公开(公告)号：US20100245795A1

公开(公告)日：2010-09-30

申请号：US12721493

申请日：2010-03-10

申请人： Fardad A. Hashemi ,  Hiroshi Shirasu ,  Douglas C. Watson

发明人： Fardad A. Hashemi ,  Hiroshi Shirasu ,  Douglas C. Watson

IPC分类号： G03B27/54 ,  H01J9/00

CPC分类号： G03F7/70841 ,  G03B27/54 ,  G03F7/70525 ,  G03F7/70808

摘要： A chamber assembly (226) for providing a sealed chamber (38) adjacent to a workpiece (28) includes a chamber housing (244), a chamber pressure source (246) and a seal assembly (250). The chamber housing (244) cooperates with the workpiece (28) to define at least a portion of the sealed chamber (38). The chamber pressure source (246) controls a chamber pressure within the sealed chamber (38) to be different than the environmental pressure. The seal assembly (250) seals the chamber housing (244) to the workpiece (28). The seal assembly (250) can include a first seal contact region (270) and a second seal contact region (272) that cooperate to define a seal gap (274) adjacent to at least one of the chamber housing (244) and the workpiece (28). The seal assembly (250) may further include a seal pressure source (276) for controlling a seal pressure within the seal gap (274) so that the seal pressure is different than the chamber pressure and the environmental pressure. The first seal contact region (270) and the second seal contact region (272) cooperate to exert a first force (284) on a surface (278). The seal pressure source (276) generates a second force (286) on the surface (278). The first force (284) is approximately equal in magnitude and opposite in direction to the second force (286).

摘要翻译： 用于提供与工件（28）相邻的密封腔（38）的腔室组件（226）包括腔室壳体（244），腔室压力源（246）和密封组件（250）。 腔室壳体（244）与工件（28）配合以限定密封腔室（38）的至少一部分。 腔室压力源（246）控制密封腔室（38）内的腔室压力不同于环境压力。 密封组件（250）将腔室壳体（244）密封到工件（28）。 密封组件（250）可以包括第一密封接触区域（270）和第二密封接触区域（272），第一密封接触区域（270）和第二密封接触区域（272）协作以限定邻近腔室壳体（244）和工件 （28）。 密封组件（250）还可以包括用于控制密封间隙（274）内的密封压力的密封压力源（276），使得密封压力不同于腔室压力和环境压力。 第一密封接触区域（270）和第二密封接触区域（272）协作以在表面（278）上施加第一力（284）。 密封压力源（276）在表面（278）上产生第二力（286）。 第一力（284）的大小相等并且在与第二力（286）相反的方向上相反。

公开(公告)号：US06317196B1

公开(公告)日：2001-11-13

申请号：US09209270

申请日：1998-12-11

申请人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kats

发明人： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kats

IPC分类号： G03B2118

CPC分类号： G03F7/70775 ,  G03F7/70358 ,  G03F7/70716 ,  G03F9/70

摘要： A projection exposure apparatus is provided. The projection exposure apparatus includes an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system to successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.

摘要翻译： 提供投影曝光装置。 投影曝光装置包括：照射光学系统，用于以掩模形式曝光掩模图案的一部分，其具有预定形状的曝光辐射通量;固定支架;固定在固定支架上的投影光学系统，用于投射照明图像 掩模图案的一部分到基板上，以及滑架，用于一体地保持掩模和基板，托架可相对于投影光学系统沿预定方向移动，以使基板与由 曝光辐射通量。 投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统 掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

公开(公告)号：US5686997A

公开(公告)日：1997-11-11

申请号：US720179

申请日：1996-09-25

申请人： Hiroshi Shirasu

发明人： Hiroshi Shirasu

IPC分类号： G03F7/20 ,  H01L21/027 ,  G01B11/00 ,  G01B9/02

CPC分类号： G03F7/70358 ,  G03F7/70475

摘要： After a mask (12) and a substrate (16) have been scanned as one unit relative to exposure light (32) to expose a predetermined area on the substrate (16), the mask (12) is stepped in a direction parallel but opposite to the scanning direction. Thereafter, the mask (12) and the substrate (16) are scanned as one unit again to expose another area on the substrate (16). Thus, throughput is improved when a large-sized substrate is divisionally exposed.

