摘要:
A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.
摘要:
A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.
摘要:
There is provided a document information transmitting apparatus and a document information receiving apparatus in a communication system having the document information transmitting apparatus for transmitting document information and the document information receiving apparatus for receiving and displaying document information, said document information transmitting apparatus and said document information receiving apparatus being connected to each other through a communication line, and a document information processing apparatus for processing document information regardless of the fact that the document information processing apparatus constitutes communication systems. At the transmitter end, a simplification possible character string is detected from among document information, and a control statement is inserted into the document information in association with the detected simplification possible character string. At the receiver end, simplified statements are generated and displayed referring to the control statement.