Compounds and methods for nanoscale patterning and structure formation
    21.
    发明申请
    Compounds and methods for nanoscale patterning and structure formation 失效
    用于纳米尺度图案化和结构形成的化合物和方法

    公开(公告)号:US20060273306A1

    公开(公告)日:2006-12-07

    申请号:US11244446

    申请日:2005-10-04

    Abstract: Organosulfur compounds suitable as protected thiol-containing reactive organic layer precursors, for example 3,5-dimethoxy-α,α-dimethylbenzyloxycarbonyl-3-mercaptopropyltriethoxysilane, are useful in methods of nanometer scale (nanoscale) patterning and fabrication of nanoscale structures on patterned surfaces. The compounds and methods enable the patternwise placement of nanoparticles, with nanometer resolution to form, for example, electrically conductive nanostructures.

    Abstract translation: 适合作为被保护的含硫醇的反应性有机层前体的有机硫化合物,例如3,5-二甲氧基-α,α-二甲基苄氧基羰基-3-巯基丙基三乙氧基硅烷,可用于在图案化表面上纳米级(纳米尺度)图案化和纳米尺度结构的制造方法 。 这些化合物和方法能够以纳米分辨率形成例如导电纳米结构的纳米颗粒的图案化放置。

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