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公开(公告)号：US20110207954A1
公开(公告)日：2011-08-25
申请号：US13126078
申请日：2009-10-21
IPC分类号： C07C303/38 , C07C307/00
CPC分类号： C07C313/04 , C07C211/05 , C07C211/07 , C07C211/63 , C07C303/02 , C07C303/22 , C07C303/44 , C07C309/17
摘要： In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (as a first step), and then, oxidizing the resulting sulfination product (as a second step). Further, an alkoxycarbonylfluoroalkanesulfinic acid onium salt, which is useful as a photoacid generator, is obtained by salt exchange reaction of the alkoxycarbonylfluoroalkanesulfonic acid salt.
摘要翻译： 在本发明中，通过使用卤代氟烷基酸酯作为起始原料，在胺的存在下硫化卤代氟烷基酯（作为第一工序），得到目标烷氧基羰基氟烷基磺酸盐，然后氧化得到的硫酸化物 （作为第二步）。 此外，通过烷氧基羰基氟烷基磺酸盐的盐交换反应获得可用作光酸产生剂的烷氧基羰基氟烷基亚磺酸鎓盐。
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32.发明申请Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same 有权具有可聚合阴离子的含氟磺酸盐及其制造方法，含氟树脂，抗蚀剂组合物和使用其的图案形成方法公开(公告)号：US20110177453A1
公开(公告)日：2011-07-21
申请号：US13121315
申请日：2009-10-08
IPC分类号： G03F7/004 , C08F222/24 , C07C69/34 , G03F7/20
CPC分类号： C07C303/32 , C07C309/12 , C07C309/20 , C07C381/12 , C08F220/24 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/30 , Y10S430/108 , Y10S430/111 , C08F220/28
摘要： According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.
摘要翻译： 根据本发明，提供了以下通式（2）的可聚合的含氟磺酸鎓盐和通过其聚合获得的树脂。 通过使用本发明的磺酸树脂可以提供具有高分辨率，板聚焦偏差（DOF），小线边缘粗糙度（LER）和高灵敏度的抗蚀剂组合物。 在该式中，Z表示取代或未取代的C1-C6直链或支链亚烷基或其中取代或未取代的C1-C6直链或支链亚烷基与通过除去两个氢而获得的二价基团串联结合的二价部分 来自脂环族或芳族烃的原子; R表示氢原子，卤素原子或C1-C3烷基或含氟烷基; Q +表示锍阳离子或碘鎓阳离子。
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公开(公告)号：US08846966B2
公开(公告)日：2014-09-30
申请号：US13126078
申请日：2009-10-21
IPC分类号： C07C211/05 , C07C211/07 , C07C211/63 , C07C303/02 , C07C303/22 , C07C303/44 , C07C313/04
CPC分类号： C07C313/04 , C07C211/05 , C07C211/07 , C07C211/63 , C07C303/02 , C07C303/22 , C07C303/44 , C07C309/17
摘要： In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (as a first step), and then, oxidizing the resulting sulfination product (as a second step). Further, an alkoxycarbonylfluoroalkanesulfinic acid onium salt, which is useful as a photoacid generator, is obtained by salt exchange reaction of the alkoxycarbonylfluoroalkanesulfonic acid salt.
摘要翻译： 在本发明中，通过使用卤代氟烷基酸酯作为起始原料，在胺的存在下硫化卤代氟烷基酯（作为第一工序），得到目标烷氧基羰基氟烷基磺酸盐，然后氧化得到的硫酸化物 （作为第二步）。 此外，通过烷氧基羰基氟烷基磺酸盐的盐交换反应获得可用作光酸产生剂的烷氧基羰基氟烷基亚磺酸鎓盐。
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34.发明授权Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same 有权含氟化合物，含氟聚合物化合物，抗蚀剂组合物和使用其的图案化方法公开(公告)号：US08592540B2
公开(公告)日：2013-11-26
申请号：US13141945
申请日：2009-12-15
申请人： Kazunori Mori , Yuji Hagiwara , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
发明人： Kazunori Mori , Yuji Hagiwara , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
CPC分类号： C07C235/08 , C07C235/06 , C08F20/22 , C08F220/36 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10T428/24802 , C08F220/28
摘要： There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.