摘要翻译： 在掩模（12）和基板（16）相对于曝光光（32）被扫描为一个单元以暴露基板（16）上的预定区域之后，掩模（12）沿平行但相反的方向 到扫描方向。 此后，再次将掩模（12）和基板（16）作为一个单元进行扫描，以露出基板（16）上的另一个区域。 因此，当大尺寸基板分开暴露时，吞吐量得到改善。

公开(公告)号：US5617181A

公开(公告)日：1997-04-01

申请号：US618735

申请日：1996-03-15

申请人： Masamitsu Yanagihara ,  Hiroshi Shirasu ,  Tetsuo Kikuchi

发明人： Masamitsu Yanagihara ,  Hiroshi Shirasu ,  Tetsuo Kikuchi

IPC分类号： G03B27/54 ,  G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： G03F7/70275 ,  G03F7/70358 ,  G03F7/70558

摘要： An exposure apparatus and an exposure method for fabricating semiconductor devices or liquid crystal display boards. The scanning means synchronously moves the mask and the photosensitive substrate with respect to the plurality of projection optical systems, and patterns formed on the mask are projected onto the photosensitive substrate while images of mask formed by adjacent illumination optical systems are made overlapping with each other. On this occasion, the controlling means controls the light intensity changing means, and the light intensity changing means changes the intensity of a light beam of each illumination optical system, so that two intensities of overlapping parts in adjacent illumination areas become substantially equal to each other. The control by the controlling means is carried out based on the light intensities of the overlapping illumination areas as detected by the light intensity detecting means.

摘要翻译： 一种用于制造半导体器件或液晶显示板的曝光装置和曝光方法。 扫描装置相对于多个投影光学系统同步移动掩模和感光基板，并且将形成在掩模上的图案投影到感光基板上，同时使由相邻照明光学系统形成的掩模的图像彼此重叠。 在这种情况下，控制装置控制光强度改变装置，并且光​​强度改变装置改变每个照明光学系统的光束的强度，使得相邻照明区域中的两个重叠部分彼此大致相等 。 基于由光强检测装置检测的重叠照明区域的光强度，进行控制装置的控制。

公开(公告)号：US5528390A

公开(公告)日：1996-06-18

申请号：US461105

申请日：1995-06-05

申请人： Akihiro Goto ,  Takashi Genma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Toshio Matsuura ,  Hiroshi Shirasu ,  Masami Ebi

发明人： Akihiro Goto ,  Takashi Genma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Toshio Matsuura ,  Hiroshi Shirasu ,  Masami Ebi

IPC分类号： G03F7/20 ,  G03H1/00 ,  G03H1/04 ,  G03H1/20

CPC分类号： G03F7/70058 ,  G03H1/0005 ,  G03H1/0408 ,  G03H2001/0094 ,  G03H2001/0491 ,  G03H2260/12

摘要： An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques. The apparatus comprises support means for holding a hologram recording plate at a predetermined position both during recording operation and reconstructing operation, a first illuminating optical system for introducing a light beam from a coherent light source to a mask and irradiating a subject beam produced from the mask into the recording plate, a second illuminating optical system for irradiating the light beam from the coherent light source as a reference beam into the recording plate, a carrier apparatus for disposing during reconstructing operation a substrate at the position of the mask in place of the mask, a third illuminating optical system for irradiating a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate, and a controller for selectively controlling the first, second and third illuminating optical systems to put an at least selected one of them into an operative condition so as to irradiate a fixing light beam into the recording plate in order to fix the hologram.

摘要翻译： 一种用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置。 该装置包括用于在记录操作和重建操作期间将全息图记录板保持在预定位置的支撑装置，用于将来自相干光源的光束引入到掩模并照射由掩模产生的被摄体光束的第一照明光学系统 将用于将来自相干光源的光束作为参考光束照射到记录板中的第二照明光学系统，用于在重建操作期间在掩模的位置处置换基板以代替掩模的载体设备 第三照明光学系统，用于将具有参考光束的共轭光束照射到通过记录操作形成全息图的记录板中，以在基板的光敏表面上形成全息图像，并且 控制器，用于选择性地控制第一，第二和第三照明光学系统， 其中最少选择的一个进入操作状态，以便将固定光束照射到记录板中以固定全息图。

