公开(公告)号：US20140154859A1

公开(公告)日：2014-06-05

申请号：US13705516

申请日：2012-12-05

Applicant: INTERMOLECULAR INC.

Inventor： Vidyut Gopal ,  Tony P. Chiang ,  Imran Hashim ,  Randall J. Higuchi ,  Robert A. Huertas ,  Hieu Pham ,  Yun Wang

IPC: H01L49/02

CPC classification number: H01L22/34 ,  H01L45/08 ,  H01L45/145

Abstract: Provided are methods for processing different materials on the same substrate for high throughput screening of multiple ReRAM materials. A substrate may be divided into multiple site isolated regions, each region including one or more base structures operable as bottom electrodes of ReRAM cells. Different test samples may be formed over these base structures in a combinatorial manner. Specifically, each site isolated region may receive a test sample that has a different characteristic than at least one other sample provided in another region. The test samples may have different compositions and/or thicknesses or be deposited using different techniques. These different samples are then etched in the same operation to form portions of the samples. Each portion is substantially larger than the corresponding base structure and fully covers this base structure to protect the interface between the base structure and the portion during etching.

Abstract translation: 提供了在同一基板上处理不同材料的方法，用于多个ReRAM材料的高通量筛选。 衬底可以被分成多个位置隔离区域，每个区域包括可操作为ReRAM单元的底部电极的一个或多个基底结构。 可以以组合的方式在这些基础结构上形成不同的测试样品。 具体地说，每个位置隔离区域可以接收具有与另一区域中提供的至少一个其他样品不同的特性的测试样品。 测试样品可以具有不同的组成和/或厚度或使用不同的技术沉积。 然后在相同的操作中蚀刻这些不同的样品以形成样品的一部分。 每个部分基本上大于对应的基部结构，并且完全覆盖该基部结构以在蚀刻期间保护基部结构和该部分之间的界面。