Membrane structures for micro-devices, micro-devices including same and methods for making same

    公开(公告)号:US07060522B2

    公开(公告)日:2006-06-13

    申请号:US09986107

    申请日:2001-11-07

    IPC分类号: H01L21/00

    摘要: A structure for a micro-device is fabricated by forming: a first layer of sacrificial material, a layer of structural material over the first sacrificial material layer, a second layer of sacrificial material over the structural material layer and a protective layer over the second sacrificial material layer. A release etch is used to remove the first and second sacrificial material layers at approximately the same rate. A structural feature may also be fabricated by forming: a first layer of a first material; a layer of structural material over the first layer of the first material; at least one cut in the structural material layer; and, a first layer of a sacrificial material, different from the first material, over the structural material layer such that an interface is created between the first layer of the sacrificial material and the first layer of the first material at the at least one cut.

    MEMS optical latching switch
    32.
    发明授权
    MEMS optical latching switch 失效
    MEMS光锁定开关

    公开(公告)号:US06947624B2

    公开(公告)日:2005-09-20

    申请号:US10712203

    申请日:2003-11-12

    摘要: An optical micro-electro-mechanical system (MEMS) switch is disclosed. In a preferred embodiment the optical MEMS switch is used as an M×N optical signal switching system. The optical MEMS switch comprises a plurality of optical waveguides formed on a cantilever beam platform for switching optical states wherein the state of the optical switch is changed by a system of drive and latch actuators. The optical MEMS device utilizes a latching mechanism in association with a thermal drive actuator for aligning the cantilever beam platform. In use the optical MEMS device may be integrated with other optical components to form planar light circuits (PLCs). When switches and PLCs are integrated together on a silicon chip, compact higher functionality devices, such as Reconfigurable Optical Add-Drop Multiplexers (ROADMs), may be fabricated.

    摘要翻译: 公开了一种光学微机电系统(MEMS)开关。 在优选实施例中,光学MEMS开关用作MxN光信号交换系统。 光学MEMS开关包括形成在悬臂梁平台上的多个光波导,用于切换光学状态,其中光开关的状态由驱动和闩锁致动器的系统改变。 光学MEMS器件利用与用于对准悬臂梁平台的热驱动致动器相关联的闩锁机构。 在使用中,光学MEMS器件可以与其他光学部件集成以形成平面光电路(PLC)。 当开关和PLC集成在硅芯片上时,可以制造紧凑的更高功能的器件,例如可重配置光插座多路复用器(ROADM)。

    Method of forming protrusions on single crystal silicon structures built on silicon-on-insulator wafers
    34.
    发明授权
    Method of forming protrusions on single crystal silicon structures built on silicon-on-insulator wafers 失效
    在绝缘体上硅晶片上形成的单晶硅结构上形成突起的方法

    公开(公告)号:US06413793B1

    公开(公告)日:2002-07-02

    申请号:US09858469

    申请日:2001-05-17

    IPC分类号: H01L2100

    CPC分类号: B81B3/001

    摘要: A semiconductor structure includes a substrate, a sacrificial layer formed on or over the substrate, and a structural layer formed on or over the sacrificial layer. At least one opening is formed in the structural layer. At least one opening is formed in the sacrificial layer below the at least one opening in the structural layer. The at least one opening in the structural layer and the at least one opening in the sacrificial layer are at least partially filled with a filler material. At least one portion of the structural layer is removed to define at least one microstructure. The sacrificial layer is removed such that the at least one microstructure is released from the substrate and the filler material forms one or more protrusions on the at least one microstructure, and/or one or more anchors anchoring the at least one microstructure to the substrate.

    摘要翻译: 半导体结构包括衬底,形成在衬底上或衬底上的牺牲层以及形成在牺牲层上或之上的结构层。 在结构层中形成至少一个开口。 在结构层中的至少一个开口下方的牺牲层中形成至少一个开口。 结构层中的至少一个开口和牺牲层中的至少一个开口至少部分地填充有填充材料。 去除结构层的至少一部分以限定至少一个微结构。 去除牺牲层,使得至少一个微结构从衬底释放并且填充材料在至少一个微结构上形成一个或多个突起,和/或一个或多个将至少一个微结构锚定到衬底的锚固件。

    Electrostatic actuator device having multiple gap heights
    37.
    发明授权
    Electrostatic actuator device having multiple gap heights 有权
    具有多个间隙高度的静电致动器装置

