公开(公告)号：US08440387B2

公开(公告)日：2013-05-14

申请号：US12687380

申请日：2010-01-14

申请人： Robert D. Allen ,  Phillip Brock ,  Daniel P. Sanders ,  Linda K. Sundberg

发明人： Robert D. Allen ,  Phillip Brock ,  Daniel P. Sanders ,  Linda K. Sundberg

IPC分类号： C08L27/12 ,  G03F7/11

CPC分类号： G03F7/2041 ,  G03F7/11 ,  Y10S438/952

摘要： A topcoat material for immersion lithography and a method of performing immersion lithography using the topcoat material. The topcoat material includes a mixture of a first polymer and a second polymer. The first and second polymers of the topcoat material, when the topcoat material is formed into a topcoat layer between an immersion fluid and a photoresist layer, disperse non-homogenously throughout the topcoat layer.

摘要翻译： 用于浸渍光刻的面漆材料和使用面漆材料进行浸渍光刻的方法。 面漆材料包括第一聚合物和第二聚合物的混合物。 面涂层材料的第一和第二聚合物当面涂层材料形成浸渍流体和光致抗蚀剂层之间的顶涂层时，不均匀地分散在整个顶涂层中。

公开(公告)号：US08141646B2

公开(公告)日：2012-03-27

申请号：US12486121

申请日：2009-06-17

申请人： Robert D. Allen ,  John Michael Leuthen ,  Dick L. Knox ,  Jerald R. Rider ,  Tom G. Yohanan ,  Brown L. Wilson ,  Bryan D. Schulze

发明人： Robert D. Allen ,  John Michael Leuthen ,  Dick L. Knox ,  Jerald R. Rider ,  Tom G. Yohanan ,  Brown L. Wilson ,  Bryan D. Schulze

IPC分类号： E21B43/00

CPC分类号： E21B43/128 ,  F04D9/001 ,  F04D13/10 ,  F04D15/0066 ,  F04D15/0088 ,  F04D15/0209

摘要： A device and method can detect, and also break, an occurrence of gas lock in an electrical submersible pump assembly in a well bore based upon surface or downhole data without the need for operator intervention. To detect an occurrence of gas lock, an instantaneous value is monitored using a sensor. Then a controller compares the instantaneous value to a threshold value over a predetermined duration to thereby detect the occurrence of gas lock in the electrical submersible pump assembly. Sensors can include, for example, a differential pressure gauge, a pressure gage located in a pump stage located toward the inlet, a fluid temperature sensor located toward the discharge, a free gas detector located near the pump discharge, an electrical resistivity gage, a flow meter located within surface production tubing, and a vibration sensor attached to a tubing string to measure a vibration signature.

摘要翻译： 一种装置和方法可以基于表面或井下数据来检测并破坏井下电潜泵组件中气锁的发生，而不需要操作员干预。 为了检测气体锁定的发生，使用传感器来监视瞬时值。 然后，控制器在预定持续时间内将瞬时值与阈值进行比较，从而检测电潜泵组件中的气锁的发生。 传感器可以包括例如差压表，位于朝向入口的泵级中的压力表，位于排出口的流体温度传感器，位于泵排放附近的自由气体检测器，电阻率计， 位于表面生产管道内的流量计，以及连接到油管柱以测量振动特征的振动传感器。

公开(公告)号：US20110053083A1

公开(公告)日：2011-03-03

申请号：US12547808

申请日：2009-08-26

申请人： Robert D. Allen ,  Phillip J. Brock ,  Richard A. DiPietro ,  Hoa D. Truong

发明人： Robert D. Allen ,  Phillip J. Brock ,  Richard A. DiPietro ,  Hoa D. Truong

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： G03F7/0392 ,  G03F7/0397 ,  G03F7/30

摘要： Photoresist compositions include a blend of a phenolic polymer with a (meth)acrylate-based copolymer free of ether-containing and/or carboxylic acid-containing moieties. The (meth)acrylate copolymer includes a first monomer selected from the group consisting of an alkyl acrylate, a substituted alkyl acrylate, an alkyl (meth)acrylate, a substituted alkyl methacrylate and mixtures thereof, and a second monomer selected from the group consisting of an acrylate, a (meth)acrylate or a mixture thereof having an acid cleavable ester substituent; and a photoacid generator. Also disclosed are processes for generating a photoresist image on a substrate with the photoresist composition.

