CHARGED PARTICLE BEAM COLUMN AND METHOD OF OPERATING SAME
    31.
    发明申请
    CHARGED PARTICLE BEAM COLUMN AND METHOD OF OPERATING SAME 有权
    充电颗粒光束柱及其操作方法

    公开(公告)号:US20120025095A1

    公开(公告)日:2012-02-02

    申请号:US13247319

    申请日:2011-09-28

    申请人: Dirk Preikszas

    发明人: Dirk Preikszas

    IPC分类号: H01J3/14 H01J3/26 H01J3/16

    摘要: A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens.

    摘要翻译: 带电粒子束系统包括带电粒子束源以产生带电粒子束; 用于将带电粒子束聚焦在物平面中的物镜; 第一聚光透镜,设置在带电粒子束源和物镜之间的带电粒子束的光束路径中; 偏转器,设置在所述第一聚光透镜和所述物镜之间的所述光束路径中并且被配置为改变所述带电粒子束在物平面中的入射角; 以及像差校正器,设置在偏转器和物镜之间的光束路径中并且被配置为补偿由物镜引入的像差。 像差校正器还被配置为不补偿由第一聚光透镜引入的像差。

    Large PAR lamp exhibiting excellent color with improved efficacy and life
    32.
    发明授权
    Large PAR lamp exhibiting excellent color with improved efficacy and life 失效
    大型PAR灯具有优异的色彩,提高了功效和使用寿命

    公开(公告)号:US07772750B2

    公开(公告)日:2010-08-10

    申请号:US11509526

    申请日:2006-08-24

    IPC分类号: H01J3/16

    摘要: A lamp assembly (20) includes a ceramic metal halide lamp (22) mounted in a reflector (60) with support assembly (62). First frame portions (64) of the support assembly (which include linear first portions (64a), angled second portions (64b), and offset portions (64c)) are bent approximately ninety degrees at one end and merge into second frame portions (66) that extend parallel to the lamp. The arrangement supports the light source in the PAR lamp in a transverse manner. In a second embodiment, the frame portions (62′) extend along either side of the light source to accurately position the light source relative to the reflector.

    摘要翻译: 灯组件(20)包括安装在具有支撑组件(62)的反射器(60)中的陶瓷金属卤化物灯(22)。 支撑组件(其包括线性第一部分(64a),成角度的第二部分(64b)和偏移部分(64c))的第一框架部分(64))在一端弯曲大约九十度并且合并成第二框架部分 ),其平行于灯延伸。 该布置以横向方式支撑PAR灯中的光源。 在第二实施例中,框架部分(62')沿着光源的任一侧延伸,以相对于反射器精确地定位光源。

    Single axis illumination for multi-axis imaging system
    33.
    发明授权
    Single axis illumination for multi-axis imaging system 有权
    用于多轴成像系统的单轴照明

    公开(公告)号:US07312432B2

    公开(公告)日:2007-12-25

    申请号:US10191874

    申请日:2002-07-08

    申请人: Chen Liang

    发明人: Chen Liang

    IPC分类号: H01J3/16 G02B21/06

    CPC分类号: G02B21/002 G02B21/06

    摘要: A single-axis illumination system for a multiple-axis imaging system, particularly an array microscope. A single-axis illumination system is used to trans-illuminate an object viewed with an array of imaging elements having multiple respective axes. The numerical apertures of the imaging elements are preferably matched to the numerical aperture of the illumination system. For Kohler illumination, the light source is placed effectively at the front focal plane of the illumination system. For critical illumination, the light source is effectively imaged onto the object plane of the imaging system. For dark field illumination, an annular light source is effectively provided. For phase contrast microscopy, an annular phase mask is placed effectively at the back focal plane of the objective lens of the imaging system and a corresponding annular amplitude mask is provided effectively at the light source. For Hoffman modulation contrast microscopy, an amplitude mask is placed effectively at the back focal plane of the objective lens of the imaging system and a slit is provided at a source of light of the illumination system. Structured illumination and interferometry, and a secondary source, may also be used with trans-illumination methods and apparatus according to the present invention.

