公开(公告)号：US09140996B2

公开(公告)日：2015-09-22

申请号：US14331003

申请日：2014-07-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Hendrikus Antonius Leenders ,  Nicolaas Rudolf Kemper ,  Joost Jeroen Ottens

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased.

Abstract translation: 公开了一种浸没式光刻设备，其中液体供应系统（其在投影系统和基板之间提供液体）的至少一部分可在扫描期间在基本上平行于基板的顶表面的平面中移动。 移动部件以减小该部件与基板之间的相对速度，使得可以相对于投影系统移动基板的速度。