摘要翻译： 光致抗蚀剂组合物包括酚类聚合物与不含含醚和/或羧酸的部分的（甲基）丙烯酸酯基共聚物的共混物。 （甲基）丙烯酸酯共聚物包括选自丙烯酸烷基酯，取代的丙烯酸烷基酯，（甲基）丙烯酸烷基酯，取代的甲基丙烯酸烷基酯及其混合物的第一单体和选自以下的第二单体： 丙烯酸酯，（甲基）丙烯酸酯或其具有酸可裂解酯取代基的混合物; 和光致酸发生器。 还公开了用光致抗蚀剂组合物在衬底上产生光致抗蚀剂图像的方法。

公开(公告)号：US20110051297A1

公开(公告)日：2011-03-03

申请号：US12869409

申请日：2010-08-26

申请人： Dick L. Knox ,  Jerald R. Rider ,  Robert D. Allen ,  William Carter ,  Robert H. McCoy

发明人： Dick L. Knox ,  Jerald R. Rider ,  Robert D. Allen ,  William Carter ,  Robert H. McCoy

IPC分类号： H02H7/097

CPC分类号： E21B47/0007 ,  H02P3/00

摘要： A system for determining whether a motor in an electrical submersible pump is backspinning is described herein. The system comprises a sensor mounted in a well bore proximate to a ground surface, the sensor outputting a backspin signal; a communication link connected to the sensor, the communications link communicating the backspin signal; and a controller receiving the backspin signal from the communications link and processing the backspin signal to determine whether the motor is backspinning. Computer readable instructions associated with the system perform the steps of: monitoring the signal to determine whether the signal is above a threshold, the threshold for determining whether the signal is a noise signal or a backspin signal, and outputting the backspin signal; impeding operable AC power to the motor, responsive to the backspin signal; monitoring the backspin signal to determine whether the backspin signal is below the threshold; and returning AC power to the motor responsive to the determination that the backspin signal is below the threshold.

摘要翻译： 这里描述了一种用于确定电动潜水泵中的电动机是否是回旋的系统。 该系统包括安装在靠近地面的井眼中的传感器，该传感器输出反旋转信号; 连接到所述传感器的通信链路，所述通信链路通信所述反向旋转信号; 以及控制器，从所述通信链路接收所述反向旋转信号，并处理所述反向旋转信号，以确定所述电动机是否回转。 与系统相关联的计算机可读指令执行以下步骤：监视信号以确定信号是否高于阈值，用于确定信号是噪声信号还是反旋信号的阈值，以及输出反旋信号; 响应于所述反转信号阻碍对所述电动机的可操作的交流电力; 监测反向旋转信号以确定反旋信号是否低于阈值; 并且响应于所述反旋转信号低于所述阈值的确定，将AC电力返回到所述电动机。

公开(公告)号：US20110045407A1

公开(公告)日：2011-02-24

申请号：US12938459

申请日：2010-11-03

申请人： Robert D. Allen ,  Matthew E. Colburn ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Hoa D. Truong

发明人： Robert D. Allen ,  Matthew E. Colburn ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Hoa D. Truong

IPC分类号： G03F7/004

CPC分类号： G03F7/0757 ,  C08G77/60 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/126

摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.

