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公开(公告)号:US20070132970A1
公开(公告)日:2007-06-14
申请号:US11448990
申请日:2006-06-08
申请人: Joeri Lof , Erik Bijlaart , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Roelof Ritsema , Frank Van Schaik , Thimotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人: Joeri Lof , Erik Bijlaart , Hans Butler , Sjoerd Donders , Christiaan Hoogendam , Aleksey Kolesnychenko , Erik Loopstra , Hendricus Meijer , Jeroen Johannes Mertens , Johannes Catharinus Mulkens , Roelof Ritsema , Frank Van Schaik , Thimotheus Sengers , Klaus Simon , Joannes De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/70866
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
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公开(公告)号:US20070132979A1
公开(公告)日:2007-06-14
申请号:US11482122
申请日:2006-07-07
申请人: Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
发明人: Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
IPC分类号: G03B27/72
CPC分类号: G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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公开(公告)号:US08724083B2
公开(公告)日:2014-05-13
申请号:US13082038
申请日:2011-04-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译: 在光刻设备中,将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度,以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号:US08724084B2
公开(公告)日:2014-05-13
申请号:US13189255
申请日:2011-07-22
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号:US08964164B2
公开(公告)日:2015-02-24
申请号:US13188026
申请日:2011-07-21
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译: 在光刻设备中,将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度,以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号:US20080218717A1
公开(公告)日:2008-09-11
申请号:US12068546
申请日:2008-02-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号: G03B27/42
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号:US20110181859A1
公开(公告)日:2011-07-28
申请号:US13082038
申请日:2011-04-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号: G03B27/54
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
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公开(公告)号:US07936444B2
公开(公告)日:2011-05-03
申请号:US12068546
申请日:2008-02-07
申请人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译: 在光刻设备中,将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度,以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号:US07352434B2
公开(公告)日:2008-04-01
申请号:US10844575
申请日:2004-05-13
申请人: Bob Streefkerk , Levinus Pieter Bakker , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人: Bob Streefkerk , Levinus Pieter Bakker , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Matthijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
CPC分类号: G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
摘要翻译: 在光刻设备中,将投影系统下的基板表面的局部区域浸入液体中。 可以使用致动器来改变衬底表面上方的液体供应系统的高度。 控制系统使用前馈或反馈控制输入基板的表面高度,以将液体供应系统保持在基板表面上方的预定高度。
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公开(公告)号:US20050036121A1
公开(公告)日:2005-02-17
申请号:US10831370
申请日:2004-04-26
申请人: Christiaan Hoogendam , Sjoerd Donders , Hans Jansen , Jacobus Johannus Leonardus Verspay , Antonius Theodorus Derksen , Joeri Lof , Erik Loopstra , Johannes Catharinus Mulkens , Alexander Straaijer , Bob Streefkerk
发明人: Christiaan Hoogendam , Sjoerd Donders , Hans Jansen , Jacobus Johannus Leonardus Verspay , Antonius Theodorus Derksen , Joeri Lof , Erik Loopstra , Johannes Catharinus Mulkens , Alexander Straaijer , Bob Streefkerk
CPC分类号: G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要: In a lithographic projection apparatus, there is provided a liquid supply system comprising a container at least partly defining a space between the projection system and the substrate, the container having a selectively openable and closeable aperture therein, and a closure configured to selectively close and open the aperture. In an embodiment, the shutter may comprise a channel in a surface of the shutter facing the aperture and/or the shutter may be displaced from the liquid supply system when connected to the liquid supply system. Further, in a lithographic apparatus, there is provided a liquid supply system configured to provide a liquid, through which the beam is to be projected, in a space between a projection system and a substrate and a controller configured to control application to the projection system of a force related to a weight transfer attributable to a member of the liquid supply system.
摘要翻译: 在光刻投影设备中,提供了一种液体供应系统,其包括至少部分地限定投影系统和基板之间的空间的容器,该容器在其中具有可选择的可开启和关闭的孔,以及关闭构造成选择性地关闭和打开 光圈。 在一个实施例中,快门可以包括位于快门面向孔的表面中的通道和/或当连接到液体供应系统时活门可以从液体供应系统移位。 此外,在光刻设备中,提供了一种液体供应系统,其配置为在投影系统和基板之间的空间中提供待投射的光束的液体,以及被配置为控制对投影系统的应用的控制器 与由液体供给系统的构件产生的重量传递有关的力。
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