摘要翻译： 公开了含有下述通式（2）的重复单元（a），重均分子量为1000〜1000000的含氟高分子化合物，其中R1表示可聚合双键的基团; R2表示氟原子或含氟烷基; R3表示氢原子，酸不稳定基团，交联位点或其它单价有机基团; 而W1表示连接部分。 当通过300nm或更小的波长或电子束辐射的高能量辐射将含氟聚合物化合物用于形成图案的抗蚀剂化合物时，可以形成具有良好矩形轮廓的抗蚀剂图案。
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公开(公告)号：US09024058B2
公开(公告)日：2015-05-05
申请号：US13256101
申请日：2010-03-12
IPC分类号： C07C309/00 , C07C313/04 , C07C303/32 , C07C381/12 , G03F7/004 , G03F7/039
CPC分类号： C07C313/04 , C07C303/32 , C07C381/12 , G03F7/0045 , G03F7/0046 , G03F7/0392 , C07C309/08 , C07C309/12
摘要： An ammonium hydroxyfluoroalkanesulfinate is obtained by using an organic base while sulfinating a bromofluoroalcohol with a sulfinating agent. An ammonium hydroxyfluoroalkanesulfonate is obtained by oxidizing the ammonium hydroxyfluoroalkanesulfinate. An onium fluoroalkanesulfonate is obtained by converting the ammonium hydroxyfluoroalkanesulfonate into an onium salt through esterification. This onium fluoroalkanesulfonate is useful as a photoacid generator in chemically amplified resists and the like.
摘要翻译： 通过使用有机碱，同时用硫酸化剂硫化溴氟醇来获得羟基氟烷基亚磺酸铵。 通过氧化羟基氟烷基亚磺酸铵得到羟基氟烷基磺酸铵。 通过酯化将羟基氟烷基磺酸铵转化成鎓盐得到氟代烷基磺酸鎓鎓盐。 该氟鎓烷基磺酸鎓可用作化学放大抗蚀剂等中的光致酸产生剂。
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36.发明授权Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same 有权含有可聚合阴离子的含氟磺酸盐及其制造方法，含氟树脂，抗蚀剂组合物和使用其的图案形成方法公开(公告)号：US08663897B2
公开(公告)日：2014-03-04
申请号：US13121315
申请日：2009-10-08
IPC分类号： G03F7/004 , G03F7/30 , C07C303/32 , C07C309/20 , C08F220/24 , G03F7/039
CPC分类号： C07C303/32 , C07C309/12 , C07C309/20 , C07C381/12 , C08F220/24 , C08F220/38 , G03F7/0045 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/2041 , G03F7/30 , Y10S430/108 , Y10S430/111 , C08F220/28
摘要： According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.
摘要翻译： 根据本发明，提供了以下通式（2）的可聚合的含氟磺酸鎓盐和通过其聚合获得的树脂。 通过使用本发明的磺酸树脂可以提供具有高分辨率，板聚焦偏差（DOF），小线边缘粗糙度（LER）和高灵敏度的抗蚀剂组合物。 在该式中，Z表示取代或未取代的C1-C6直链或支链亚烷基或其中取代或未取代的C1-C6直链或支链亚烷基与通过除去两个氢而获得的二价基团串联结合的二价部分 来自脂环族或芳族烃的原子; R表示氢原子，卤素原子或C1-C3烷基或含氟烷基; Q +表示锍阳离子或碘鎓阳离子。
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37.发明申请Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same 有权含氟化合物，含氟聚合物化合物，抗蚀剂组合物和使用其的图案化方法公开(公告)号：US20110318542A1
公开(公告)日：2011-12-29
申请号：US13141945
申请日：2009-12-15
申请人： Kazunori Mori , Yuji Hagiwara , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
发明人： Kazunori Mori , Yuji Hagiwara , Yoshimi Isono , Satoru Narizuka , Kazuhiko Maeda
IPC分类号： B32B3/00 , G03F7/20 , G03F7/004 , C07C229/30 , C08F220/22
CPC分类号： C07C235/08 , C07C235/06 , C08F20/22 , C08F220/36 , G03F7/0046 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10T428/24802 , C08F220/28
摘要： There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R1 represents a polymerizable double bond-containing group; R2 represents a fluorine atom or a fluorine-containing alkyl group; R3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W1 represents a linking moiety.When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.
