公开(公告)号：US10092257B2

公开(公告)日：2018-10-09

申请号：US14924495

申请日：2015-10-27

申请人： Ge Wang ,  Fenglin Liu ,  Wenxiang Cong ,  Qingsong Yang

发明人： Ge Wang ,  Fenglin Liu ,  Wenxiang Cong ,  Qingsong Yang

IPC分类号： A61B6/00 ,  A61B6/03

摘要： Dynamic bowties, imaging systems including a bowtie, and methods of imaging including such bowties or systems are provided. A bowtie can be a three-dimensional (3-D) dynamic bowtie and can include a highly-attenuating bowtie (HB) and a weakly-attenuating bowtie (WB). The HB can be filled with a liquid, and the WB can be immersed in the liquid of the HB.

公开(公告)号：US09730657B2

公开(公告)日：2017-08-15

申请号：US14573967

申请日：2014-12-17

申请人： Ge Wang ,  Fenglin Liu ,  Wenxiang Cong ,  Hengyong Yu

发明人： Ge Wang ,  Fenglin Liu ,  Wenxiang Cong ,  Hengyong Yu

IPC分类号： A61B6/03 ,  A61B6/00 ,  A61B6/02 ,  G06T11/00

CPC分类号： A61B6/4007 ,  A61B6/025 ,  A61B6/027 ,  A61B6/032 ,  A61B6/035 ,  A61B6/4014 ,  A61B6/4452 ,  A61B6/5205 ,  G06T11/006 ,  G06T2211/432 ,  G06T2211/436

摘要： Imaging methods and imaging systems are provided. Methods and systems of the subject invention can include linearly translating a source and a detector. The source and the detector can be moved in opposite or approximately opposite directions. Acquired data can be used to reconstruct a tomographic image by using, for example, a compressive sensing technique.

公开(公告)号：US08801943B2

公开(公告)日：2014-08-12

申请号：US13193520

申请日：2011-07-28

申请人： Shiwen Huang ,  Fenglin Liu ,  Qiping Zhong ,  Kyusik Shin ,  Yingjian Chen

发明人： Shiwen Huang ,  Fenglin Liu ,  Qiping Zhong ,  Kyusik Shin ,  Yingjian Chen

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/3163

摘要： The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.

摘要翻译： 本公开描述了通过实施三层（三层）硬掩模制造全封装屏蔽镶嵌写头的方法。 根据本发明的实施例，在形成写入头期间，各种硬掩模层用于不同的目的。 本发明的环绕式屏蔽头表现出改进的物理特性，进一步导致改善的性能特征。 根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。 例如，可以使用较小尺寸的光刻技术。 此外，在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下，对某些CMP工艺的依赖是不必要的。

公开(公告)号：US08470186B2

公开(公告)日：2013-06-25

申请号：US12954458

申请日：2010-11-24

申请人： Yingjian Chen ,  Shiwen Huang ,  Fenglin Liu ,  Kyusik Shin

发明人： Yingjian Chen ,  Shiwen Huang ,  Fenglin Liu ,  Kyusik Shin

IPC分类号： B44C1/22

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/23 ,  G11B5/315 ,  G11B5/3163

摘要： A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.

摘要翻译： 垂直写头，其具有围绕屏蔽的保护层和保形侧间隙。 在制造写入头时，前缘屏蔽可以被化学机械抛光到基本上均匀的化学机械抛光停止层的水平。 由于前缘屏蔽和化学机械抛光停止层用作沟槽RIE的RIE停止，所以可以用LTE / LES形成完全共形的侧屏蔽。

公开(公告)号：US08400733B2

公开(公告)日：2013-03-19

申请号：US12954422

申请日：2010-11-24

申请人： Kyusik Shin ,  Qiping Zhong ,  Honglin Zhu ,  Yingjian Chen ,  Liubo Hong ,  Fenglin Liu

发明人： Kyusik Shin ,  Qiping Zhong ,  Honglin Zhu ,  Yingjian Chen ,  Liubo Hong ,  Fenglin Liu

IPC分类号： G11B5/147

CPC分类号： G11B5/3116 ,  G11B5/1278 ,  G11B5/3163

摘要： Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.