公开(公告)号：US4769523A

公开(公告)日：1988-09-06

申请号：US004265

申请日：1987-01-09

申请人： Akikazu Tanimoto ,  Keiichiro Sakato ,  Joji Iwamoto ,  Hiroshi Shirasu ,  Kiyoto Mashima

发明人： Akikazu Tanimoto ,  Keiichiro Sakato ,  Joji Iwamoto ,  Hiroshi Shirasu ,  Kiyoto Mashima

IPC分类号： B23K26/04 ,  B23K26/06 ,  B23K26/073 ,  B23K26/08 ,  H01L21/68 ,  H01L23/544 ,  B23K26/00

CPC分类号： H01L23/544 ,  B23K26/042 ,  B23K26/066 ,  B23K26/0732 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/705 ,  H01L21/68 ,  B23K2201/40 ,  H01L2223/5446 ,  H01L2924/0002

摘要： A laser processing apparatus for projecting a spot of laser beam onto a portion of a microcircuit pattern on a semiconductor wafer, photographic mask or the like to cut the lead or anneal the limited area. The laser processing apparatus includes a mark detector for detecting the positions of first marks preliminarily provided on a work as the relative positions to the detection centers of the mark detector itself, a controller for controlling a processing energy beam generator so as to form on the work second marks detectable by the mark detector, and an error detector responsive to the results of the position detection of the second marks by the mark detector so as to detect relative positional errors between the focussing centers of the energy beam on the work and the detection centers of the mark detector.

摘要翻译： 一种激光处理装置，用于将激光束点投影到半导体晶片上的微电路图案的一部分，照相掩模等上以切割引线或退火有限区域。 该激光加工装置包括：标记检测器，用于检测预先设置在工件上的第一标记的位置作为与标记检测器本身的检测中心的相对位置;控制器，用于控制加工能量束发生器，以形成工件 标记检测器可检测的第二标记，以及响应于标记检测器对第二标记的位置检测结果的误差检测器，以便检测能量束在工件上的聚焦中心与检测中心之间的相对位置误差 的标记检测器。

公开(公告)号：US4710604A

公开(公告)日：1987-12-01

申请号：US942730

申请日：1986-12-17

申请人： Hiroshi Shirasu ,  Kazuhiro Shimeno ,  Joji Iwamoto

发明人： Hiroshi Shirasu ,  Kazuhiro Shimeno ,  Joji Iwamoto

IPC分类号： B23K26/02 ,  B23K26/08

CPC分类号： B23K26/0853 ,  B23K26/042

摘要： Proposed is a machining apparatus with a laser beam, wherein a stage is controlled and driven to cause a target to come close to a beam spot when the target is located far away from the beam spot, and a laser beam radiation system is controlled and driven to cause the beam spot to come closer to the target when the target is located within a predetermined range with respect to the beam spot.

摘要翻译： 提出了一种具有激光束的加工装置，其中当靶远离束斑位置时，控制和驱动载物台以使目标靠近波束点，激光束辐射系统被控制和驱动 当目标位于相对于光束点的预定范围内时，使光点变得更靠近目标。

公开(公告)号：US4336450A

公开(公告)日：1982-06-22

申请号：US112350

申请日：1980-01-15

申请人： Ken Utagawa ,  Akira Ogasawara ,  Hiroshi Shirasu ,  Kunihisa Hoshino

发明人： Ken Utagawa ,  Akira Ogasawara ,  Hiroshi Shirasu ,  Kunihisa Hoshino

IPC分类号： G02B7/34 ,  G01J1/20

CPC分类号： G02B7/34

摘要： A focus detecting apparatus comprises first means for forming phase outputs from said first and second photosensor arrays of phases respectively corresponding to the relative positions of said first and second photosensor arrays with respect to the light images thereon; second means for comparing the output corresponding to the amount of light entering said first photosensor array with the output corresponding to the amount of light entering said second photosensor array and forming a correlation output corresponding to said comparison; third means for forming outputs corresponding to the sharpness of light images on said photosensor arrays from the outputs from said arrays; and processing means for generating a synthesized output signal representing the focus state of said objective lens with respect to the object from the aforementioned phase outputs, correlation output and sharpness outputs.