    摘要翻译: 用于多轴成像系统的单轴照明系统,特别是阵列显微镜。 单轴照明系统用于反射照射具有具有多个相应轴的成像元件阵列观看的物体。 成像元件的数值孔径优选地与照明系统的数值孔径相匹配。 对于科勒照明,光源被有效地放置在照明系统的前焦平面处。 对于临界照明,光源被有效地成像到成像系统的物平面上。 对于暗场照明,可以有效地提供环形光源。 对于相位显微镜,环形相位掩模被有效地放置在成像系统的物镜的后焦平面上,并且在光源处有效地提供相应的环形振幅掩模。 对于霍夫曼调制对比显微镜,将幅度掩模有效地放置在成像系统的物镜的后焦平面上,并且在照明系统的光源处设置狭缝。 结构化照明和干涉测量以及二次源也可以用于根据本发明的反照明方法和装置。

    Yb-doped crystal for a solid state laser and method of preparing the same
    34.
    发明授权
    Yb-doped crystal for a solid state laser and method of preparing the same 失效
    用于固体激光器的掺杂Yb的晶体及其制备方法

    公开(公告)号:US5914975A

    公开(公告)日:1999-06-22

    申请号:US842771

    申请日:1997-04-17

    申请人: Yasuhiko Kuwano

    发明人: Yasuhiko Kuwano

    摘要: The present invention provides a Yb-doped crystal for a solid state laser, wherein a main active element of the Yb-doped crystal comprises Yb.sup.3 +. The Yb-doped crystal for a solid state laser is prepared by increasing a ratio of Yb.sup.3 + to Yb.sup.2 + in a Yb-doped material by a heat treatment to the Yb-doped material in an oxidizing atmosphere, and carrying out a crystal growth of the Yb-doped material.

    摘要翻译: 本发明提供了一种用于固态激光器的Yb掺杂晶体,其中Yb掺杂晶体的主要有源元件包括Yb3 +。 用于固体激光器的Yb掺杂晶体通过在氧化气氛中通过热处理将掺杂Yb的材料中的Yb3 +与Yb2 +的比例增加到Yb掺杂材料并进行Yb的晶体生长来制备 掺杂材料

    Spatial pixel clock synchronization system
    35.
    发明授权
    Spatial pixel clock synchronization system 失效
    空间像素时钟同步系统

    公开(公告)号:US4663523A

    公开(公告)日:1987-05-05

    申请号:US797353

    申请日:1985-11-12

    IPC分类号: H04N1/053 H01J3/16

    摘要: A spatial pixel clock synchronization system with jitter correction for an optical scanning system having a continuously running pixel clock source, start of scan and end of scan split photodetectors, circuitry for producing signals proportional to the respective light exposures of the halves of said photodetectors, and circuitry, including a switched filter circuit with two storage elements for each facet of the polygon of the system, for generating from said exposure signals a frequency correction signal for the pixel clock source.

    摘要翻译: 具有用于具有连续运行的像素时钟源,扫描开始和扫描分离光电检测器结束的光学扫描系统的抖动校正的空间像素时钟同步系统,用于产生与所述光电检测器的两半的相应光照射成比例的信号的电路,以及 电路,包括具有用于系统的多边形的每个面的两个存储元件的开关滤波器电路,用于从所述曝光信号产生用于像素时钟源的频率校正信号。

    Charged particle lithography system with a long shape illumination beam
    37.
    发明授权
    Charged particle lithography system with a long shape illumination beam 有权
    具有长形照明光束的带电粒子光刻系统

    公开(公告)号:US09202662B2

    公开(公告)日:2015-12-01

    申请号:US13756178

    申请日:2013-01-31

    摘要: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the mirror array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

    摘要翻译: 一种系统包括具有特征的集成电路(IC)设计数据库,被配置为产生辐射束的源,包括反射镜阵列板的图案发生器(PG)和设置在所述反射镜阵列板上的电极板,其中所述电极 板包括透镜,其具有垂直于第一尺寸的第一尺寸和第二尺寸,其第一尺寸大于第二尺寸,使得透镜使得辐射束修改以形成长形辐射束,并且被配置为将 基质。 该系统还包括连接镜阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