摘要翻译： 提供了在193nm处具有小于3.0μm-1的吸光度和相对高折射率的线性或分支官能化聚碳硅烷。 官能化聚碳硅烷含有至少一个酸不稳定或水溶性碱可溶的侧基。 还公开了含有适用于光刻（例如浸渍光刻）的官能化聚碳硅烷的光致抗蚀剂制剂。

公开(公告)号：US20100207276A1

公开(公告)日：2010-08-19

申请号：US12772451

申请日：2010-05-03

申请人： Robert D. Allen ,  Phillip J. Brock ,  Blake W. Davis ,  Wu-Song S. Huang ,  Qinghuang Lin ,  Alshakim Nelson ,  Sampath Purushothaman ,  Ratnam Sooriyakumaran

发明人： Robert D. Allen ,  Phillip J. Brock ,  Blake W. Davis ,  Wu-Song S. Huang ,  Qinghuang Lin ,  Alshakim Nelson ,  Sampath Purushothaman ,  Ratnam Sooriyakumaran

IPC分类号： H01L23/522 ,  C09D5/00

CPC分类号： H01L21/76808 ,  H01L21/02137 ,  H01L21/02282 ,  H01L21/02304 ,  H01L21/02348 ,  H01L21/0276 ,  H01L21/3122 ,  H01L21/76802 ,  H01L21/76835 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10T428/24802 ,  H01L2924/00

摘要： The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-damascene and dual-damascene low-k interconnect structures with at least one patternable low-k dielectric and at least one inorganic antireflective coating. In general terms, a method is provided that includes providing at least one patternable low-k material on a surface of an inorganic antireflective coating that is located atop a substrate. The inorganic ARC is liquid deposited and comprises a polymer that has at least one monomer unit comprising the formula M-R1 wherein M is at least one of Si, Ge, B, Sn, Fe, Ta, Ti, Ni, Hf and La and R1 is a chromophore. At least one interconnect pattern is formed within the at least one patternable low-k material and thereafter the at least one patternable low-k material is cured. The inventive method can be used to form dual-damascene interconnect structures as well as single-damascene interconnect structures.

摘要翻译： 本发明提供一种制造互连结构的方法，其中可图案化的低k材料替代了使用单独的光致抗蚀剂和电介质材料的需要。 具体地说，本发明涉及一种制备具有至少一个可图案化的低k电介质和至少一种无机抗反射涂层的单镶嵌和双镶嵌低k互连结构的简化方法。 通常，提供了一种方法，其包括在位于基底顶部的无机抗反射涂层的表面上提供至少一种可图案化的低k材料。 无机ARC是液体沉积的，并且包含具有至少一个单体单元的聚合物，该单体单元包括式M-R1，其中M是Si，Ge，B，Sn，Fe，Ta，Ti，Ni，Hf和La中的至少一种， R1是发色团。 在至少一个可模制的低k材料内形成至少一个互连图案，此后至少一个可图案化的低k材料固化。 本发明的方法可用于形成双镶嵌互连结构以及单镶嵌互连结构。

公开(公告)号：US20090081597A1

公开(公告)日：2009-03-26

申请号：US12057472

申请日：2008-03-28

申请人： Robert D. Allen ,  Matthew E. Colburn ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Hoa D. Truong

发明人： Robert D. Allen ,  Matthew E. Colburn ,  Daniel P. Sanders ,  Ratnam Sooriyakumaran ,  Hoa D. Truong

IPC分类号： G03F7/26 ,  G03F7/30

CPC分类号： G03F7/0397 ,  G03F7/0757 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/143 ,  Y10S430/168

摘要： Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 μm−1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.

公开(公告)号：US20090081418A1

公开(公告)日：2009-03-26

申请号：US11858615

申请日：2007-09-20

申请人： Robert D. Allen ,  Phillip J. Brock ,  Blake W. Davis ,  Wu-Song S. Huang ,  Qinghuang Lin ,  Alshakim Nelson ,  Sampath Purushothaman ,  Ratnam Sooriyakumaran

发明人： Robert D. Allen ,  Phillip J. Brock ,  Blake W. Davis ,  Wu-Song S. Huang ,  Qinghuang Lin ,  Alshakim Nelson ,  Sampath Purushothaman ,  Ratnam Sooriyakumaran

IPC分类号： B32B5/00 ,  G03F7/00

CPC分类号： H01L21/76808 ,  H01L21/02137 ,  H01L21/02282 ,  H01L21/02304 ,  H01L21/02348 ,  H01L21/0276 ,  H01L21/3122 ,  H01L21/76802 ,  H01L21/76835 ,  H01L23/5329 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/12044 ,  Y10T428/24802 ,  H01L2924/00