    公开(公告)号:US08450902B2

    公开(公告)日:2013-05-28

    申请号:US11467660

    申请日:2006-08-28

    IPC分类号: H02N1/00 H01H59/00 B41J2/45

    CPC分类号: H01H59/0009 H01G5/18

    摘要: The present application is directed to novel electrostatic actuators and methods of making the electrostatic actuators. In one embodiment, the electrostatic actuator comprises a substrate, an electrode formed on the substrate and a deflectable member positioned in proximity to the electrode so as to provide a gap between the electrode and the deflectable member. The deflectable member is anchored on the substrate via one or more anchors. The gap comprises at least one first region having a first gap height positioned near the one or more anchors and at least one second region having a second gap height positioned farther from the anchors than the first region. The first gap height is smaller than the second gap height.

    摘要翻译: 本申请涉及新型静电致动器和制造静电致动器的方法。 在一个实施例中,静电致动器包括衬底,形成在衬底上的电极和位于电极附近的可偏转构件,以便在电极和可偏转构件之间提供间隙。 可偏转构件经由一个或多个锚固件锚定在基底上。 所述间隙包括至少一个第一区域,其具有位于所述一个或多个锚固件附近的第一间隙高度和至少一个第二区域,所述第二区域具有比所述第一区域更远离所述锚定件的第二间隙高度。 第一间隙高度小于第二间隙高度。

    Fabry-Perot piezoelectric tunable filter
    39.
    发明授权
    Fabry-Perot piezoelectric tunable filter 有权
    法布里 - 珀罗压电可调谐滤波器

    公开(公告)号:US07911623B2

    公开(公告)日:2011-03-22

    申请号:US11890575

    申请日:2007-08-07

    IPC分类号: G01B9/02

    摘要: Disclosed is a microelectromechanically tunable Fabry-Perot device and method of manufacturing tunable Fabry-Perot device and method of manufacturing. The F-P device comprises a first and second substrate which has partially reflective planar surfaces, and the partially reflective planar surfaces are separated by a predetermined separation distance and aligned to provide a F-P cavity, where one or more piezoelectric members are adapted to displace the first and second substrates when an electric field is applied.

    摘要翻译: 公开了一种微机电可调法布里 - 珀罗器件和制造可调谐法布里 - 珀罗器件的方法和制造方法。 FP器件包括第一和第二衬底,其具有部分反射的平面表面,并且部分反射的平面表面被隔开预定的间隔距离并对齐以提供FP腔,其中一个或多个压电元件适于使第一和 施加电场时的第二基板。

    Electric field concentration minimization for MEMS
    40.
    发明授权
    Electric field concentration minimization for MEMS 有权
    MEMS的电场浓度最小化

    公开(公告)号:US07718458B2

    公开(公告)日:2010-05-18

    申请号:US11853469

    申请日:2007-09-11

    IPC分类号: H01L21/00 H01L31/00 H01G5/16

    CPC分类号: B81B3/0086

    摘要: A method and resulting device for reducing an electrical field at an isolation gap in a capacitive actuator includes providing a bottom electrode layer and forming a pattern in the bottom electrode layer having an isolation gap between center and outer electrode components of the patterned electrode. A spacing material is deposited in the isolation gap, the spacing material having a greater height than a remainder of the patterned electrode, and a sacrificial material is deposited conformably on a surface of the patterned electrode and spacing material. The method also includes applying a deformable electrode to a surface of the sacrificial material, whereby removal of the sacrificial and spacing materials results in a greater spacing between the deformable electrode and the electrode layer at a region of the isolation gap than over a remainder of the spacing between the patterned electrode layer and deformable surface.

    摘要翻译: 用于减小电容式致动器中的隔离间隙处的电场的方法和所得装置包括提供底部电极层并在底部电极层中形成图案,该图案在图案化电极的中心和外部电极组件之间具有隔离间隙。 间隔材料沉积在隔离间隙中,间隔材料具有比图案化电极的其余部分更大的高度,并且将牺牲材料顺应地沉积在图案化电极和间隔材料的表面上。 该方法还包括将可变形电极施加到牺牲材料的表面,由此去除牺牲和间隔材料导致在隔离间隙的区域处的可变形电极和电极层之间的间隔比在其余部分 图案化电极层和可变形表面之间的间距。