    SYSTEMS AND METHODS FOR SENSING LIGHT
    38.
    发明申请
    SYSTEMS AND METHODS FOR SENSING LIGHT 审中-公开
    感光灯系统及方法

    公开(公告)号:US20120228482A1

    公开(公告)日:2012-09-13

    申请号:US13043769

    申请日:2011-03-09

    申请人: Andy Lai Lin

    发明人: Andy Lai Lin

    IPC分类号: G02B26/00 H01J3/16

    摘要: A device for sensing light comprises a light sensor, one or more intermediate mirrors, a micromirror array including a plurality of independently positionable micromirrors, wherein a first micromirror in the micromirror array is positionable in a first position such that light reflected by the first micromirror while in the first position is reflected toward a first region on one of the one or more intermediate mirrors, wherein the light reflected toward the first region on one of the one or more intermediate mirrors is further reflected to the light sensor, and a lens configured to direct light toward the micromirror array.

    摘要翻译: 用于感测光的装置包括光传感器,一个或多个中间反射镜,包括多个可独立定位的微反射镜的微镜阵列,其中微镜阵列中的第一微反射镜可定位在第一位置,使得由第一微反射镜反射的光同时 所述第一位置被反射到所述一个或多个中间反射镜之一上的第一区域,其中朝向所述一个或多个中间反射镜中的一个中的所述第一区域反射的光被进一步反射到所述光传感器,以及透镜,被配置为 直接向微镜阵列发光。

    Communications protocol to facilitate handover in a wireless communications network
    39.
    发明授权
    Communications protocol to facilitate handover in a wireless communications network 有权
    用于促进无线通信网络中的切换的通信协议

    公开(公告)号:US07697477B2

    公开(公告)日:2010-04-13

    申请号:US10290767

    申请日:2002-11-07

    IPC分类号: H01J3/16 H04Q7/20

    CPC分类号: H04W36/12 H04B7/18541

    摘要: Handover in a wireless communications system from a first communications platform to a post-handover platform is implemented utilizing low-level synchronization mechanisms to enable at least some of a plurality of terminals to adjust timing and synchronize communications with the post-handover platform. Synchronization with the post-handover platform can be facilitated based on a comparison between an expected time to receive response data and the actual time that such data is received from the post-handover platform.

    摘要翻译: 使用低级同步机制来实现从第一通信平台到移交后平台的无线通信系统中的切换,以使得多个终端中的至少一些能够调整定时并与切换后的平台同步通信。 基于接收响应数据的期望时间与从切换后平台接收到的这种数据的实际时间的比较,可以促进与切换后平台的同步。

    CHARGED PARTICLE BEAM APPARATUS
    40.
    发明申请
    CHARGED PARTICLE BEAM APPARATUS 有权
    充电颗粒光束装置

    公开(公告)号:US20100065753A1

    公开(公告)日:2010-03-18

    申请号:US12554577

    申请日:2009-09-04

    IPC分类号: H01J3/16

    摘要: With a multi-beam type charged particle beam apparatus, and a projection charged particle beam apparatus, in the case of off-axial aberration corrector, there is the need for preparing a multitude of multipoles, and power supply sources in numbers corresponding to the number of the multipoles need be prepared. In order to solve this problem as described, a charged particle beam apparatus is provided with at least one aberration corrector wherein the number of the multipoles required in the past is decreased by about a half by disposing an electrostatic mirror in an electron optical system.

    摘要翻译: 使用多光束型带电粒子束装置和投影带电粒子束装置,在离轴像差校正器的情况下,需要准备多个多极,并且与数字对应的数量的电源 的多极需要准备。 为了解决上述问题,带电粒子束装置设置有至少一个像差校正器,其中通过在电子光学系统中设置静电镜,过去所需的多极数减少约一半。