公开(公告)号：US20180246418A1

公开(公告)日：2018-08-30

申请号：US15969847

申请日：2018-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Aleksey Yurievich Kolesnychenko ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

公开(公告)号：US09989861B2

公开(公告)日：2018-06-05

申请号：US15823188

申请日：2017-11-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Aleksey Yurievich Kolesnychenko ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Felix Godfried Peter Peeters ,  Bob Streefkerk ,  Franciscus Johannes Herman Maria Teunissen ,  Helmar Van Santen

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733 ,  G03F7/70866 ,  G03F7/70908

Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.