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公开(公告)号：US20160026095A1
公开(公告)日：2016-01-28
申请号：US14871743
申请日：2015-09-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Catharinus Hubertus MULKENS , Bob Streefkerk
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70058 , G03F7/70108 , G03F7/70225 , G03F7/70358 , G03F2007/2067
Abstract: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
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公开(公告)号：US20160004171A1
公开(公告)日：2016-01-07
申请号：US14839633
申请日：2015-08-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Richard Joseph BRULS , Marcel Mathijs Theodore Marie DIERICHS , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Hans JANSEN , Erik Roelof LOOPSTRA , Jeroen Johannes Sophia Maria MERTENS , Johannes Catharinus Hubertus MULKENS , Ronald Walther Jeanne SEVERIJNS , Sergei SHULEPOV , Herman BOOM , Timotheus Franciscus SENGERS
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US20140293248A1
公开(公告)日：2014-10-02
申请号：US14261208
申请日：2014-04-24
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT AG
Inventor： Bob STREEFKERK , Johannes Jacobus Matheus BASELMANS , Adrianus Franciscus Petrus ENGELEN , Jozef Maria FINDERS , Paul GRÄUPNER , Johannes Catharinus Hubertus MULKENS , Jan Bernard Plechelmus VAN SCHOOT
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70333
Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Abstract translation: 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
