公开(公告)号：US09625836B2

公开(公告)日：2017-04-18

申请号：US14327650

申请日：2014-07-10

申请人： CANON KABUSHIKI KAISHA

发明人： Wataru Yamaguchi ,  Takahiro Matsumoto ,  Hideki Ina

IPC分类号： G03B27/54 ,  G03F9/00 ,  G03F7/20 ,  G01B9/02 ,  G01B11/06

CPC分类号： G03F9/7034 ,  G01B9/0209 ,  G01B11/0675 ,  G03F7/7085 ,  G03F9/7049

摘要： An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane.

公开(公告)号：US20160139510A1

公开(公告)日：2016-05-19

申请号：US14940349

申请日：2015-11-13

申请人： CANON KABUSHIKI KAISHA

发明人： Yuichi Iwasaki ,  Satoru Oishi ,  Hideki Ina

IPC分类号： G03F7/26

CPC分类号： G03F9/70 ,  G03F9/7088 ,  H01J2237/30438 ,  H01J2237/3175

摘要： The present invention provides a lithography apparatus including a plurality of detectors each configured to detect a mark on the substrate, and a controller configured to control a patterning so that a first operation and a second operation are alternately performed, the first operation irradiating the substrate with a beam while scan movement of the substrate is performed in a first direction, the second operation performing step movement of the substrate in a second direction different from the first direction, wherein the controller is configured to cause, in the first operation, at least one of the plurality of detectors to detect the mark, and the plurality of detectors are arranged, in the second direction, at an interval which is a positive integer multiple of a distance of the step movement.

摘要翻译： 本发明提供了一种光刻设备，其包括多个检测器，每个检测器被配置为检测基板上的标记;以及控制器，被配置为控制图案化，使得交替执行第一操作和第二操作，第一操作照射基板 在第一方向进行基板的扫描运动时的光束，所述第二操作在与所述第一方向不同的第二方向上执行所述基板的步进移动，其中所述控制器被配置为在所述第一操作中使至少一个 以检测标记，并且所述多个检测器在所述第二方向上以所述台阶移动的距离的正整数倍的间隔排列。

公开(公告)号：US09280048B2

公开(公告)日：2016-03-08

申请号：US14261889

申请日：2014-04-25

申请人： CANON KABUSHIKI KAISHA

发明人： Hiroshi Sato ,  Hideki Ina

IPC分类号： B05D3/12 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00 ,  B29C59/02

CPC分类号： G03F7/0002 ,  B29C59/02 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint apparatus which cures a resin dispensed on a substrate while the resin and a pattern surface of a mold are in contact with each other, comprises a supply portion configured to supply a gas, used to accelerate filling of a concave portion of the pattern surface of the mold with the resin, to a space which the pattern surface of the mold faces, and a controller configured to control the supply portion to supply the gas to the space before the resin and the pattern surface of the mold are brought into contact with each other, wherein the supply portion is configured to supply the gas to the space via a porous portion formed in at least part of the mold.

公开(公告)号：US09257262B2

公开(公告)日：2016-02-09

申请号：US14263876

申请日：2014-04-28

申请人： CANON KABUSHIKI KAISHA

发明人： Koichi Sentoku ,  Hideki Ina

IPC分类号： H01J37/317 ,  G03F7/20

CPC分类号： H01J37/3177 ,  G03F7/70633 ,  H01J2237/24405 ,  H01J2237/31793

摘要： A lithography apparatus for performing pattern formation on a substrate includes a stage configured to hold the substrate and be movable, an optical system configured to irradiate the substrate with an energy beam for the pattern formation, and a controller configured to set an arrangement of first and second marks for overlay inspection, which is variable with respect to a first substrate for condition setting, and control the stage and the optical system so that first processing for forming the first mark on the first substrate without the pattern formation and second processing for forming the second mark on the first substrate with the pattern formation are performed based on the set arrangement.

摘要翻译： 用于在基板上进行图案形成的光刻装置包括：被配置为保持基板并可移动的台，被配置为用于对基板照射用于图案形成的能量束的光学系统;以及控制器，其被配置为设置第一和 用于覆盖检查的第二标记，其相对于用于条件设置的第一基板是可变的，并且控制台和光学系统，使得在第一基板上形成第一标记的第一处理而不进行图案形成和用于形成第二标记的第二处理 基于设置的布置来执行具有图案形成的第一基板上的第二标记。

公开(公告)号：US20150022796A1

公开(公告)日：2015-01-22

申请号：US14327650

申请日：2014-07-10

申请人： CANON KABUSHIKI KAISHA

发明人： Wataru Yamaguchi ,  Takahiro Matsumoto ,  Hideki Ina

IPC分类号： G01B9/02 ,  G03F7/20

CPC分类号： G03F9/7034 ,  G01B9/0209 ,  G01B11/0675 ,  G03F7/7085 ,  G03F9/7049

摘要： An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light from the light source before the detector detects the light from the light source. The optical member gives higher spatial coherence in a second direction serving as a direction of a line of intersection of a cross section of a beam of the light incident on the optical member, and a plane including optical paths of the light from the light source before being divided by the optical system, the reference light, the measurement light, and the interfering light, than in a first direction perpendicular to the plane.

摘要翻译： 干涉仪包括：光学系统，被配置为通过分离来自光源的光，并组合参考光和测量光来产生干涉光; 检测器，被配置为检测由所述光学系统产生的干涉光; 以及光学构件，被配置为在所述检测器检测到来自所述光源的光之前给来自所述光源的光的空间相干性。 光学构件在入射到光学构件的光束的横截面与包括来自光源的光的光路的平面的交叉方向的第二方向上给出更高的空间相干性，之前 被光学系统划分，参考光，测量光和干涉光，而不是垂直于平面的第一方向。

公开(公告)号：US20140153003A1

公开(公告)日：2014-06-05

申请号：US14086132

申请日：2013-11-21

申请人： CANON KABUSHIKI KAISHA

发明人： Takahiro Miyakawa ,  Kazuhiro Sato ,  Ken Minoda ,  Hideki Ina

IPC分类号： G01B11/06

CPC分类号： G01B11/0616 ,  G01B11/0633

摘要： An measuring apparatus includes: a storage unit configured to store a relationship, regarding an irradiation condition predetermined based on a correlation between a characteristic of each of beams of reflected light obtained from a plurality of patterns different from one another in a thickness of a residual layer in a recessed portion and the thickness of the residual layer of each of the plurality of patterns, between the characteristic of the reflected light from each pattern and the thickness of the residual layer of the pattern; and a processing unit configured to, based on a characteristic of reflected light from a pattern formed on a substrate irradiated with light under the irradiation condition and the relationship stored in the storage unit, obtain a thickness of a residual layer in a recessed portion of the pattern formed on the substrate.

摘要翻译： 一种测量装置，包括：存储单元，被配置为存储关于基于由残留层的厚度彼此不同的多个图案获得的每个反射光的特性之间的相关性所预定的照射条件的关系 在每个图案的反射光的特性和图案的残留层的厚度之间的凹陷部分中的每一个图案的残留层的厚度; 以及处理单元，被配置为基于在照射条件下照射光的基板上形成的图案的特性和存储在存储单元中的关系，获得残留层的厚度 图案形成在基板上。