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    Method of manufacturing monolithic inkjet printhead
    21.
    发明授权
    Method of manufacturing monolithic inkjet printhead 失效
    制造单片喷墨打印头的方法

    公开(公告)号：US07005244B2

    公开(公告)日：2006-02-28

    申请号：US10917343

    申请日：2004-08-13

    申请人： Byung-ha Park ,  Myong-jong Kwon ,  Young-ung Ha ,  Sung-joon Park

    发明人： Byung-ha Park ,  Myong-jong Kwon ,  Young-ung Ha ,  Sung-joon Park

    IPC分类号： B41J2/16

    CPC分类号： B41J2/1626 ,  B41J2/1603 ,  B41J2/1631

    摘要： A method of manufacturing a monolithic inkjet printhead. The method may include forming on a substrate a heater for heating ink and an electrode for supplying current to the heater, forming a passage forming layer that surrounds an ink passage by applying negative-type photoresist to the substrate and patterning the same, forming a sacrificial layer having a planarized top surface in a space surrounded by the passage forming layer by repeatedly applying a positive-type photoresist to the substrate having the passage forming layer and patterning the same by photolithography at least twice, forming a nozzle layer having a nozzle by applying a negative-type photoresist to the passage forming layer and the sacrificial layer and patterning the same, etching the substrate from the bottom surface thereof to be perforated and forming an ink supply hole, and removing the sacrificial layer. Since the top surface of the sacrificial layer is planarized, the shape and dimension of the ink passage can be easily controlled, thereby improving uniformity of the ink passage.

    摘要翻译： 一种制造单片喷墨打印头的方法。 该方法可以包括在基板上形成用于加热油墨的加热器和用于向加热器供应电流的电极，通过向基板施加负型光致抗蚀剂形成通道形成层，以形成墨水通道，从而形成牺牲物 层，其在由通道形成层包围的空间中具有平坦化的顶表面，通过重复地向具有通道形成层的基板施加正型光致抗蚀剂，并通过光刻将其图案化至少两次，通过施加形成具有喷嘴的喷嘴层 向通道形成层和牺牲层施加负型光致抗蚀剂并对其进行图案化，从其底表面蚀刻衬底以进行穿孔并形成供墨孔，以及去除牺牲层。 由于牺牲层的顶表面被平坦化，所以可以容易地控制油墨通道的形状和尺寸，从而提高油墨通道的均匀性。

    Method of manufacturing monolithic inkjet printhead
    22.
    发明申请
    Method of manufacturing monolithic inkjet printhead 有权
    制造单片喷墨打印头的方法

    公开(公告)号：US20050155949A1

    公开(公告)日：2005-07-21

    申请号：US11028665

    申请日：2005-01-05

    申请人： Byung-ha Park ,  Myong-jong Kwon ,  Young-ung Ha ,  Sung-joon Park

    发明人： Byung-ha Park ,  Myong-jong Kwon ,  Young-ung Ha ,  Sung-joon Park

    IPC分类号： B41J2/05 ,  B41J2/16 ,  G01D15/00 ,  G11B5/127

    CPC分类号： B41J2/1629 ,  B41J2/1603 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2/1642 ,  B41J2/1645 ,  B41J2/1646

    摘要： A method of manufacturing a monolithic inkjet printhead wherein the uniformity of the ink flow path is maintained by ensuring that the flow path forming layer and the nozzle layer are completely adhered to each other. The method includes forming a heater and electrode on a substrate, coating a negative photoresist on the substrate, and patterning the photoresist using a photolithography process to form an flow path forming layer that defines an ink flow path. The method further comprises steps for then forming a sacrificial layer so as to cover the flow path forming layer and then flattening upper surfaces of the flow path forming layer and the sacrificial layer using a chemical mechanical polishing (CMP) process such that when a nozzle layer is then formed, the flow path forming layer and the nozzle layer are completely adhered to each other.

