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162 条记录 (耗时 0.153 秒)

    Process to open connection vias on a planarized surface
    35.
    发明授权
    Process to open connection vias on a planarized surface 有权
    在平坦化表面上打开连接通孔的过程

    公开(公告)号：US07523550B2

    公开(公告)日：2009-04-28

    申请号：US11411555

    申请日：2006-04-25

    申请人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    发明人： Amanda Baer ,  Hamid Balamane ,  Michael Feldbaum ,  Ming Jiang ,  Aron Pentek

    IPC分类号： H01K3/10

    CPC分类号： G11B5/3163 ,  G11B5/1278 ,  G11B5/3116 ,  Y10T29/49021 ,  Y10T29/49032 ,  Y10T29/49044 ,  Y10T29/49126 ,  Y10T29/49139 ,  Y10T29/49153 ,  Y10T29/49155 ,  Y10T29/49165 ,  Y10T29/49169

    摘要： A method for forming a via in an alumina protective layer on a structure such as a magnetic write head for use in perpendicular magnetic recording. A structure such as a magnetic pole, and or magnetic trailing shield, is formed over a substrate and is covered with a thick layer of alumina. The alumina layer can then be planarized by a chemical mechanical polishing process (CMP) and then a mask structure, such as a photoresist mask, is formed over the alumina layer. The mask structure is formed with an opening disposed over the contact pad. A reactive ion mill is then performed to remove portions of the alumina layer that are exposed at the opening in the mask, thereby forming a via in the alumina layer.

    摘要翻译： 在用于垂直磁记录的诸如磁写头的结构上的氧化铝保护层中形成通孔的方法。 诸如磁极和/或磁性后屏蔽的结构形成在衬底上并被厚层氧化铝覆盖。 然后可以通过化学机械抛光工艺（CMP）将氧化铝层平坦化，然后在氧化铝层上形成诸如光致抗蚀剂掩模的掩模结构。 掩模结构形成有设置在接触垫上方的开口。 然后执行反应离子研磨机以除去在掩模中的开口处暴露的部分氧化铝层，从而在氧化铝层中形成通孔。

    METHOD FOR MAKING A PERPENDICULAR MAGNETIC RECORDING WRITE HEAD
    36.
    发明申请
    METHOD FOR MAKING A PERPENDICULAR MAGNETIC RECORDING WRITE HEAD 失效
    一种完整的磁记录写头的方法

    公开(公告)号：US20070245544A1

    公开(公告)日：2007-10-25

    申请号：US11380189

    申请日：2006-04-25

    申请人： Donald Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Aron Pentek

    发明人： Donald Allen ,  Amanda Baer ,  Michael Feldbaum ,  Hung-Chin Guthrie ,  Aron Pentek

    IPC分类号： G11B5/127

    CPC分类号： G11B5/3163 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/3146 ,  Y10T29/49021 ,  Y10T29/49039 ,  Y10T29/49043 ,  Y10T29/49044 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： A method for making a write pole in a perpendicular magnetic recording write head uses a metal mask to pattern the primary resist and only ion milling during the subsequent patterning steps. A layer of primary resist is deposited over the magnetic write pole material and a metal mask layer is deposited on the primary resist layer. An imaging resist layer is formed on the metal mask layer and lithographically patterned generally in the desired shape of the write pole. Ion milling without a reactive gas is then performed over the imaging resist pattern to pattern the underlying metal mask layer, which is then used as the mask to define the shape of the primary resist pattern. Ion milling with oxygen is then performed over the metal mask pattern to pattern the underlying primary resist. Ion milling without a reactive gas is then performed over the primary resist pattern to form the underlying write pole.

    摘要翻译： 用于在垂直磁记录写头中制作写极的方法使用金属掩模对主抗蚀剂进行图案化，并且在随后的图案化步骤期间仅使用离子铣削。 一层主抗蚀剂沉积在磁写磁极材料上，并且金属掩模层沉积在主抗蚀剂层上。 在金属掩模层上形成成像抗蚀剂层，并且通常以写入极的所需形状进行光刻图案化。 然后在成像抗蚀剂图案上进行无反应气体的离子研磨以对下面的金属掩模层进行图案化，然后将其用作掩模以限定主抗蚀剂图案的形状。 然后在金属掩模图案上进行用氧离子研磨以对下面的主抗蚀剂进行图案化。 然后在主抗蚀剂图案上执行没有反应气体的离子研磨以形成下面的写极。

