Oxidation process for interconnects and end plates
    31.
    发明授权
    Oxidation process for interconnects and end plates 有权
    互连和端板的氧化工艺

    公开(公告)号:US09437879B1

    公开(公告)日:2016-09-06

    申请号:US13969787

    申请日:2013-08-19

    CPC classification number: H01M8/021 H01M8/0215 H01M8/0223 H01M2008/1293

    Abstract: Methods and systems for oxidizing an interconnect for a fuel cell stack include introducing at least one interconnect to an oxidizing gas containing water vapor, the oxidizing gas being at least substantially free of nitrogen, and oxidizing the at least one interconnect in the presence of the oxidizing gas at an elevated temperature. The oxidation may be performed at a sub-atmospheric pressure. The oxidation of the interconnect may be a controlled oxidation that is performed prior to incorporating the interconnect into a fuel cell stack.

    Abstract translation: 用于氧化用于燃料电池堆的互连的方法和系统包括将至少一个互连引入到含有水蒸气的氧化气体中,所述氧化气体至少基本上不含氮,并且在氧化性存在下氧化至少一个互连 气体在升高的温度。 氧化可以在低于大气压的压力下进行。 互连的氧化可以是在将互连结合到燃料电池堆中之前执行的受控氧化。

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