公开(公告)号：US11074522B2

公开(公告)日：2021-07-27

申请号：US16916013

申请日：2020-06-29

申请人： Roger N. Anderson ,  Boyi Xie ,  Leon L. Wu ,  Arthur Kressner

发明人： Roger N. Anderson ,  Boyi Xie ,  Leon L. Wu ,  Arthur Kressner

IPC分类号： G06N20/00

摘要： Electric Grid Analytics Learning Machine, EGALM, is a machine learning based, “brutally empirical” analysis system for use in all energy operations. EGALM is applicable to all aspects of the electricity operations from power plants to homes and businesses. EGALM is a data-centric, computational learning and predictive analysis system that uses open source algorithms and unique techniques applicable to all electricity operations in the United States and other foreign countries.

公开(公告)号：US20120072039A1

公开(公告)日：2012-03-22

申请号：US13214057

申请日：2011-08-19

申请人： Roger N. Anderson ,  Albert Boulanger ,  John A. Johnson

发明人： Roger N. Anderson ,  Albert Boulanger ,  John A. Johnson

IPC分类号： G06F1/28 ,  G06F17/00

CPC分类号： G06Q10/06315 ,  G05B13/0265 ,  G05B15/02 ,  G05B23/0283 ,  G06F17/5009 ,  G06Q10/04 ,  G06Q10/06375 ,  G06Q50/06 ,  H02J2003/007 ,  Y04S10/54

摘要： The disclosed subject matter provides systems and methods for allocating resources within an infrastructure, such as an electrical grid, in response to changes to inputs and output demands on the infrastructure, such as energy sources and sinks. A disclosed system includes one or more processors, each having respective communication interfaces to receive data from the infrastructure, the data comprising infrastructure network data, one or more software applications, operatively coupled to and at least partially controlling the one or more processors, to process and characterize the infrastructure network data; and a display, coupled to said one or more processors, for visually presenting a depiction of at least a portion of the infrastructure including any changes in condition thereof, and one or more controllers in communication with the one or more processors, to manage processing of the resource, wherein the resource is obtained and/or distributed based on the characterization of said real time infrastructure data.

摘要翻译： 所公开的主题提供了用于在诸如电网之类的基础设施（例如电网）内分配资源的系统和方法，以响应对基础设施（例如能量源和汇）的输入和输出需求的改变。 所公开的系统包括一个或多个处理器，每个处理器具有各自的通信接口以从基础设施接收数据，该数据包括基础设施网络数据，一个或多个软件应用，可操作地耦合到且至少部分地控制一个或多个处理器，以处理 并表征基础设施网络数据; 以及耦合到所述一个或多个处理器的显示器，用于可视地呈现基础设施的至少一部分的描绘，包括其条件的任何改变，以及与所述一个或多个处理器通信的一个或多个控制器，以管理 所述资源，其中基于所述实时基础设施数据的表征来获得和/或分发所述资源。

公开(公告)号：US6108491A

公开(公告)日：2000-08-22

申请号：US183796

申请日：1998-10-30

申请人： Roger N. Anderson

发明人： Roger N. Anderson

IPC分类号： H01L21/205 ,  H01L21/00 ,  H01L21/26

CPC分类号： H01L21/67115

摘要： A dual surfaced mid-reflector employs two independently shaped faceted faces to direct radiant energy from separate heater lamp arrays to a substrate or substrate support to be heated. A dual surfaced mid-reflector can also be employed in conjunction with a peripheral cylindical reflect or and a central cylindrical reflector to further direct radiation to specific regions on a substrate or substrate support. In addition, a dual surfaced mid-reflector can also be employed in conjunction with heater lamps where the radiation of individual lamps is further directed by focusing reflectors or dispersive reflectors.

