摘要:
A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.
摘要:
A lamp assembly (20) includes a ceramic metal halide lamp (22) mounted in a reflector (60) with support assembly (62). First frame portions (64) of the support assembly (which include linear first portions (64a), angled second portions (64b), and offset portions (64c)) are bent approximately ninety degrees at one end and merge into second frame portions (66) that extend parallel to the lamp. The arrangement supports the light source in the PAR lamp in a transverse manner. In a second embodiment, the frame portions (62′) extend along either side of the light source to accurately position the light source relative to the reflector.
摘要:
A single-axis illumination system for a multiple-axis imaging system, particularly an array microscope. A single-axis illumination system is used to trans-illuminate an object viewed with an array of imaging elements having multiple respective axes. The numerical apertures of the imaging elements are preferably matched to the numerical aperture of the illumination system. For Kohler illumination, the light source is placed effectively at the front focal plane of the illumination system. For critical illumination, the light source is effectively imaged onto the object plane of the imaging system. For dark field illumination, an annular light source is effectively provided. For phase contrast microscopy, an annular phase mask is placed effectively at the back focal plane of the objective lens of the imaging system and a corresponding annular amplitude mask is provided effectively at the light source. For Hoffman modulation contrast microscopy, an amplitude mask is placed effectively at the back focal plane of the objective lens of the imaging system and a slit is provided at a source of light of the illumination system. Structured illumination and interferometry, and a secondary source, may also be used with trans-illumination methods and apparatus according to the present invention.
摘要:
The present invention provides a Yb-doped crystal for a solid state laser, wherein a main active element of the Yb-doped crystal comprises Yb.sup.3 +. The Yb-doped crystal for a solid state laser is prepared by increasing a ratio of Yb.sup.3 + to Yb.sup.2 + in a Yb-doped material by a heat treatment to the Yb-doped material in an oxidizing atmosphere, and carrying out a crystal growth of the Yb-doped material.
摘要:
A spatial pixel clock synchronization system with jitter correction for an optical scanning system having a continuously running pixel clock source, start of scan and end of scan split photodetectors, circuitry for producing signals proportional to the respective light exposures of the halves of said photodetectors, and circuitry, including a switched filter circuit with two storage elements for each facet of the polygon of the system, for generating from said exposure signals a frequency correction signal for the pixel clock source.
摘要:
A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.
摘要:
A device for sensing light comprises a light sensor, one or more intermediate mirrors, a micromirror array including a plurality of independently positionable micromirrors, wherein a first micromirror in the micromirror array is positionable in a first position such that light reflected by the first micromirror while in the first position is reflected toward a first region on one of the one or more intermediate mirrors, wherein the light reflected toward the first region on one of the one or more intermediate mirrors is further reflected to the light sensor, and a lens configured to direct light toward the micromirror array.
摘要:
Handover in a wireless communications system from a first communications platform to a post-handover platform is implemented utilizing low-level synchronization mechanisms to enable at least some of a plurality of terminals to adjust timing and synchronize communications with the post-handover platform. Synchronization with the post-handover platform can be facilitated based on a comparison between an expected time to receive response data and the actual time that such data is received from the post-handover platform.
摘要:
With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system.