    Optical lapping guide for use in the manufacture of perpendicular magnetic write heads
    39.
    发明授权
    Optical lapping guide for use in the manufacture of perpendicular magnetic write heads 失效
    用于制造垂直磁性写入头的光学研磨导轨

    公开(公告)号：US07603762B2

    公开(公告)日：2009-10-20

    申请号：US11611829

    申请日：2006-12-15

    申请人： Amanda Baer ,  Vladimir Nikitin ,  Aron Pentek ,  Neil Leslie Robertson

    发明人： Amanda Baer ,  Vladimir Nikitin ,  Aron Pentek ,  Neil Leslie Robertson

    IPC分类号： B24B49/00 ,  B24B49/10

    CPC分类号： G11B5/3166 ,  G11B5/102 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3169 ,  G11B5/3173 ,  Y10T29/49032 ,  Y10T29/49041 ,  Y10T29/49046 ,  Y10T29/49048 ,  Y10T29/49052

    摘要： An optical lapping guide for determining an amount of lapping performed on a row of sliders in a process for manufacturing sliders for magnetic data recording. The optical lapping guide is constructed with a front edge that is at an angle with respect to an air bearing surface plane ABS plane, such that a portion of the lapping guides is in front of the ABS and portion of the lapping guide is behind the ABS. As lapping progresses, an increasing amount of the lapping guide will be exposed at the ABS and visible for inspection. Therefore, after a lapping process has been performed, the optical lapping guide can be inspected to determine the amount of material removed by lapping. The greater the amount of the lapping guide that is exposed and visible, the greater the amount of material removed by lapping.

    摘要翻译： 光学研磨引导件，用于确定在用于制造用于磁数据记录的滑块的过程中对一排滑块执行的研磨量。 光学研磨引导件的前边缘相对于空气轴承表面平面ABS平面成一定角度，使得研磨导轨的一部分在ABS的前面，研磨导轨的一部分在ABS后面 。 随着研磨的进行，越来越多的研磨导轨将暴露在ABS处并可见以供检查。 因此，在进行研磨处理之后，可以检查光学研磨导向件以确定通过研磨去除的材料的量。 暴露和可见的研磨导轨的量越大，通过研磨去除的材料量就越大。

    Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording
    40.
    发明授权
    Method for fabricating a side shield for a flux guide layer for perpendicular magnetic recording 失效
    用于制造用于垂直磁记录的磁通引​​导层的侧屏蔽的方法

    公开(公告)号：US07515381B2

    公开(公告)日：2009-04-07

    申请号：US11317917

    申请日：2005-12-22

    申请人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

    发明人： Amanda Baer ,  Daniel Wayne Bedell ,  Quang Le ,  Aron Pentek

    IPC分类号： G11B5/147 ,  G11B5/187

    CPC分类号： G11B5/3116 ,  G11B5/112 ,  G11B5/1278 ,  G11B5/3146 ,  G11B5/3163

    摘要： A magnetic head for use in a perpendicular recording system having a novel shield structure that provides exceptional magnetic shielding from extraneous magnetic fields such as from a write coil, shaping layer or return pole of the write head. The shield structure is constructed to have a bottom or leading surface that is generally coplanar with the bottom or leading surface of the shaping layer, but all or a portion of the shield structure is not as thick as the shaping layer so as to have a top surface that does not extend to the same elevation (in a trailing direction) as that of the shaping layer. Making the shields extend to a lower level than the shaping layer improves magnetic performance by reducing flux leakage from the write pole, and also provides manufacturing advantages, such as during the manufacturing of the write pole. These manufacturing advantages include the advantage of having the shields covered with a protective layer of, for example, alumina during the ion milling of the write pole.

    摘要翻译： 一种用于垂直记录系统的磁头，其具有新的屏蔽结构，其提供例如来自写入磁头的写入线圈，成形层或返回磁极的外部磁场的卓越的磁屏蔽。 屏蔽结构被构造成具有与成形层的底部或前表面大致共面的底部或前表面，但是屏蔽结构的全部或一部分不像成形层那样厚，以便具有顶部 表面不延伸到与成形层相同的高度（在拖尾方向上）。 使屏蔽层延伸到比成形层更低的水平，通过减小来自写入极的磁通泄漏来提高磁性能，并且还提供制造优点，例如在写入磁极的制造期间。 这些制造优点包括在写入极的离子铣削期间使屏蔽覆盖有例如氧化铝的保护层的优点。