公开(公告)号：US20060290908A1

公开(公告)日：2006-12-28

申请号：US11167563

申请日：2005-06-28

申请人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Roelof De Graaf ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which measures are taken to prevent or reduce the presence of bubbles in liquid through which the projection beam radiates. This may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow radially outwardly from the optical axis in the vicinity of the edge of the substrate.

摘要翻译： 公开了一种光刻投影装置，其中采取措施来防止或减少投影光束通过其喷射的液体中气泡的存在。 这可以例如通过确保衬底和衬底台之间的间隙用浸没液体填充或者通过使基板的边缘附近的光轴径向向外的局部流动来实现。

公开(公告)号：US20060121209A1

公开(公告)日：2006-06-08

申请号：US11005219

申请日：2004-12-07

申请人： Johannes Matheus Baselmans ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

发明人： Johannes Matheus Baselmans ,  Sjoerd Lambertus Donders ,  Christiaan Hoogendam ,  Jeroen Sophia Maria Mertens ,  Johannes Hubertus Mulkens ,  Bob Streefkerk

IPC分类号： B05D1/36 ,  B05D3/00 ,  B29C71/04

CPC分类号： G03F7/70341

摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

摘要翻译： 光刻投影装置包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 光刻设备还包括被配置为保持衬底的衬底台。 衬底具有至少部分地涂覆有辐射敏感材料层的表面。 光刻设备还包括配置成将图案化的光束投影到基板的目标部分上的投影系统和液体供应系统。 液体供应系统被配置为在辐射敏感材料层的顶部上提供预润湿液体以预润湿基底，并且被配置为在预润湿基底和至少一部分投影系统之间的空间中提供浸没液体。

公开(公告)号：US20050270506A1

公开(公告)日：2005-12-08

申请号：US11132415

申请日：2005-05-19

申请人： Bob Streefkerk ,  Henrikus Cox ,  Christiaan Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Zaal ,  Minne Cuperus

发明人： Bob Streefkerk ,  Henrikus Cox ,  Christiaan Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Koen Jacobus Johannes Zaal ,  Minne Cuperus

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70641 ,  G03F7/70783

摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

摘要翻译： 浸没式光刻设备包括液体供应系统构件，其构造成在光刻设备的投影系统和基板之间的空间中容纳液体，液体供应系统构件补偿器被布置成补偿液体供应系统构件和基板台之间的相互作用 。

公开(公告)号：US20050219483A1

公开(公告)日：2005-10-06

申请号：US11092964

申请日：2005-03-30

申请人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Sophia Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7096 ,  G03F7/70341

摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

摘要翻译： 公开了一种浸没式光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充投影系统的最终元件和基板台之间的空间与第一液体，以及测量系统，其被配置为测量每个 多个点在基板上，测量系统布置成使得通过第二液体进行测量，第二液体不由液体供应系统供应。

公开(公告)号：US20060250601A1

公开(公告)日：2006-11-09

申请号：US11120186

申请日：2005-05-03

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hans Jansen ,  Martinus Hendrikus Leenders ,  Paulus Martinus Liebregts ,  Jeroen Johannes Mertens ,  Jan-Gerard Van Der Toorn ,  Michel Riepen

IPC分类号： G03B27/58

CPC分类号： G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.

摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。

公开(公告)号：US20060119816A1

公开(公告)日：2006-06-08

申请号：US11005500

申请日：2004-12-07

申请人： Johannes Jacobus Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Baselmans ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Jeroen Johannes Mertens ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： G03B27/42 ,  G03C5/00

CPC分类号： G03F7/7085 ,  G03F7/70341 ,  G03F7/70808

摘要： The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.

摘要翻译： 光刻设备包括构造成保持图案形成装置的支撑结构。 图案形成装置被配置成根据期望的图案对辐射束进行图案化。 所述光刻设备还包括被配置为保持基板的基板台，配置成将所述图案化的光束投影到所述基板的目标部分上的投影系统;被配置为测量（a）所述基板台的参数的测量系统，或（b ）基板，或（c）由投影系统投影的图像，或（d）（a） - （c）的任何组合，以及被配置为将液体供应到基板和投影件之间的空间的液体供应系统 系统。 光刻设备还包括设置在测量系统的一部分附近并被配置为将测量系统的部分与液体隔离的屏蔽件。

公开(公告)号：US20050259233A1

公开(公告)日：2005-11-24

申请号：US10850451

申请日：2004-05-21

申请人： Bob Streefkerk ,  Henrikus Herman Cox ,  Christiaan Hoogendam ,  Jeroen Johannes Sophia Mertens ,  Koen Jacobus Johannes Zaal ,  Minne Cuperus

发明人： Bob Streefkerk ,  Henrikus Herman Cox ,  Christiaan Hoogendam ,  Jeroen Johannes Sophia Mertens ,  Koen Jacobus Johannes Zaal ,  Minne Cuperus

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42

CPC分类号： G03F7/70341 ,  G03F7/70641 ,  G03F7/70783

摘要： An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.

公开(公告)号：US20050219482A1

公开(公告)日：2005-10-06

申请号：US10814822

申请日：2004-04-01

申请人： Johannes Jacobus Baselmans ,  Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

发明人： Johannes Jacobus Baselmans ,  Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Hans Jansen ,  Johannes Catharinus Mulkens ,  Bob Streefkerk

IPC分类号： H01L21/027 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F9/7096 ,  G03F7/70341

摘要： A substrate is exposed through immersion liquid supplied by a liquid supply system. Prior to being exposed, a map of the surface of the substrate is generated at a measurement station. A liquid supply system fills the space between a measurement system and the substrate so the measurement takes place through liquid.

摘要翻译： 通过由液体供应系统供应的浸没液体暴露基板。 在曝光之前，在测量台产生基板表面的图。 液体供应系统填充测量系统和基板之间的空间，以便通过液体进行测量。

公开(公告)号：US20070114451A1

公开(公告)日：2007-05-24

申请号：US11603228

申请日：2006-11-22

申请人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

发明人： Hans Jansen ,  Sebastiaan Maria Cornelissen ,  Sjoerd Nicolaas Donders ,  Roelof De Graaf ,  Christiaan Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Leenders ,  Jeroen Johannes Mertens ,  Bob Streefkerk ,  Jan-Gerard Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Janssen ,  Michel Riepen

IPC分类号： G21G5/00

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US20060017893A1

公开(公告)日：2006-01-26

申请号：US10895998

申请日：2004-07-22

申请人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Bob Streefkerk

发明人： Jeroen Johannes Mertens ,  Sjoerd Nicolaas Donders ,  Christiaan Hoogendam ,  Bob Streefkerk

IPC分类号： G03B27/52

CPC分类号： G03F7/707 ,  G03F7/70341

摘要： In an immersion-type lithographic apparatus, in which a surface of a substrate is immersed in liquid during an exposure operation, the substrate is held against a substrate table. On completion of the exposure operation, the substrate is lifted clear of the substrate table. In order to overcome a tendency caused by a film of residual liquid to cause the substrate to stick to the substrate table, pins used to lift the substrate are arranged and operated so that, at least initially, force is applied to the substrate at a location offset from its central axis.

摘要翻译： 在曝光操作中将基板的表面浸入液体的浸渍式光刻设备中，将基板保持在基板台上。 在完成曝光操作时，将衬底提升离开衬底台。 为了克服由残留液体的膜导致基板粘附到基板台上的倾向，布置和操作用于提升基板的销，使得至少最初将力施加到基板的位置 偏离其中心轴。