摘要： The present invention provides a method of fabricating an interconnect structure in which a patternable low-k material replaces the need for utilizing a separate photoresist and a dielectric material. Specifically, this invention relates to a simplified method of fabricating single-damascene and dual-damascene low-k interconnect structures with at least one patternable low-k dielectric and at least one inorganic antireflective coating. In general terms, a method is provided that includes providing at least one patternable low-k material on a surface of an inorganic antireflective coating that is located atop a substrate. The inorganic ARC is liquid deposited and comprises a polymer that has at least one monomer unit comprising the formula M-R1 wherein M is at least one of Si, Ge, B, Sn, Fe, Ta, Ti, Ni, Hf and La and R1 is a chromophore. At least one interconnect pattern is formed within the at least one patternable low-k material and thereafter the at least one patternable low-k material is cured. The inventive method can be used to form dual-damascene interconnect structures as well as single-damascene interconnect structures.

摘要翻译： 本发明提供一种制造互连结构的方法，其中可图案化的低k材料替代了使用单独的光致抗蚀剂和电介质材料的需要。 具体地说，本发明涉及一种制备具有至少一个可图案化的低k电介质和至少一种无机抗反射涂层的单镶嵌和双镶嵌低k互连结构的简化方法。 通常，提供了一种方法，其包括在位于基底顶部的无机抗反射涂层的表面上提供至少一种可图案化的低k材料。 无机ARC是液体沉积的，并且包含具有至少一个单体单元的聚合物，该单体单元包括式M-R1，其中M是Si，Ge，B，Sn，Fe，Ta，Ti，Ni，Hf和La中的至少一种， R1是发色团。 在至少一个可模制的低k材料内形成至少一个互连图案，此后至少一个可图案化的低k材料固化。 本发明的方法可用于形成双镶嵌互连结构以及单镶嵌互连结构。

公开(公告)号：US5327595A

公开(公告)日：1994-07-12

申请号：US146322

申请日：1993-11-02

申请人： Robert D. Allen

发明人： Robert D. Allen

IPC分类号： A47C21/02 ,  A47G9/04 ,  A47G9/02

CPC分类号： A47C21/022 ,  Y10S5/922 ,  Y10T24/23

摘要： A device for retaining bedclothes in position on a bed by use of one or more bands transversely encircling a mattress and a band extending around the foot end of a set of box springs to hold a top sheet and/or other item of bedclothes having a retaining flap in a fixed position at the foot of the bed. The band can be elastic or non-elastic.

摘要翻译： 一种用于通过使用横向包围床垫的一个或多个带将一个或多个条带保持在床上的装置，以及围绕一组箱形弹簧的脚端延伸的带以保持具有保持力的顶片和/或其他褥子物品 襟翼处于床底部的固定位置。 带可以是弹性的或非弹性的。

公开(公告)号：US5071730A

公开(公告)日：1991-12-10

申请号：US656105

申请日：1991-02-13

申请人： Robert D. Allen ,  William D. Hinsberg, III ,  Logan L. Simpson ,  Gregory M. Wallraff

发明人： Robert D. Allen ,  William D. Hinsberg, III ,  Logan L. Simpson ,  Gregory M. Wallraff

IPC分类号： G03F7/039

CPC分类号： G03F7/039 ,  Y10S430/111

摘要： A new polymer family is shown for use in high sensitivity, high resolution photoresists. A liquid apply resist includes a polymer binder of t-butyl methacrylate/methylmethacrylate/methacrylic acid and an initiator which generates acid upon exposure to radiation.

摘要翻译： 新的聚合物系列显示用于高灵敏度，高分辨率的光致抗蚀剂。 液体涂覆抗蚀剂包括甲基丙烯酸叔丁酯/甲基丙烯酸甲酯/甲基丙烯酸的聚合物粘合剂和在暴露于辐射时产生酸的引发剂。