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51 条记录 (耗时 0.024 秒)

    Data speculation within modulo scheduled loops
    31.
    发明授权
    Data speculation within modulo scheduled loops 有权
    模数调度循环中的数据推测

    公开(公告)号：US06832370B1

    公开(公告)日：2004-12-14

    申请号：US09566990

    申请日：2000-05-09

    申请人： Uma Srinivasan ,  Kevin Nomura ,  Dz-ching Ju

    发明人： Uma Srinivasan ,  Kevin Nomura ,  Dz-ching Ju

    IPC分类号： G06F945

    CPC分类号： G06F8/4452

    摘要： Optimizing compiler performance by applying data speculation within modulo scheduled loops to achieve a higher degree of instruction-level parallelism. The compiler locates a schedule for specifying an order of execution of the instructions and allocates rotating registers for the instruction execution. Based upon the schedule and the register allocation, the compiler determines an initiation interval specifying a number of instruction issue cycles between initiation of successive iterations related to the scheduling of the instructions.

    摘要翻译： 通过在模数调度循环中应用数据推测来优化编译器性能，以达到较高程度的指令级并行性。 编译器定位用于指定指令执行顺序的计划，并为指令执行分配旋转寄存器。 基于时间表和寄存器分配，编译器确定指定与指令调度相关的连续迭代的启动之间的指令发布周期数的启动间隔。

    Method and system for patterning a mask layer
    33.
    发明授权
    Method and system for patterning a mask layer 有权
    图案化掩模层的方法和系统

    公开(公告)号：US08968985B2

    公开(公告)日：2015-03-03

    申请号：US11731689

    申请日：2007-03-30

    申请人： Scott Jong Ho Limb ,  Eric J. Shrader ,  Uma Srinivasan

    发明人： Scott Jong Ho Limb ,  Eric J. Shrader ,  Uma Srinivasan

    IPC分类号： G03F7/20 ,  H05K3/00 ,  H05K3/28

    CPC分类号： G03F7/2018 ,  H05K3/0023 ,  H05K3/0082 ,  H05K3/28 ,  H05K2203/0551

    摘要： The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.

    摘要翻译： 目前描述的实施例使用打印过程，例如。 蜡印刷技术，用于对例如印刷电路的掩模层（例如焊接掩模层）进行图案化。 可以维持开发焊接掩模和曝光工艺中的所有其他常规工艺。 根据目前描述的实施例，每个印刷电路将具有匹配均匀和非均匀跳动的独特图案。 在一种形式中，图案由具有特定间隙的蜡单滴组成，以使得该过程对于当前行业实践是透明的。 此外，单滴可以用于大小区域，而没有任何显影时间差。 在至少一种形式中，间隙中的蜡图案和焊接掩模在显影期间被去除。

    Silicon substrates with doped surface contacts formed from doped silicon inks and corresponding processes
    34.
    发明授权
    Silicon substrates with doped surface contacts formed from doped silicon inks and corresponding processes 有权
    具有由掺杂硅油墨形成的掺杂表面接触的硅衬底和相应的工艺

    公开(公告)号：US08912083B2

    公开(公告)日：2014-12-16

    申请号：US13113287

    申请日：2011-05-23

    申请人： Guojun Liu ,  Uma Srinivasan ,  Shivkumar Chiruvolu

    发明人： Guojun Liu ,  Uma Srinivasan ,  Shivkumar Chiruvolu

    IPC分类号： H01L21/22 ,  H01L21/38 ,  H01L21/02 ,  H01L21/225 ,  H01L21/228 ,  B82Y30/00 ,  H01L31/068 ,  H01L31/18

    CPC分类号： H01L21/2252 ,  B82Y30/00 ,  H01L21/2225 ,  H01L21/228 ,  H01L31/068 ,  H01L31/0682 ,  H01L31/1804 ,  Y02E10/52 ,  Y02E10/547 ,  Y02P70/521

    摘要： The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells.

    摘要翻译： 使用掺杂的硅纳米颗粒油墨和其它液体掺杂剂源可以提供合适的掺杂剂源，以便如果提供合适的盖，则使用热处理将掺杂剂元素驱动到晶体硅衬底中。 合适的帽包括例如盖板，可以或可以不搁置在基材表​​面上的盖和覆盖层。 可以实现期望的掺杂剂。 可以使用硅油墨递送掺杂的纳米颗粒。 在掺杂剂驱入或至少部分致密化成掺入产品装置的硅材料之后，可以除去残留的硅油墨。 硅掺杂适用于将掺杂剂引入结晶硅以形成太阳能电池。

    SILICON/GERMANIUM NANOPARTICLE INKS AND METHODS OF FORMING INKS WITH DESIRED PRINTING PROPERTIES
    35.
    发明申请
    SILICON/GERMANIUM NANOPARTICLE INKS AND METHODS OF FORMING INKS WITH DESIRED PRINTING PROPERTIES 审中-公开
    硅/锗纳米油墨和形成具有所需印刷性能的墨水的方法

