公开(公告)号：US20050241684A1

公开(公告)日：2005-11-03

申请号：US11179926

申请日：2005-07-12

申请人： Younes Achkire ,  Alexander Lerner ,  Boris Govzman ,  Boris Fishkin ,  Michael Sugarman ,  Rashid Mavleiv ,  Haoquan Fang ,  Shijian Li ,  Guy Shirazi ,  Jianshe Tang

发明人： Younes Achkire ,  Alexander Lerner ,  Boris Govzman ,  Boris Fishkin ,  Michael Sugarman ,  Rashid Mavleiv ,  Haoquan Fang ,  Shijian Li ,  Guy Shirazi ,  Jianshe Tang

IPC分类号： H01L21/304 ,  H01L21/00 ,  B08B3/00

CPC分类号： H01L21/67034 ,  B08B3/10 ,  H01L21/67751 ,  H01L21/681 ,  H01L21/68764 ,  Y10S414/139

摘要： In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.

公开(公告)号：US06955516B2

公开(公告)日：2005-10-18

申请号：US10286404

申请日：2002-11-01

申请人： Younes Achkire ,  Alexander Lerner ,  Boris T. Govzman ,  Boris Fishkin ,  Michael Sugarman ,  Rashid Mavliev ,  Haoquan Fang ,  Shijian Li ,  Guy Shirazi ,  Jianshe Tang

发明人： Younes Achkire ,  Alexander Lerner ,  Boris T. Govzman ,  Boris Fishkin ,  Michael Sugarman ,  Rashid Mavliev ,  Haoquan Fang ,  Shijian Li ,  Guy Shirazi ,  Jianshe Tang

IPC分类号： H01L21/304 ,  H01L21/00 ,  B65G1/133

CPC分类号： H01L21/67034 ,  B08B3/10 ,  H01L21/67751 ,  H01L21/681 ,  H01L21/68764 ,  Y10S414/139

摘要： In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a load port to a second orientation wherein the wafer is in line with an unload port; (2) a catcher adapted to contact and travel passively with a wafer as it is unloaded from the processing portion; (3) an enclosed output portion adapted to create a laminar air flow from one side thereof to the other; (4) an output portion having a plurality of wafer receivers; (5) submerged fluid nozzles; and/or (6) drying gas flow deflectors, etc. Other aspects include methods of wafer processing.

摘要翻译： 在第一方面，提供一种适于处理晶片的模块。 模块包括具有一个或多个特征的处理部分，例如（1）可旋转晶片支撑件，用于从第一取向旋转输入晶片，其中晶片与负载端口对准至第二取向，其中晶片与 卸货港 （2）捕捉器，其适于在从所述处理部分卸载时与晶片被动接触和行进; （3）适于产生从其一侧到另一侧的层流空气流的封闭输出部分; （4）具有多个晶片接收器的输出部分; （5）浸没式流体喷嘴; 和/或（6）干燥气体导流板等。其它方面包括晶片处理的方法。

公开(公告)号：US06332470B1

公开(公告)日：2001-12-25

申请号：US09000518

申请日：1997-12-30

申请人： Boris Fishkin ,  Kyle A. Brown

发明人： Boris Fishkin ,  Kyle A. Brown

IPC分类号： B08B302

CPC分类号： H01L21/02052 ,  B08B3/00 ,  B08B5/00 ,  H01L21/67051 ,  Y10S134/902

摘要： An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from the body of the cleaning agent. The carrier gas flow carried by the second conduit includes cleaning agent in vapor form acquired from the body of cleaning agent. A nozzle is coupled to the second conduit to cause droplets of the cleaning agent to impinge upon a first face of the substrate to be cleaned.

摘要翻译： 用于清洁衬底的装置包括加压载气源和液体形式的清洁剂体。 第一导管将来自载气源的加压载气引导至清洁剂主体。 第二导管将载气的流动远离清洁剂的主体。 由第二导管承载的载气流包括从清洁剂主体获得的蒸汽形式的清洁剂。 喷嘴连接到第二导管以使清洁剂的液滴撞击待清洁的基底的第一面。

公开(公告)号：US06220941B1

公开(公告)日：2001-04-24

申请号：US09164860

申请日：1998-10-01

申请人： Boris Fishkin ,  Charles C. Garretson ,  Peter McKeever ,  Thomas H. Osterheld ,  Gopalakrishna B. Prabhu ,  Doyle E. Bennett ,  Benjamin A. Bonner ,  Sidney Huey

发明人： Boris Fishkin ,  Charles C. Garretson ,  Peter McKeever ,  Thomas H. Osterheld ,  Gopalakrishna B. Prabhu ,  Doyle E. Bennett ,  Benjamin A. Bonner ,  Sidney Huey

IPC分类号： B24B100

CPC分类号： B24B53/017 ,  B24B37/04 ,  B24B57/02

摘要： The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.