    摘要翻译： 一种制造单片喷墨打印头的方法，其中通过确保流路形成层和喷嘴层彼此完全粘合来保持油墨流动路径的均匀性。 该方法包括在衬底上形成加热器和电极，在衬底上涂覆负性光致抗蚀剂，并使用光刻工艺对光致抗蚀剂进行构图，以形成限定墨水流路的流路形成层。 该方法还包括随后形成牺牲层以便覆盖流路形成层，然后使用化学机械抛光（CMP）工艺使流路形成层和牺牲层的上表面平坦化的步骤，使得当喷嘴层 然后形成流路形成层和喷嘴层彼此完全粘合。

    Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same
    23.
    发明申请
    Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same 失效
    光固化树脂组合物，其图案化方法和喷墨头及其制造方法

    公开(公告)号：US20050255409A1

    公开(公告)日：2005-11-17

    申请号：US11004939

    申请日：2004-12-07

    申请人： Byung--ha Park ,  Young-ung Ha ,  Sung-joon Park ,  Myong-jong Kwon

    发明人： Byung--ha Park ,  Young-ung Ha ,  Sung-joon Park ,  Myong-jong Kwon

    IPC分类号： C08L63/00 ,  B41J2/16 ,  G03C1/492 ,  G03F7/004 ,  G03F7/038

    CPC分类号： G03F7/038 ,  B41J2/1603 ,  B41J2/1631 ,  G03F7/0043 ,  G03F7/0048

    摘要： A photo-curable resin composition, a method of patterning the same, an ink jet head, and a method of fabricating the same. The photo-curable resin composition includes an epoxy compound, a photo-catalyst provided as a photo-initiator, and a non-photo reactive solvent. The photo-catalyst may be a semiconductor material to generate electron-hall pairs using light energy. The semiconductor material is one selected from a group consisting of TiO2, CdS, Si, SrTiO3, WO, ZnO, SnO2, CdSe and CdTe, CdSe and CdTe. The epoxy compound may include a di-functional epoxy compound and a multi-functional epoxy compound. The non-photo reactive solvent may be one or a mixture selected from a group consisting of gamma-butyrolactone (GBL), cyclopentanone, C1-6 acetate, tetrahydrofurane (THF), and xylene. The photo-curable resin composition is patterned to form a fluid channel structure of the ink jet head.

    摘要翻译： 光固化型树脂组合物，其图案化方法，喷墨头及其制造方法。 光固化树脂组合物包括环氧化合物，作为光引发剂提供的光催化剂和非光反应性溶剂。 光催化剂可以是使用光能产生电子 - 大厅对的半导体材料。 半导体材料选自TiO 2，CdS，Si，SrTiO 3，WO，ZnO，SnO 2，CdSe， 和CdTe，CdSe和CdTe。 环氧化合物可以包括二官能环氧化合物和多官能环氧化合物。 非光反应性溶剂可以是选自γ-丁内酯（GBL），环戊酮，C 1-6乙酸酯，四氢呋喃（THF）和二甲苯中的一种或其混合物。 将光固化树脂组合物图案化以形成喷墨头的流体通道结构。

    Method of manufacturing monolithic inkjet printhead
    24.
    发明申请
    Method of manufacturing monolithic inkjet printhead 失效
    制造单片喷墨打印头的方法

    公开(公告)号：US20050067376A1

    公开(公告)日：2005-03-31

    申请号：US10917343

    申请日：2004-08-13

    申请人： Byung-ha Park ,  Myong-jong Kwon ,  Young-ung Ha ,  Sung-joon Park

    发明人： Byung-ha Park ,  Myong-jong Kwon ,  Young-ung Ha ,  Sung-joon Park

    IPC分类号： B41J2/34 ,  B41J2/135 ,  B41J2/16 ,  G03F7/20 ,  G11B5/127

    CPC分类号： B41J2/1626 ,  B41J2/1603 ,  B41J2/1631

    摘要： A method of manufacturing a monolithic inkjet printhead. The method may include forming on a substrate a heater for heating ink and an electrode for supplying current to the heater, forming a passage forming layer that surrounds an ink passage by applying negative-type photoresist to the substrate and patterning the same, forming a sacrificial layer having a planarized top surface in a space surrounded by the passage forming layer by repeatedly applying a positive-type photoresist to the substrate having the passage forming layer and patterning the same by photolithography at least twice, forming a nozzle layer having a nozzle by applying a negative-type photoresist to the passage forming layer and the sacrificial layer and patterning the same, etching the substrate from the bottom surface thereof to be perforated and forming an ink supply hole, and removing the sacrificial layer. Since the top surface of the sacrificial layer is planarized, the shape and dimension of the ink passage can be easily controlled, thereby improving uniformity of the ink passage.