摘要翻译： 公开了含有下述通式（2）的重复单元（a），重均分子量为1000〜1000000的含氟高分子化合物，其中R1表示可聚合双键的基团; R2表示氟原子或含氟烷基; R3表示氢原子，酸不稳定基团，交联位点或其它单价有机基团; 而W1表示连接部分。 当通过300nm或更小的波长或电子束辐射的高能量辐射将含氟聚合物化合物用于形成图案的抗蚀剂化合物时，可以形成具有良好矩形轮廓的抗蚀剂图案。
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公开(公告)号：US20100029895A1
公开(公告)日：2010-02-04
申请号：US12519428
申请日：2007-11-13
IPC分类号： C08G69/28 , C07C211/56 , C08G69/26
CPC分类号： C08G73/06 , C07C215/68 , C07C2603/24 , C07C2603/26 , C08G69/26 , C08G69/42 , C08G2650/48 , C08L79/04
摘要： There is provided a fluorine-containing diamine represented by formula (1). In this formula, R1 represents a condensed polycyclic type aromatic hydrocarbon group, and at least one —C(CF3)2OH group and at least one —NH2 group are in a relation such that they are attached to adjacent carbons of carbon atoms constituting the condensed polycyclic type aromatic hydrocarbon group. Polymer compounds derived from this fluorine-containing diamine have superior low dielectric property and low water-absorbing property, and, in addition to that, shows low thermal expansion property and high glass transition temperature.
摘要翻译： 提供由式（1）表示的含氟二胺。 在该式中，R 1表示稠合多环型芳香族烃基，并且至少一个-C（CF 3）2 OH基和至少一个-NH 2基是相互关联的，使得它们连接到构成缩合的碳原子的相邻碳上 多环型芳烃基团。 由该含氟二胺衍生的高分子化合物具有优异的低介电性能和低吸水性，除此之外还显示出低的热膨胀性能和高的玻璃化转变温度。
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39.发明授权Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method 有权含氟磺酸盐，含氟磺酸盐树脂，抗蚀剂组合物和图案形成方法公开(公告)号：US08791293B2
公开(公告)日：2014-07-29
申请号：US13565259
申请日：2012-08-02
IPC分类号： C07C309/10 , C07C309/06 , C07C303/22 , G03F7/004
CPC分类号： G03F7/0045 , C07C309/10 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2603/74 , C08F28/04 , C08F220/24 , C08F220/28 , C08F220/38 , C08F222/14 , C08F222/18 , C08F228/04 , C08F2220/382 , G03F7/004 , G03F7/0041 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/20 , G03F7/2039 , G03F7/2041 , G03F7/30
摘要： According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
摘要翻译： 根据本发明，提供具有下述通式（3）的重复单元的含氟磺酸酯树脂。 为了防止图案形成或图案形成失败后的粗糙度等缺陷，含氟磺酸酯树脂中含有光致酸产生功能，作为抗蚀剂树脂，其中“能够通过作用 酸“和”具有光酸产生功能的部分“被规则排列。
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40.发明申请Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method 有权含氟磺酸盐，含氟磺酸盐树脂，抗蚀剂组合物和图案形成方法公开(公告)号：US20130065182A1
公开(公告)日：2013-03-14
申请号：US13565259
申请日：2012-08-02
IPC分类号： C07C309/10 , G03F7/20 , G03F7/004 , C07C303/22 , C08F228/04
CPC分类号： G03F7/0045 , C07C309/10 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2603/74 , C08F28/04 , C08F220/24 , C08F220/28 , C08F220/38 , C08F222/14 , C08F222/18 , C08F228/04 , C08F2220/382 , G03F7/004 , G03F7/0041 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/20 , G03F7/2039 , G03F7/2041 , G03F7/30
摘要： According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
摘要翻译： 根据本发明，提供具有下述通式（3）的重复单元的含氟磺酸酯树脂。 为了防止图案形成或图案形成失败后的粗糙度等缺陷，含氟磺酸酯树脂中含有光酸产生功能，作为抗蚀剂树脂，其中能够通过以下作用改变其显影剂溶解度的部分： 酸和具有光酸产生功能的部分规则地排列。
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