoffrey Ryding

IPC分类号： H01L2176

CPC分类号： H01J37/3171

摘要： An ion implantation system for producing silicon wafers having relatively low defect densities, e.g., below about 1×106/cm2, includes a fluid port in the ion implantation chamber for introducing a background gas into the chamber during the ion implantation process. The introduced gas, such as water vapor, reduces the defect density of the top silicon layer that is separated from the buried silicon dioxide layer.

摘要翻译： 用于生产具有相对较低缺陷密度（例如低于约1×10 6 / cm 2）的硅晶片的离子注入系统包括离子注入室中的流体端口，用于在离子注入工艺期间将背景气体引入室中。 引入的气体，例如水蒸气，降低了与掩埋二氧化硅层分离的顶部硅层的缺陷密度。

公开(公告)号：US5898179A

公开(公告)日：1999-04-27

申请号：US926650

申请日：1997-09-10

申请人： Theodore H. Smick ,  Geoffrey Ryding ,  Marvin Farley

发明人： Theodore H. Smick ,  Geoffrey Ryding ,  Marvin Farley

IPC分类号： C23C14/48 ,  H01J37/317 ,  H01L21/265 ,  H01L21/677 ,  H01L21/68 ,  H01J37/00

CPC分类号： H01L21/68 ,  H01J37/3171 ,  H01J2237/20228

摘要： An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support. The differentially pumped vacuum seals and integral air bearing support allow for multiple independent motions to be transmitted to the workpiece supported by the workpiece holder. The workpiece holder motions provided are (1) rotation about the X axis, (2) translation back and forth along the Y direction of an X-Y plane on the surface of the workpiece holder, and (3) rotation of the workpiece in the X-Y plane about its Z axis. Concentric seals, oval for the translation motion and circular for the rotational motion, are differentially pumped through common ports to provide successively decreasing pressure and gas flow in order to reduce the gas load into the vacuum vessel to a negligible rate.

公开(公告)号：US07872247B2

公开(公告)日：2011-01-18

申请号：US11907403

申请日：2007-10-11

申请人： Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

发明人： Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

IPC分类号： H01J37/317 ,  H01L21/265

CPC分类号： H01J37/16 ,  H01J37/026 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/31705

摘要： A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.

摘要翻译： 位于邻近被植入的半导体晶片的离子注入机中的离子束引导管具有向外渐缩的中心孔，从而减轻离子束通过引导管的束冲击问题。

公开(公告)号：US20090095916A1

公开(公告)日：2009-04-16

申请号：US11907403

申请日：2007-10-11

申请人： Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

发明人： Geoffrey Ryding ,  Gregory Robert Alcott ,  Lee Spraggon ,  Robert Mitchell ,  Martin Hilkene ,  Matthew Castle ,  Marvin Farley

IPC分类号： H01J3/14

CPC分类号： H01J37/16 ,  H01J37/026 ,  H01J37/3171 ,  H01J2237/004 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/31705

摘要： A guide tube for an ion beam in an ion implanter which is located adjacent a semiconductor wafer being implanted has an outwardly tapering central bore, thereby alleviating problems of beam strike as the ion beam passes through the guide tube.

摘要翻译： 位于邻近被植入的半导体晶片的离子注入机中的离子束引导管具有向外渐缩的中心孔，从而减轻离子束通过引导管的束冲击问题。

公开(公告)号：US06956223B2

公开(公告)日：2005-10-18

申请号：US10119290

申请日：2002-04-10

申请人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

发明人： Theodore H. Smick ,  Frank D. Roberts ,  Marvin Farley ,  Geoffrey Ryding ,  Takao Sakase ,  Adrian Murrell ,  Peter Edwards ,  Bernard Harrison

IPC分类号： H01J37/04 ,  H01J37/18 ,  H01J37/317 ,  H01L21/265 ,  H01L21/68 ,  B05C5/00

CPC分类号： H01J37/20 ,  H01J37/18 ,  H01J37/3171 ,  H01J2237/20 ,  H01J2237/2006 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20228 ,  H01J2237/20278 ,  H01L21/682 ,  H01L21/6835

摘要： Semiconductor processing apparatus is disclosed which provides for movement of a scanning arm 60 of a substrate or wafer holder 180, in at least two generally orthogonal directions (so-called X-Y scanning). Scanning in a first direction is longitudinally through an aperture 55 in a vacuum chamber wall. The arm 60 is reciprocated by one or more linear motors 90A, 90B. The arm 60 is supported relative to a slide 100 using gimballed air bearings so as to provide cantilever support for the arm relative to the slide 100. A compliant feedthrough 130 into the vacuum chamber for the arm 60 then acts as a vacuum seal and guide but does not itself need to provide bearing support. A Faraday 450 is attached to the arm 60 adjacent the substrate holder 180 to allow beam profiling to be carried out both prior to and during implant. The Faraday 450 can instead or additionally be mounted adjacent the rear of the substrate holder or at 90° to it to allow beam profiling to be carried out prior to implant, with the substrate support reversed or horizontal and out of the beam line.