    摘要翻译： 一种制造单片喷墨打印头的方法。 该方法可以包括在基板上形成用于加热油墨的加热器和用于向加热器供应电流的电极，通过向基板施加负型光致抗蚀剂形成通道形成层，以形成墨水通道，从而形成牺牲物 层，其在由通道形成层包围的空间中具有平坦化的顶表面，通过重复地向具有通道形成层的基板施加正型光致抗蚀剂，并通过光刻将其图案化至少两次，通过施加形成具有喷嘴的喷嘴层 向通道形成层和牺牲层施加负型光致抗蚀剂并对其进行图案化，从其底表面蚀刻衬底以进行穿孔并形成供墨孔，以及去除牺牲层。 由于牺牲层的顶表面被平坦化，所以可以容易地控制油墨通道的形状和尺寸，从而提高油墨通道的均匀性。

    Inkjet printhead and method of manufacturing the same
    25.
    发明授权
    Inkjet printhead and method of manufacturing the same 失效
    喷墨打印头及其制造方法

    公开(公告)号：US08388113B2

    公开(公告)日：2013-03-05

    申请号：US12036333

    申请日：2008-02-25

    申请人： Sung-joon Park ,  Myong-jong Kwon ,  Kyong-il Kim

    发明人： Sung-joon Park ,  Myong-jong Kwon ,  Kyong-il Kim

    IPC分类号： B41J2/05

    CPC分类号： B41J2/1603 ,  B41J2/1404 ,  B41J2/1626 ,  B41J2/1632 ,  B41J2/1639 ,  B41J2202/03

    摘要： Provided are an inkjet printhead and a method of manufacturing the same. The inkjet printhead includes: a substrate, on which a plurality of heaters for heating ink to generated ink bubbles are formed; a chamber layer including a plurality of ink chambers formed on the substrate; and a nozzle layer including a plurality of nozzles formed on the chamber layer. In addition, at least one of the chamber layer and the nozzle layer is formed of an imide silicone resin.

    摘要翻译： 提供一种喷墨打印头及其制造方法。 喷墨打印头包括：基板，其上形成有用于加热油墨以产生的油墨气泡的多个加热器; 包括形成在所述基板上的多个墨室的室层; 以及喷嘴层，其包括形成在所述室层上的多个喷嘴。 此外，室层和喷嘴层中的至少一个由酰亚胺硅树脂形成。

    PHOTO-CURABLE RESIN COMPOSITION, METHOD OF PATTERNING THE SAME, AND INK JET HEAD AND METHOD OF FABRICATING THE SAME
    27.
    发明申请
    PHOTO-CURABLE RESIN COMPOSITION, METHOD OF PATTERNING THE SAME, AND INK JET HEAD AND METHOD OF FABRICATING THE SAME 审中-公开
    光固化树脂组合物，其印刷方法和喷墨头及其制造方法