公开(公告)号：US06217430B1

公开(公告)日：2001-04-17

申请号：US09184786

申请日：1998-11-02

申请人： Raijiro Koga ,  Hiromi Tsuruta ,  Takashi Kumagai ,  Gee Hoey ,  Brian J. Brown ,  Boris Fishkin ,  Fred C. Redeker

发明人： Raijiro Koga ,  Hiromi Tsuruta ,  Takashi Kumagai ,  Gee Hoey ,  Brian J. Brown ,  Boris Fishkin ,  Fred C. Redeker

IPC分类号： B24B2118

CPC分类号： H01L21/67051 ,  B08B1/007 ,  B24B53/005 ,  B24B53/017

摘要： A cleaning cup for holding and cleaning a pad conditioner having a conditioner head, the cleaning cup includes a spray nozzle for spraying a cleaning solution on a top side of the conditioner head. The cleaning cup further includes a plurality of support pins extending upwards from a base of the cleaning cup to receive the conditioner head thereon.

摘要翻译： 一种用于保持和清洁具有调节头的垫调节器的清洁杯，所述清洁杯包括用于在所述调理头的顶侧上喷射清洁溶液的喷嘴。 清洁杯​​还包括从清洁杯的底部向上延伸的多个支撑销，以在其上接收调节头。

公开(公告)号：US6139406A

公开(公告)日：2000-10-31

申请号：US879447

申请日：1997-06-24

申请人： Daniel Kennedy ,  Boris Fuksshimov ,  Victor Belitsky ,  Boris Fishkin ,  Kyle Brown ,  Tom Osterheld ,  Jeff Beeler ,  Ginetto Addiego

发明人： Daniel Kennedy ,  Boris Fuksshimov ,  Victor Belitsky ,  Boris Fishkin ,  Kyle Brown ,  Tom Osterheld ,  Jeff Beeler ,  Ginetto Addiego

IPC分类号： B24B37/04 ,  B24B53/007 ,  B24B57/02 ,  H01L21/304 ,  B24B7/00

CPC分类号： B24B53/017 ,  B24B37/04 ,  B24B57/02

摘要： The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.

摘要翻译： 本发明提供了一种用于将一种或多种漂洗剂递送到诸如抛光垫表面，优选一种或多种抛光流体的表面的方法和装置。 本发明还提供了一种通过将一种或多种漂洗剂的喷雾递送到表面来清洁一个或多个表面（例如抛光垫表面和基材表面）的方法，并且优选地使冲洗剂流过表面 从中心区域到外部区域，其中收集有不需要的碎屑和材料。

公开(公告)号：US5565985A

公开(公告)日：1996-10-15

申请号：US486169

申请日：1995-06-06

申请人： Boris Fishkin ,  Phil Salzman

发明人： Boris Fishkin ,  Phil Salzman

IPC分类号： G01J9/02 ,  G01N15/00 ,  G01N15/02 ,  G01N15/14 ,  G01N21/15 ,  G01N21/21 ,  G01N21/49 ,  G01N21/53 ,  H01L21/02 ,  G01N21/03

CPC分类号： G01N21/15 ,  G01N21/53

摘要： An improved particle monitoring sensor is described which uses a variety of techniques to prolong the effective life of the optical surfaces within the particle monitoring sensor. Substantially inert purging gas is directed over the particle monitoring sensor windows, which are normally exposed to a harsh operating environment. The surfaces of these windows are heated by heating elements in direct thermal contact with the windows. In addition, a restrictive slit is placed over the detector window to reduce the exposed area and to increase the velocity of gas flowing over the window surface. While this slit reduces the detector's field of view, the signal loss is reduced by using a linearly polarized light source and aligning the elongated slit's major axis with the direction of polarization.