摘要翻译： 双表面中间反射器采用两个独立成形的刻面，将辐射能从单独的加热灯阵列引导到要加热的基板或基板支撑。 双表面中间反射器也可以与外围圆柱形反射体或中心圆柱形反射器结合使用，以进一步将辐射引导到基底或基底支撑体上的特定区域。 此外，还可以与加热灯结合使用双表面中间反射器，其中通过聚焦反射器或分散反射器进一步引导各个灯的辐射。

公开(公告)号：US06099648A

公开(公告)日：2000-08-08

申请号：US907171

申请日：1997-08-06

申请人： Roger N. Anderson

发明人： Roger N. Anderson

IPC分类号： C23C16/48 ,  C30B25/08 ,  H01L21/205 ,  C23C16/00

CPC分类号： C30B25/08 ,  C23C16/481

摘要： A thermal reactor having a wafer chamber for containing at least one semiconductor wafer during processing. The thermal reactor contains a quartz window having an inward bow defining a concave outside surface.

公开(公告)号：US6083323A

公开(公告)日：2000-07-04

申请号：US5311

申请日：1998-01-09

申请人： David K. Carlson ,  Norma Riley ,  Roger N. Anderson

发明人： David K. Carlson ,  Norma Riley ,  Roger N. Anderson

IPC分类号： C23C16/44 ,  C23C16/48 ,  C23C16/52 ,  H01L21/00 ,  B08B5/00 ,  B08B9/00

CPC分类号： C23C16/4405 ,  C23C16/481 ,  C23C16/52 ,  H01L21/67248 ,  Y10S438/905

摘要： An apparatus and a concomitant method for controlling coolant (air) flow proximate a reaction chamber within a workpiece processing system such that the temperature of a wall of the reaction chamber is maintained at a predefined target temperature. The target temperature is typically a temperature that optimizes a process concurrently being accomplished within the chamber, e.g., utilizing one temperature during deposition processes and a different temperature during cleaning processes. The apparatus contains a temperature measuring device to measure the temperature of the chamber wall. The measured temperature is compared to the predefined target temperature. A closed loop system controls the air flow proximate the chamber walls such that the measured temperature becomes substantially equal to the target temperature. Air flow control is provided by an air flow control device located within an inlet conduit that supplies air to a shroud for channeling the air past the reaction chamber. The shroud forms a portion of a housing which supports and encloses the reaction chamber.

摘要翻译： 一种用于控制工件处理系统内的反应室附近的冷却剂（空气）流的装置和并发方法，使得反应室的壁的温度保持在预定的目标温度。 目标温度通常是优化室内同时进行的过程的温度，例如在沉积过程期间利用一个温度和在清洁过程期间不同的温度。 该装置包含用于测量室壁温度的温度测量装置。 将测量的温度与预定的目标温度进行比较。 闭环系统控制靠近室壁的空气流，使得测量的温度基本上等于目标温度。 空气流量控制由位于入口管道内的空气流量控制装置提供，该进气管道将空气供给到护罩，以将空气引导通过反应室。 护罩形成支撑并包围反应室的壳体的一部分。

公开(公告)号：US5809211A

公开(公告)日：1998-09-15

申请号：US570395

申请日：1995-12-11

申请人： Roger N. Anderson ,  Harold J. Mellen, III

发明人： Roger N. Anderson ,  Harold J. Mellen, III

IPC分类号： C30B25/10 ,  C30B25/16 ,  G01J5/00 ,  G01J5/10 ,  H01L21/00 ,  H01L23/34 ,  G01J5/28 ,  F27B1/26 ,  F27D19/00 ,  H01L21/66

CPC分类号： H01L21/67248 ,  C30B25/10 ,  C30B25/16 ,  G01J5/0003 ,  G01J5/10 ,  H01L21/67115 ,  H01L23/34 ,  H01L23/345 ,  H01L2924/0002

摘要： A method and apparatus for uniformly ramping the temperatures of a wafer and a susceptor using a first heat source primarily directed at the wafer and a second heat source primarily directed at the susceptor while keeping the wafer at approximately the same temperature as the susceptor but measuring only the temperature of the susceptor. The method comprises the steps of: determining and storing a plurality of steady-state temperatures of the susceptor as a function of the total power provided to the first heat source and the second heat source; ramping the susceptor from an initial temperature to a final temperature; and heating the wafer from the initial temperature to the final temperature, wherein the power to the first heat source is determined from the susceptor's temperature and the plurality of steady-state temperatures of the wafer and susceptor as a function of total power.