摘要翻译： 焦点检测装置包括：第一装置，用于从相应于所述第一和第二光电传感器阵列相对于其上的光图像的相对位置的所述第一和第二光电传感器阵列形成相位输出; 第二装置，用于将与进入所述第一光电传感器阵列的光量相对应的输出与对应于进入所述第二光电传感器阵列的光量的输出进行比较，并形成对应于所述比较的相关输出; 第三装置，用于从所述阵列的输出形成对应于所述光传感器阵列上的光图像的清晰度的输出; 以及处理装置，用于根据上述相位输出，相关输出和锐度输出，产生表示所述物镜的聚焦状态的合成输出信号。

公开(公告)号：US4297571A

公开(公告)日：1981-10-27

申请号：US109282

申请日：1980-01-03

申请人： Ken Utagawa ,  Kunihisa Hoshino ,  Hiroshi Shirasu ,  Akira Ogasawara

发明人： Ken Utagawa ,  Kunihisa Hoshino ,  Hiroshi Shirasu ,  Akira Ogasawara

IPC分类号： G03B13/36 ,  G02B7/34 ,  G01J1/20

CPC分类号： G02B7/34

摘要： In a focus detecting device having a first and second photoelectric element arrays each including a plurality of photo-electric elements disposed so as to mutually correspond in position and optical means for forming a first image and a second image of an object on the first and second arrays, respectively, there is provided first means for calculating the differences between electrical outputs related to the outputs of the mutually corresponding ones of the photoelectric elements of the first and second arrays and adding together the quantities based on said differences, second means for calculating the difference between each electrical output related to the output of each of the photoelectric elements and each electrical output related to the output of the photoelectric element spaced apart from each photoelectric element with a predetermined number of photoelectric elements interposed therebetween in the direction of arrangement of the elements of the arrays and adding together the quantities based on said differences, and third means for detecting the focused condition of the objective lens on the basis of the outputs of said first means and said second means.

摘要翻译： 在具有第一和第二光电元件阵列的焦点检测装置中，每个光电元件阵列包括设置成在位置上相互对应的多个光电元件，以及用于形成第一和第二图像上的物体的第一图像和第二图像的光学装置 阵列分别提供了用于计算与第一和第二阵列的相互对应的光电元件的输出相关的电输出之间的差异的第一装置，并且基于所述差值将所述量相加在一起，第二装置用于计算 与每个光电元件的输出相关的每个电输出和与每个光电元件间隔开的光电元件的输出相关的每个电输出之间的差异与在其间插入的预定数量的光电元件沿元件的排列方向 的数组并加在一起 基于所述差异的量，以及用于基于所述第一装置和所述第二装置的输出来检测物镜的聚焦状态的第三装置。

公开(公告)号：US09366974B2

公开(公告)日：2016-06-14

申请号：US12553549

申请日：2009-09-03

申请人： Yasuo Aoki ,  Hiroshi Shirasu ,  Yoshihiko Kudo

发明人： Yasuo Aoki ,  Hiroshi Shirasu ,  Yoshihiko Kudo

IPC分类号： G03B27/58 ,  G03F7/20 ,  H01L21/68

CPC分类号： G03F7/70758 ,  G03F7/70716 ,  G03F7/70791 ,  H01L21/682

摘要： A substrate stage and an empty-weight canceling mechanism that supports an empty weight of the substrate stage are made up of separate bodies. Accordingly, the size and weight of the substrate stage (a structure including the substrate stage) can be reduced, compared with the case where the substrate stage and the empty-weight canceling mechanism are integrally configured. Further, due to movement of an X coarse movement stage and a Y coarse movement stage by an X drive mechanism and a Y drive mechanism, the substrate stage is driven in an XY plane and also the empty-weight canceling mechanism that supports the empty weight of the substrate stage is driven. With this operation, the substrate stage can be driven without difficulty even when the substrate stage and the empty-weight canceling mechanism are configured of separate bodies.

摘要翻译： 支撑衬底台的空重量的衬底台和空重量消除机构由分离的主体构成。 因此，与基板台和空重重量抵消机构一体构成的情况相比，能够减小基板台（包括基板载台的结构）的尺寸和重量。 此外，由于通过X驱动机构和Y驱动机构的X粗移动台和Y粗移动台的移动，基板台在XY平面中被驱动，并且还支撑空重量的空重量抵消机构 的衬底台被驱动。 通过该操作，即使基板台和空重量抵消机构由分离的主体构成，也能够无困难地驱动基板台。