-
公开(公告)号:US09164401B2
公开(公告)日:2015-10-20
申请号:US13061792
申请日:2009-07-17
申请人: Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
发明人: Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
IPC分类号: G03F7/20
CPC分类号: G03F7/70891 , G03F7/70258 , G03F7/70825
摘要: A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译: 提供了一种投影系统(PS),在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架(200)上。 使用第一测量系统(910)相对于第二框架(300)测量光学元件的位置。 第二测量系统(920)用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常,框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地,可以提供温度控制系统(780,790)以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。
-
公开(公告)号:US08947637B2
公开(公告)日:2015-02-03
申请号:US13226103
申请日:2011-09-06
CPC分类号: G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
摘要翻译: 提供了一种光刻设备,其具有在基底水平的传感器,所述传感器包括辐射接收器,支撑辐射接收器的透射板和辐射探测器,其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
-
公开(公告)号:US08629418B2
公开(公告)日:2014-01-14
申请号:US11591674
申请日:2006-11-02
申请人: Marcus Adrianus Van De Kerkhof , Haico Victor Kok , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Werner Weissbrodt , Manfred Helmut Gustav Wilhelm Johannes Schrenk , Torsten Harzendorf
发明人: Marcus Adrianus Van De Kerkhof , Haico Victor Kok , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Werner Weissbrodt , Manfred Helmut Gustav Wilhelm Johannes Schrenk , Torsten Harzendorf
CPC分类号: G03F7/7085
摘要: A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
摘要翻译: 一种用于高数值孔径光刻设备中的衬底级别的传感器,该传感器具有覆盖感测元件的透明板,并且包括改善辐射与感测元件的耦合的元件。 改进的耦合元件包括设置在透明板和感测元件之间的流动液体介质。
-
公开(公告)号:US08558989B2
公开(公告)日:2013-10-15
申请号:US12850472
申请日:2010-08-04
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
-
公开(公告)号:US08482845B2
公开(公告)日:2013-07-09
申请号:US12698932
申请日:2010-02-02
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和传感器之间的空间填充有液体。
-
公开(公告)号:US20110285977A1
公开(公告)日:2011-11-24
申请号:US13195248
申请日:2011-08-01
申请人: Joeri LOF , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri LOF , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/52
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
-
公开(公告)号:US07907255B2
公开(公告)日:2011-03-15
申请号:US10924202
申请日:2004-08-24
CPC分类号: G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
-
公开(公告)号:US07453078B2
公开(公告)日:2008-11-18
申请号:US11896981
申请日:2007-09-07
申请人: Haico Victor Kok , Marcus Adrianus Van De Kerhof , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
发明人: Haico Victor Kok , Marcus Adrianus Van De Kerhof , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
CPC分类号: G03F7/7085
摘要: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
摘要翻译: 一种用于高数值温度光刻设备中的衬底级别的传感器,该传感器具有覆盖感测元件的透明板,并且包括改善辐射与感测元件的耦合的元件。 元件包括菲涅尔透镜,全息光学元件,倒置的温斯顿锥体,球面透镜和表面粗糙化。
-
公开(公告)号:US07282701B2
公开(公告)日:2007-10-16
申请号:US11067491
申请日:2005-02-28
申请人: Haico Victor Kok , Marcus Adrianus Van De Kerhof , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
发明人: Haico Victor Kok , Marcus Adrianus Van De Kerhof , Borgert Kruizinga , Timotheus Franciscus Sengers , Bearrach Moest , Marc Antonius Maria Haast , Peter Weissbrodt , Manfred Schrenk , Torsten Harzendorf
CPC分类号: G03F7/7085
摘要: A sensor for use at substrate level in a high numerical aperature lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The elements include Fresnel lenses, holographic optical elements, inverted Winston Cones, spherical lenses and surface roughening.
摘要翻译: 一种用于高数值温度光刻设备中的衬底级别的传感器,该传感器具有覆盖感测元件的透明板,并且包括改善辐射与感测元件的耦合的元件。 元件包括菲涅尔透镜,全息光学元件,倒置的温斯顿锥体,球面透镜和表面粗糙化。
-
公开(公告)号:US07199858B2
公开(公告)日:2007-04-03
申请号:US10705804
申请日:2003-11-12
申请人: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Theodorus Maria Bijlaart , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
摘要翻译: 公开了一种光刻投影装置,其中投影系统和基板之间的空间填充有液体。 边缘密封构件至少部分地围绕衬底台面上的衬底或其它物体,以防止衬底或其他物体的边缘部分例如成像或照亮时的液体损失。
-
-
-
-
-
-
-
-
-