摘要翻译： 一种用于使用主要指向晶片的第一热源和主要指向基座的第二热源均匀地斜升晶片和基座的温度的方法和装置，同时将晶片保持在与基座大致相同的温度，但仅测量 感受器的温度。 该方法包括以下步骤：根据提供给第一热源和第二热源的总功率来确定和存储基座的多个稳态温度; 将基座从初始温度斜升到最终温度; 以及将晶片从初始温度加热到最终温度，其中根据基座的温度和作为总功率的函数的晶片和基座的多个稳态温度来确定对第一热源的功率。

公开(公告)号：US5645646A

公开(公告)日：1997-07-08

申请号：US752742

申请日：1996-11-14

申请人： Israel Beinglass ,  Mahalingam Venkatesan ,  Roger N. Anderson

发明人： Israel Beinglass ,  Mahalingam Venkatesan ,  Roger N. Anderson

IPC分类号： H01L21/687 ,  C23C16/00

CPC分类号： H01L21/6875 ,  H01L21/68735

摘要： An apparatus for depositing a material on a wafer includes a susceptor plate mounted in a deposition chamber. The chamber has a gas inlet and a gas exhaust. Means are provided for heating the susceptor plate. The susceptor plate has a plurality of support posts projecting from its top surface. The support posts are arranged to support a wafer thereon with the back surface of the wafer being spaced from the surface of the susceptor plate. The support posts are of a length so that the wafer is spaced from the susceptor plate a distance sufficient to allow deposition gas to flow and/or diffuse between the wafer and the susceptor plate, but still allow heat transfer from the susceptor plate to the wafer mainly by conduction. The susceptor plate is also provided with means, such as retaining pins or a recess, to prevent lateral movement of a wafer seated on the support posts.

摘要翻译： 用于在晶片上沉积材料的设备包括安装在沉积室中的基座板。 该室具有气体入口和排气。 提供用于加热感受板的装置。 基座板具有从其顶表面突出的多个支撑柱。 支撑柱布置成在其上支撑晶片，其中晶片的后表面与基座板的表面间隔开。 支撑柱具有长度，使得晶片与基座板间隔足以允许沉积气体在晶片和基座板之间流动和/或扩散的距离，但仍允许从基座板到晶片的热传递 主要是通过传导。 基座板还设置有诸如保持销或凹部的装置，以防止位于支撑柱上的晶片的横向移动。

公开(公告)号：US5551982A

公开(公告)日：1996-09-03

申请号：US221118

申请日：1994-03-31

申请人： Roger N. Anderson ,  H. Peter W. Hey ,  Israel Beinglass ,  Mahalingam Venkatesan

发明人： Roger N. Anderson ,  H. Peter W. Hey ,  Israel Beinglass ,  Mahalingam Venkatesan

IPC分类号： C30B25/08 ,  C23C14/50 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C30B25/10 ,  C30B25/14 ,  H01L21/205 ,  H01L21/31 ,  C23C16/00

CPC分类号： C23C16/45502 ,  C23C16/455 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/4581 ,  C30B25/105 ,  C30B25/14

摘要： The present disclosure is directed to an apparatus for depositing a layer of a material on a wafer. The apparatus includes a deposition chamber having an upper dome, a lower dome and a side wall between the upper and lower domes. A susceptor plate is in and extends across the deposition chamber to divide the deposition chamber into an upper portion above the susceptor plate and a lower portion below the susceptor plate. A gas inlet manifold is in the side wall. The manifold has three inlet ports. One of the ports is connected by passages which open into the lower portion of the deposition chamber. The other two ports are connected by passages which open into the upper portion of the deposition chamber. A gas supply system is connected to the inlet ports so as to provide the same gases into the lower portion of the deposition chamber as well as into the upper portion of the deposition chamber. This allows the back surface of the susceptor plate to be coated with a layer of the same material as to be coated on the wafer prior to coating the layer on the wafer.