    公开(公告)号：US20130189831A1

    公开(公告)日：2013-07-25

    申请号：US13353645

    申请日：2012-01-19

    申请人： Weidong Li ,  Gina Elizabeth Pengra-Leung ,  Uma Srinivasan ,  Shivkumar Chiruvolu ,  Masaya Soeda ,  Guojon Liu

    发明人： Weidong Li ,  Gina Elizabeth Pengra-Leung ,  Uma Srinivasan ,  Shivkumar Chiruvolu ,  Masaya Soeda ,  Guojon Liu

    IPC分类号： H01L21/20 ,  H01B1/04 ,  H01B1/02 ,  B82Y40/00 ,  B82Y30/00

    CPC分类号： H01L21/02381 ,  B82Y30/00 ,  H01L21/02488 ,  H01L21/02532 ,  H01L21/02601 ,  H01L21/02628

    摘要： Improved silicon/germanium nanoparticle inks are described that have silicon/germanium nanoparticles well distributed within a stable dispersion. In particular the inks are formulated with a centrifugation step to remove contaminants as well as less well dispersed portions of the dispersion. A sonication step can be used after the centrifugation, which is observed to result in a synergistic improvement to the quality of some of the inks. The silicon/germanium ink properties can be engineered for particular deposition applications, such as spin coating or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon/germanium nanoparticles. The silicon/germanium nanoparticles are well suited for forming semiconductor components, such as components for thin film transistors or solar cell contacts.

    摘要翻译： 描述了改进的硅/锗纳米颗粒油墨，其具有良好分布在稳定分散体内的硅/锗纳米颗粒。 特别地，油墨通过离心步骤配制以除去分散体中的污染物以及较不良好分散的部分。 在离心之后可以使用超声处理步骤，这被观察到导致对一些油墨的质量的协同改进。 可以为特定的沉积应用（例如旋涂或丝网印刷）设计硅/锗油墨性质。 描述适当的处理方法以提供油墨设计的灵活性，而不对硅/锗纳米颗粒进行表面改性。 硅/锗纳米颗粒非常适合于形成诸如用于薄膜晶体管或太阳能电池触点的部件的半导体部件。

    BACK CONTACT SOLAR CELLS WITH EFFECTIVE AND EFFICIENT DESIGNS AND CORRESPONDING PATTERNING PROCESSES
    36.
    发明申请
    BACK CONTACT SOLAR CELLS WITH EFFECTIVE AND EFFICIENT DESIGNS AND CORRESPONDING PATTERNING PROCESSES 审中-公开
    返回联系有效和有效的设计和相关方案的太阳能电池

    公开(公告)号：US20100294349A1

    公开(公告)日：2010-11-25

    申请号：US12469441

    申请日：2009-05-20

    申请人： Uma Srinivasan ,  Xin Zhou ,  Henry Hieslmair ,  Neeraj Pakala

    发明人： Uma Srinivasan ,  Xin Zhou ,  Henry Hieslmair ,  Neeraj Pakala

    IPC分类号： H01L31/00 ,  H01L21/26

    CPC分类号： H01L21/22 ,  H01L21/2255 ,  H01L21/228 ,  H01L21/268 ,  H01L31/022441 ,  H01L31/0682 ,  Y02E10/547

    摘要： Laser based processes are used alone or in combination to effectively process doped domains for semiconductors and/or current harvesting structures. For example, dopants can be driven into a silicon/germanium semiconductor layer from a bare silicon/germanium surface using a laser beam. Deep contacts have been found to be effective for producing efficient solar cells. Dielectric layers can be effectively patterned to provide for selected contact between the current collectors and the doped domains along the semiconductor surface. Rapid processing approaches are suitable for efficient production processes.

    摘要翻译： 基于激光的工艺单独使用或组合使用以有效地处理半导体和/或当前采集结构的掺杂域。 例如，掺杂剂可以使用激光束从裸硅/锗表面驱动到硅/锗半导体层中。 已经发现深层接触对于生产高效太阳能电池是有效的。 电介质层可以被有效地构图以提供集电器和沿着半导体表面的掺杂区域之间的选择的接触。 快速处理方法适用于高效的生产工艺。

    Global bit line restore timing scheme and circuit
    37.
    发明授权
    Global bit line restore timing scheme and circuit 失效
    全局位线恢复时序方案和电路

    公开(公告)号：US07272030B2

    公开(公告)日：2007-09-18

    申请号：US11554072

    申请日：2006-10-30

    申请人： Yuen H. Chan ,  Ryan T. Freese ,  Antonio R. Pelella ,  Uma Srinivasan ,  Arthur D. Tuminaro ,  Jatinder K. Wadhwa

    发明人： Yuen H. Chan ,  Ryan T. Freese ,  Antonio R. Pelella ,  Uma Srinivasan ,  Arthur D. Tuminaro ,  Jatinder K. Wadhwa

    IPC分类号： G11C11/00

    CPC分类号： G11C7/18 ,  G11C7/12 ,  G11C11/417

    摘要： A domino SRAM array restore pulse generation system launches the work decode line by the same local clock as the restore pulse, thus eliminating any race issues with the word line select. This system allows the global bit select (or column select) to have fast activation by releasing the reset signal (with the earliest arriving array clock, ck1), while guaranteeing almost perfect tracking with the bit decode system. This allows for the widest possible write window; earliest release of the pre-charge in the global column select, and resetting only after the bit decode system is deactivated.