    公开(公告)号：US20080063978A1

    公开(公告)日：2008-03-13

    申请号：US11850938

    申请日：2007-09-06

    申请人： Byung-Ha Park ,  Young-ung Ha ,  Sung-joon Park ,  Myong-jong Kwon

    发明人： Byung-Ha Park ,  Young-ung Ha ,  Sung-joon Park ,  Myong-jong Kwon

    IPC分类号： G03C1/04 ,  G03C5/00

    CPC分类号： G03F7/038 ,  B41J2/1603 ,  B41J2/1631 ,  G03F7/0043 ,  G03F7/0048

    摘要： A photo-curable resin composition, a method of patterning the same, an ink jet head, and a method of fabricating the same. The photo-curable resin composition includes an epoxy compound, a photo-catalyst provided as a photo-initiator, and a non-photo reactive solvent. The photo-catalyst may be a semiconductor material to generate electron-hall pairs using light energy. The semiconductor material is one selected from a group consisting of TiO2, CdS, Si, SrTiO3, WO, ZnO, SnO2, CdSe and CdTe, CdSe and CdTe. The epoxy compound may include a di-functional epoxy compound and a multi-functional epoxy compound. The non-photo reactive solvent may be one or a mixture selected from a group consisting of gamma-butyrolactone (GBL), cyclopentanone, C1-6 acetate, tetrahydrofurane (THF), and xylene. The photo-curable resin composition is patterned to form a fluid channel structure of the ink jet head.

    摘要翻译： 光固化树脂组合物，其图案化方法，喷墨头及其制造方法。 光固化树脂组合物包括环氧化合物，作为光引发剂提供的光催化剂和非光反应性溶剂。 光催化剂可以是使用光能产生电子 - 大厅对的半导体材料。 半导体材料选自TiO 2，CdS，Si，SrTiO 3，WO，ZnO，SnO 2，CdSe， 和CdTe，CdSe和CdTe。 环氧化合物可以包括二官能环氧化合物和多官能环氧化合物。 非光反应性溶剂可以是选自γ-丁内酯（GBL），环戊酮，C 1-6乙酸酯，四氢呋喃（THF）和二甲苯中的一种或其混合物。 将光固化树脂组合物图案化以形成喷墨头的流体通道结构。

    Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same
    28.
    发明授权
    Photo-curable resin composition, method of patterning the same, and ink jet head and method of fabricating the same 失效
    光固化树脂组合物，其图案化方法和喷墨头及其制造方法

    公开(公告)号：US07278709B2

    公开(公告)日：2007-10-09

    申请号：US11004939

    申请日：2004-12-07

    申请人： Byung-ha Park ,  Young-ung Ha ,  Sung-joon Park ,  Myong-jong Kwon

    发明人： Byung-ha Park ,  Young-ung Ha ,  Sung-joon Park ,  Myong-jong Kwon

    IPC分类号： B41J2/04 ,  B41J2/05

    CPC分类号： G03F7/038 ,  B41J2/1603 ,  B41J2/1631 ,  G03F7/0043 ,  G03F7/0048

    摘要： A photo-curable resin composition, a method of patterning the same, an ink jet head, and a method of fabricating the same. The photo-curable resin composition includes an epoxy compound, a photo-catalyst provided as a photo-initiator, and a non-photo reactive solvent. The photo-catalyst may be a semiconductor material to generate electron-hall pairs using light energy. The semiconductor material is one selected from a group consisting of TiO2, CdS, Si, SrTiO3, WO, ZnO, SnO2, CdSe and CdTe, CdSe and CdTe. The epoxy compound may include a di-functional epoxy compound and a multi-functional epoxy compound. The non-photo reactive solvent may be one or a mixture selected from a group consisting of gamma-butyrolactone (GBL), cyclopentanone, C1-6 acetate, tetrahydrofurane (THF), and xylene. The photo-curable resin composition is patterned to form a fluid channel structure of the ink jet head.

    摘要翻译： 光固化树脂组合物，其图案化方法，喷墨头及其制造方法。 光固化树脂组合物包括环氧化合物，作为光引发剂提供的光催化剂和非光反应性溶剂。 光催化剂可以是使用光能产生电子 - 大厅对的半导体材料。 半导体材料选自TiO 2，CdS，Si，SrTiO 3，WO，ZnO，SnO 2，CdSe， 和CdTe，CdSe和CdTe。 环氧化合物可以包括二官能环氧化合物和多官能环氧化合物。 非光反应性溶剂可以是选自γ-丁内酯（GBL），环戊酮，C 1-6乙酸酯，四氢呋喃（THF）和二甲苯中的一种或其混合物。 将光固化树脂组合物图案化以形成喷墨头的流体通道结构。