摘要翻译： 提供了具有锥形前缘的前缘屏蔽和锥形磁极的制造方法。 前缘屏蔽可以通过利用CMP停止层形成。 CMP停止层可以有助于防止磁性材料的过度抛光。 对于具有锥形前缘的锥形磁极，磁性材料沉积在平坦化表面上，形成图案化的抗蚀剂材料，并且暴露的磁性材料被蚀刻以形成磁性材料的至少一个锥形表面。

公开(公告)号：US07979978B2

公开(公告)日：2011-07-19

申请号：US11728910

申请日：2007-03-27

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Chen-Jung Chien

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Chen-Jung Chien

IPC分类号： G11B5/187

CPC分类号： G11B5/1278 ,  G11B5/112 ,  G11B5/3146 ,  G11B5/315 ,  G11B5/3163 ,  G11B5/3169 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T428/1193

摘要： A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.

摘要翻译： 描述了用于形成PMR头的写入极的过程。 该写入极相对于其侧屏对称地定位，这不是通过光学对准而是通过用预定和精确厚度的均匀的非磁性材料层涂覆极，然后形成屏蔽层 围绕这一点。

公开(公告)号：US20110146060A1

公开(公告)日：2011-06-23

申请号：US12932552

申请日：2011-02-28

申请人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

发明人： Cherng-Chyi Han ,  Min Li ,  Fenglin Liu ,  Jiun-Ting Lee

IPC分类号： G11B5/127

CPC分类号： G11B5/3163 ,  G11B5/11 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  G11B5/315 ,  Y10T29/49032 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

摘要： A perpendicular magnetic recording (PMR) head is fabricated with a pole tip shielded laterally by a separated pair of side shields and shielded from above by an upper shield. The side shields are formed by a RIE process using specific gases applied to a shield layer through a masking layer formed of material that has a slower etch rate than the shield material. A masking layer of Ta, Ru/Ta, TaN or Ti, formed on a shield layer of NiFe and using RIE gases of CH3OH, CO or NH3 or their combinations, produces the desired result. The differential in etch rates maintains the opening dimension within the mask and allows the formation of a wedge-shaped trench within the shield layer that separates the layer into two shields. The pole tip is then plated within the trench and, being aligned by the trench, acquires the wedge-shaped cross-section of the trench. An upper shield is then formed above the side shields and pole.

摘要翻译： 垂直磁记录（PMR）头被制造成具有通过分离的一对侧屏蔽横向屏蔽的极尖并且被上屏蔽从上面屏蔽。 侧面屏蔽是通过RIE工艺形成的，其使用通过掩模层施加到屏蔽层上的特定气体，该屏蔽层由具有比屏蔽材料更慢的蚀刻速率的材料形成。 形成在NiFe的屏蔽层上并使用CH 3 OH，CO或NH 3的RIE气体或其组合的Ta，Ru / Ta，TaN或Ti的掩蔽层产生期望的结果。 蚀刻速率的差异保持了掩模内的开口尺寸，并且允许在屏蔽层内形成将该层分成两个屏蔽层的楔形沟槽。 然后将磁极尖端电镀在沟槽内，并且通过沟槽对准，获得沟槽的楔形横截面。 然后在侧屏和极上方形成上屏蔽。

公开(公告)号：US20060012915A1

公开(公告)日：2006-01-19

申请号：US11229160

申请日：2005-09-16

申请人： Cherng-Chyi Han ,  Mao-Min Chen ,  Po Wang ,  Fenglin Liu

发明人： Cherng-Chyi Han ,  Mao-Min Chen ,  Po Wang ,  Fenglin Liu

IPC分类号： G11B5/147

CPC分类号： G11B5/3163 ,  G11B5/3116 ,  G11B5/3967 ,  Y10T29/49032

摘要： A trimmed upper pole piece for a magnetic write head, said pole piece having a tapered profile that is widest at its trailing edge. Such a pole piece is capable of writing narrow tracks with sharply and well defined patterns and minimal overwriting of adjacent tracks. The necessary taper is produced by using NiCr, NiFeCr, Rh or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant. As a result, the write gap does not protrude to mask the effects of the ion-beam etch used to form the taper.

摘要翻译： 用于磁写头的经修剪的上极片，所述极片具有在其后缘处最宽的锥形轮廓。 这样的极片能够以清晰明确的图案和相邻轨迹的最小重写来写入窄轨道。 通过使用NiCr，NiFeCr，Rh或Ru作为写入间隙填充材料产生必要的锥度，其具有基本上等于形成极片的其它层的蚀刻速率的蚀刻速率并且具有高耐腐蚀性。 结果，写入间隙不会突出以掩盖用于形成锥形的离子束蚀刻的效果。