    摘要翻译： 多米诺SRAM阵列恢复脉冲发生系统通过与恢复脉冲相同的本地时钟启动工作解码线，从而消除了字线选择的任何种族问题。 该系统允许全局位选择（或列选择）通过释放复位信号（具有最早到达的阵列时钟ck 1）来快速激活，同时保证使用位解码系统几乎完美的跟踪。 这允许最广泛的写入窗口; 全局列中最早发布预充电选择，仅在位解码系统被禁用后进行复位。

    Optical modulator with a traveling surface relief pattern
    38.
    发明授权
    Optical modulator with a traveling surface relief pattern 有权
    具有行进表面浮雕图案的光学调制器

    公开(公告)号：US07054054B1

    公开(公告)日：2006-05-30

    申请号：US11017402

    申请日：2004-12-20

    申请人： Uma Srinivasan ,  Eric J. Shrader ,  Robert Matusiak

    发明人： Uma Srinivasan ,  Eric J. Shrader ,  Robert Matusiak

    IPC分类号： G02B26/00

    CPC分类号： G02B26/0825

    摘要： A variable modulator assembly includes a deformable layer adhered to a compliant layer surface, and an n-phase electrode configuration, n>2, adhered to an opposite surface of the compliant layer. A controller is configured to selectively apply a variable signal to the selected electrodes of the electrode configuration. Application of the variable signal causes the deformable layer to reconfigure to an alternated shape having distinct peaks and valleys. The distance between the peaks and valleys being determined by the value of the applied variable signal, wherein the alternated shape travels in a preferred direction. An optical modulating method includes positioning the variable modulator assembly to receive and reflect light from a light source, monitoring the reflected light, and altering the variable signal to maintain a desired output intensity.

    摘要翻译： 可变调制器组件包括粘附到顺应性层表面的可变形层和粘附到柔顺层的相对表面上的n相电极构型n> 2。 控制器被配置为选择性地将可变信号施加到所选择的电极配置的电极。 可变信号的应用使可变形层重新配置成具有不同峰和谷的交替形状。 峰值和谷之间的距离由施加的可变信号的值确定，其中交替形状沿优选方向行进。 光调制方法包括定位可变调制器组件以接收和反射来自光源的光，监测反射光，以及改变可变信号以保持期望的输出强度。

    Method for obtaining controlled sidewall profile in print-patterned structures
    40.
    发明授权
    Method for obtaining controlled sidewall profile in print-patterned structures 有权
    在印刷图案结构中获得受控侧壁轮廓的方法

    公开(公告)号：US08551556B2

    公开(公告)日：2013-10-08

    申请号：US11943453

    申请日：2007-11-20

    申请人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

    发明人： Eric Shrader ,  Uma Srinivasan ,  Clark Crawford ,  Scott Limb

    IPC分类号： B05D5/12 ,  B05D5/06 ,  B05D5/00

    CPC分类号： G03F7/2018 ,  H05K3/0079 ,  H05K3/108 ,  H05K3/184 ,  H05K2203/013 ,  H05K2203/0577 ,  H05K2203/0588

    摘要： High aspect ratio structures can be obtained by print-patterning masking features in feature stacks such that each feature has a lateral edge which is aligned in a plane roughly perpendicular to the plane of the substrate on which the features are formed. Due to the differential lateral spreading between features formed on a substrate and formed atop other features, the print head is indexed less than the radius of a droplet to a position where a droplet ejected by the print head forms an upper feature atop a lower feature such that the lateral edges of the upper and lower features are aligned in the plane roughly perpendicular to the plane of the substrate. Feature stacks of two or more features may provide a vertical (or re-entrant) sidewall mask for formation of high aspect ratio structures, by e.g., electroplating, etc.

    摘要翻译： 可以通过在特征堆叠中打印图案化掩模特征来获得高纵横比结构，使得每个特征具有在大致垂直于其上形成有特征的基底的平面的平面中对准的横向边缘。 由于形成在基板上并形成在其它特征上的特征之间的差异横向扩展，打印头被折射小于液滴的半径到由打印头喷射的液滴在下部特征顶部形成上部特征的位置，例如 上和下特征的侧边缘在大致垂直于基板的平面的平面中对准。 两个或更多个特征的特征堆叠可以提供用于形成高纵横比结构的垂直（或重入）侧壁掩模，例如通过电镀等。