摘要翻译： 公开了半导体处理装置，其提供基板或晶片保持器180的扫描臂60在至少两个大致正交的方向（所谓的X-Y扫描）上的移动。 沿着第一方向进行的扫描纵向地穿过真空室壁中的孔口55。 臂60由一个或多个线性电动机90A，90B往复运动。臂60相对于滑块100被支撑，使用支撑的空气轴承，以便相对于滑块100为臂提供悬臂支撑。 进入用于臂60的真空室中的柔性馈通件130然后用作真空密封和引导件，但本身不需要提供轴承支撑件。 法拉第450附接到靠近基板保持器180的臂60，以允许在植入之前和期间执行光束轮廓。 法拉第450可以替代地或附加地安装在靠近衬底保持器的后部或与其相邻的90°处，以允许在植入之前执行光束轮廓，其中衬底支撑件反向或水平并且离开光束线。

公开(公告)号：US06908836B2

公开(公告)日：2005-06-21

申请号：US10251780

申请日：2002-09-23

申请人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

发明人： Adrian Murrell ,  Bernard Harrison ,  Peter Edwards ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC分类号： G01N23/00 ,  H01J37/317 ,  H01L21/00 ,  H01L21/26 ,  H01L21/42

CPC分类号： H01J37/3171 ,  H01J2237/20228 ,  H01J2237/24507 ,  H01J2237/30488 ,  H01J2237/31703

摘要： An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

摘要翻译： 注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。 在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。 扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

公开(公告)号：US06555832B1

公开(公告)日：2003-04-29

申请号：US09686092

申请日：2000-10-12

申请人： Geoffrey Ryding ,  Theodore H. Smick ,  John Ruffell ,  Marvin Farley ,  Peter Rose

发明人： Geoffrey Ryding ,  Theodore H. Smick ,  John Ruffell ,  Marvin Farley ,  Peter Rose

IPC分类号： H01J37317

CPC分类号： H01J37/1471 ,  H01J37/304 ,  H01J37/3171 ,  H01J2237/1501

摘要： A back scattered ion receiver is mounted on the process chamber of an ion implanter to receive beam ions back scattered from a wafer mounted on the wafer holder in the chamber. Minima in the intensity of back scattered ions as the wafer on the holder is moved relative to the beam direction, can be used to obtain an accurate calibration of the true beam direction. Beam direction error can then be compensated for when operating holder tilt and twist mechanisms so as to bring a process wafer accurately into the required orientation relative to the true beam. If the crystallographic alignment and orientation of process wafers has been precharacterised, this data can be used to control the wafer holder to align process wafers crystallographically to the process beam.

摘要翻译： 背散射离子接收器安装在离子注入机的处理室中，以接收从安装在腔室中的晶片保持器上的晶片反向散射的束离子。 在保持器上的晶片相对于光束方向移动时，背散射离子的强度的最小值可用于获得真正的光束方向的精确校准。 然后可以在操作支架倾斜和扭转机构时补偿光束方向误差，以便使处理晶片相对于真实光束精确地进入所需的方向。 如果处理晶片的晶体取向和取向已经被预先表征，则该数据可用于控制晶片保持器以将工艺晶片在晶体学上与工艺光束对准。

公开(公告)号：US06437351B1

公开(公告)日：2002-08-20

申请号：US09684993

申请日：2000-10-10

申请人： Theodore H. Smick ,  Geoffrey Ryding ,  Marvin Farley

发明人： Theodore H. Smick ,  Geoffrey Ryding ,  Marvin Farley

IPC分类号： H01J3700

CPC分类号： H01L21/68 ,  H01J37/3171 ,  H01J2237/20228

摘要： An apparatus used to control a workpiece inside a vacuum chamber. The workpiece is supported on a workpiece holder in the vacuum chamber. The workpiece is isolated from the atmosphere outside of the vacuum chamber by differentially pumped vacuum seals and an integral air bearing support. The differentially pumped vacuum seals and integral air bearing support allow for multiple independent motions to be transmitted to the workpiece supported by the workpiece holder. The workpiece holder motions provided are (1) rotation about the X axis, (2) translation back and forth along the Y direction of an X-Y plane on the surface of the workpiece holder, and (3) rotation of the workpiece in the X-Y plane about its Z axis. Concentric seals, oval for the translation motion and circular for the rotational motion, are differentially pumped through common ports to provide successively decreasing pressure and gas flow in order to reduce the gas load into the vacuum vessel to a negligible rate.

摘要翻译： 用于控制真空室内的工件的装置。 工件被支撑在真空室中的工件支架上。 工件通过差分抽真空密封和一体式空气轴承支架与真空室外的大气隔离。 差分抽真空密封件和一体式空气轴承支撑件允许多个独立的运动传递到由工件支架支撑的工件。 所提供的工件保持器动作为（1）围绕X轴旋转，（2）沿着工件保持器表面上的XY平面的Y方向前后平移，以及（3）工件在XY平面中的旋转 关于它的Z轴。 用于平移运动的椭圆形和用于旋转运动的圆形的同心密封件通过公共端口差异泵送，以提供连续减小的压力和气体流量，以便将进入真空容器的气体负载降至可忽略的速率。