摘要翻译： 本公开涉及一种用于在晶片上沉积材料层的装置。 该装置包括具有上圆顶，下圆顶和在上下圆顶之间的侧壁的沉积室。 感受板在沉积室中并且延伸穿过沉积室，以将沉积室分成基座板上方的上部和基座板下方的下部。 气体入口歧管位于侧壁中。 歧管有三个入口。 一个端口通过通向沉积室的下部的通道连接。 其他两个端口通过通向沉积室的上部的通道连接。 气体供给系统连接到入口端口，以便将相同的气体提供到沉积室的下部以及沉积室的上部。 这允许在将晶片上的层涂覆之前，使基座板的背面涂覆有要涂覆在晶片上的相同材料的层。

公开(公告)号：US5455070A

公开(公告)日：1995-10-03

申请号：US122270

申请日：1993-09-16

申请人： Roger N. Anderson ,  Paul R. Lindstrom ,  Wayne Johnson

发明人： Roger N. Anderson ,  Paul R. Lindstrom ,  Wayne Johnson

IPC分类号： C23C16/455 ,  C23C16/00 ,  H01L21/306

CPC分类号： C23C16/455 ,  Y10S438/935

摘要： A wafer processing reactor having an input manifold to enable control of a process gas flow profile over a wafer that is being processed. Both process gas relative concentrations and flow rates can be controlled, thereby enabling an increased uniformity of processing across the wafer.

摘要翻译： 具有输入歧管的晶片处理反应器，以使得能够控制正被处理的晶片上的工艺气流分布。 可以控制工艺气体的相对浓度和流速，从而能够提高跨晶片的加工均匀性。

公开(公告)号：US20130073488A1

公开(公告)日：2013-03-21

申请号：US13589737

申请日：2012-08-20

申请人： Roger N. Anderson ,  Albert Boulanger ,  Leon L. Wu

发明人： Roger N. Anderson ,  Albert Boulanger ,  Leon L. Wu

IPC分类号： G06F15/18

CPC分类号： G06Q10/04

摘要： Techniques for evaluating the accuracy of a predicted effectiveness of an improvement to an infrastructure include collecting data, representative of at least one pre-defined metric, from the infrastructure during first and second time periods corresponding to before and after a change has been implemented, respectively. A machine learning system can receive compiled data representative of the first time period and generate corresponding machine learning data. A machine learning results evaluator can empirically analyze the generated machine learning data. An implementer can implement the change to the infrastructure based at least in part on the data from a machine learning data outputer. A system performance improvement evaluator can compare the compiled data representative of the first time period to that of the second time period to determine a difference, if any, and compare the difference, if any, to a prediction based on the generated machine learning data.

摘要翻译： 用于评估对基础设施改进的预测有效性的准确性的技术包括分别在对应于改变之前和之后的第一和第二时间段期间从基础设施收集表示至少一个预定义度量的数据 。 机器学习系统可以接收代表第一时间段的编译数据并产生相应的机器学习数据。 机器学习结果评估器可以经验性地分析生成的机器学习数据。 至少部分地基于来自机器学习数据输出器的数据，实现者可以实现对基础设施的改变。 系统性能改进评估器可以将表示第一时间段的编译数据与第二时间周期的编译数据进行比较，以确定差异（如果有的话），并根据所生成的机器学习数据将差值（如果有的话）与预测进行比较。